ALO Passivation of MCPs: 27% WALO/ALO SEE/400oC anneal Jeff Elam Anil Mane Aileen O’Mahony
100 nm ALO Passivation Passivation MCP R (MΩ) Pre-anneal Post-anneal R Change % No passivation 13600-329 40.1 82.2 205 13600-330 42.6 86.0 202 100 nm ALO 13600-323 55.8 87.5 157 13600-324 51.0 78.6 154
5 nm ALO Passivation Passivation MCP R (MΩ) Pre-anneal Post-anneal R Change % 5 nm ALO 13600-269 47.4 70.0 148 S000659 51.5 77.0 150 13600-271 76.9 129.0 168 S000667 84.7 138.0 163 No passivation S000662 50.0 258
Photek Pb MCPs Passivation MCP R (MΩ) Pre-anneal Post-anneal R change % 100 nm ALO Photek 794112 23.1 39.1 169 Photek 794113 21.5 24.0 112 Photek 794115 20.7 22.8 110 Photek 794116 26.6 28.5 107 Photek 794119 24.5 Photek 7941110 22.9