Parameter Space for Amorphous Oxide Semiconductors (AOSs)

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Presentation transcript:

Parameter Space for Amorphous Oxide Semiconductors (AOSs) NSF-MRSEC DMR-1121262 Julia Medvedeva and Robert Chang, Northwestern University MRSEC The combined results of controlled synthesis, ab-initio molecular-dynamics liquid-quench simulations, thorough structure and property characterization, and accurate density-functional calculations helped identify four major components that govern the electrical, optical, thermal, and mechanical properties of prototype In-based AOSs: (i) deposition temperature; (ii) oxygen stoichiometry; (iii) cation composition; and (iv) lattice strain, Figure. Microscopic understanding gained within the unified framework, serves as a solid foundation for optimizing the properties of known AOSs and for further development and exploration of complex ternary and quaternary AOSs. Advanced Electronic Materials (2017). The combined results of controlled synthesis, ab-initio molecular-dynamics liquid-quench simulations, thorough structure and property characterization, and accurate density-functional calculations helped identify four major components that govern the electrical, optical, thermal, and mechanical properties of prototype In-based AOSs: (i) deposition temperature; (ii) oxygen stoichiometry; (iii) cation composition; and (iv) lattice strain, Figure. Microscopic understanding gained within the unified framework, serves as a solid foundation for optimizing the properties of known AOSs and for further development and exploration of complex ternary and quaternary AOSs. Four-dimensional parameter space of In-based AOSs derived based on integrated experimental and theoretical studies: (1) deposition temperature (or quench rates); (2) oxygen stoichiometry; (3) metal composition; and (4) lattice strain.