MEIC Polarized Electron Source

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Presentation transcript:

MEIC Polarized Electron Source April 29, 2015

MEIC Polarized Source … Helicity Reversal 72.07 µs Damping Time 3 GeV – 12 GeV 700 ms – 12 ms 3.233 µs Bunch Charge 26 pC – 6.6 pC 220 bunches at 68.05 MHz (14.69 ns) Pockels cell switching time at CEBAF today ~70 us. Planned for Moller Exp. ~10 us Bunch charge 72 x larger than typical CEBAF, 20 x greater than G0 – Expect to use a gun operating at higher voltage 68.05 MHz pulse repetition rate not be a problem for gun, maybe for LINACs We are not considering simultaneous beam delivery to fixed target halls, using typical CEBAF beam Message: MEIC polarized source requirements do not pose significant challenges

Source Parameter Comparison JLab/FEL CEBAF EIC MEIC eRHIC Cornell ERL LHeC CLIC ILC Polarization No Yes Photocathode Bulk GaAs GaAs / GaAsP K2CsSb Width of microbunch (ps) 35 50 100 2 1000 Time between microbunches (ns) 13 14.69 106 0.77 25 0.5002 337 Microbunch rep rate (MHz) 75 499 68.05 9.4 1300 40 1999 3 Width of macropulse - 3.233 µs 156 ns 1 ms Macropulse repetition rate (Hz) 2x83 5 Charge per microbunch (pC) 133 0.36 26 5300 77 640 960 4800 Peak current of microbunch (A) 3.8 0.008 0.52 53 38.5 6.4 9.6 4.8 Laser spot size (cm, diameter) 0.5 0.1 0.3 0.6 1 Peak current density (A/cm2) 19 7.4 188 500 32 12 6 Average current from gun (mA) 10 0.2 0.001 0.015 0.072 Why multi-alkali (bulk material, Eg = 1.5 eV) photocathodes are not sensitive to ion bombardment? No NEA activation layer. eRHIC: electron Relativistic Heavy Ion Collider LHeC: Large Hadron electron Collider CLIC: Compact Linear Collider ILC: International Linear Collider --- Why Laser Spot Size? to reduce space-charge emittance growth and suppress surface charge limit. eRHIC: 20 photocathodes, 2.5 mA from each How to fill the numbers: Microbunch rep rate = 1.0/Time between microbunches Number of microbunches = Width of macropulse / Time between microbunches For CW machines: Duty Factor = 100% (for CW machines) For pulsed machines: Duty Factor = Width of macropulse * Macropulse repetition rate Charge per microbunch = Number electrons/microbunch * Electron Charge(1.6e-19 C) Peak current of microbunch = Charge per microbunch / Width of microbunch Peak current density = Peak current of microbunch / ( (Laser Spot Size/2)**2 * Pi) Average Current = Charge per microbunch * Microbunch rep rate * Duty Factor Proposed * Unpolarized: Bulk GaAs (Cs,F), K2CsSb, Na2KSb, … Polarized: GaAs/GaAsP (Cs,F).

Addressing MEIC Bunch Charge 20 to 72 times larger than CEBAF Larger Laser Size (reduces space-charge emittance growth and suppresses surface charge limit) Higher Gun Voltage: Reduce space-charge emittance growth, maintain small transverse beam profile and short bunch-length; clean beam transport Compact, less-complicated injector To accelerate large bunch charge in CEBAF: use RF feedforward system for C100 cryomodules

JLab 500 kV Inverted Gun 200 kV Inverted Gun Longer insulator 7” 5” 200 kV Inverted Gun Longer insulator Spherical electrode