Field-Emission mapping measurement on Copper Surface

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Presentation transcript:

Field-Emission mapping measurement on Copper Surface Y. Higashi, KEK LCWS12 RF Structure/Technologies WG (webex) October 26, 2012, Arlington, USA Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Outline Results of high-power tests of single-cell Standing-Wave structures related to surface processing and copper purity @Effect of near-perfect surface cleaning on high gradient performance @ Effect of purity of copper on high gradient performance (4N OFC copper, 6N copper treated with HIP, and 7N large grain copper) Development of Scanning Field Emission Microscope (SFEM) Search for location of enhanced field emission @ Grain boundary measurement on the 7N large grain copper @ Random search for enhanced field emission on the OFHC Class1 copper Summary This work is supported by US – Japan Cooperation Program Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Single-Cell SW Structure for High Gradient Test High shunt impedance structures, a/λ=0.143 1C-SW-A3.75-T2.6-Cu Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Solid Model: David Martin

1C-SW-A3.75-T2.6-Cu, a/λ=0.143 10 MW input Maximum magnetic field 672 kA/m (SLANS 668.0 kA/m) Maximum electric field 390 MV/m (SLANS 398.9 MV/m ) Resonance at 11.4212 GHz β = 0.988 Under-coupled loaded Q Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Unloaded Q=8,849.8 (SLANS 8,912.5) (SLANS 11.4241 GHz) (SLANS 1.032356) V.A. Dolgashev, 25 September 2007

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 at KEK 1.Bonding 2.Megasonic rinsing with degreaser 3.500degC baking 4.N2 gas purged 5. Goes to SLAC Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Large Grain 7N copper Developed by MITSUBISHI MATERIAL Co. Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Three cells made by 7N-Large Grain Copper Development Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Breakdown rate vs. gradient for A3.75-T2.6 copper structures, one “standard” OHC, another 7N, shaped pulse, 200 ns flat part Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 V.A. Dolgashev, 16 April 2010

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Why we don’t see difference in rf breakdown performance of ultra-pure copper? Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Speculation!! Crystal defect density almost the same in 4N, 6N, and 7N copper: Dislocation density seems to be 10^6 ~ 10^8 cm/cm^3 even with annealing. Distance to dislocation is approximately 1 ~ 10 mm よく焼きなました金属でさえも転位密度は106~108 cm/cm3 程度あります。塑性加工した材料では 1010~1012 cm/cm3 程度で, 1cm3当たり地球を25周するほどの長さの転位線に相当します。また,加工することにより転位は増えることを示しています。  よく焼きなました金属では,転位線の間隔は1~10μm程度であり,3000~5000原子に1個の転位が存在することになります。 Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Results of High Gradient Tests Sophisticated fabrication technologies for X-band high gradient accelerating structures successfully developed at KEK with SLAC, INFN and CERN. We compared breakdown rate for three A3.75-T2.6 copper structures, one OFC copper, 6N copper treated with HIP, and 7N large grain copper. But rf breakdown performance was almost same. The nearly perfect surface processing affected only processing time. Ultra-clean structures conditioned faster then the normally processed structure.   Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 We want to identify crystal defects by looking at regions with enhanced field emission We developed Scanning Field Emission Microscope Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Scanning Field Emission Microscope Configurations Tungsten tip: < 1micron radius Tip movement: linear stage+PIEZO mover Gap: 1 micron XY stage stroke +/- 6mm (rough 50mm) Bias voltage ~240V Pico-ammeter: ~pA resolution In-situ gap sensor: 0.01micron resolution Microscope Residual Gas Analyzer Vacuum gauge Vacuum level : 10-7Pa Chamber size: 400 mm diameter and 300 mm height W tip Sample XY stage Ceramic plate PIEZO pA meter High-Voltage Capacitive sensor PMT Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Schematic view of Scanning Field Emission Microscope Sample 40x10x3mm Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Scanning Field Emission Microscope Chamber inside Scanned surface W tip W tip radius ~1mm Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Sample and moving stages Capacitance gauge PIEZO actuator W-Tip Sample XY stage Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Tungsten Tip made by electro polishing Polishng conditions KOH: 1 mol Voltage: 30 V Current: 200mA Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Field pattern under W-tip Tip radius (point) Tip shape (120deg.) Distance (d) Maximum field strength <70% of applied bias Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Bias voltage change Gap distance change Field Emission Current change due to bias voltage and gap None 300 350 400 450 (V) Gap 1mm Bias voltage change 0.9 0.8 0.7 0.6 (mm)) Bias 450V Electrode : OFHC Class1 Gap distance change Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Stability of the table motion Capacitive sensor Optical flat surface 1mm 0.1mm 5mm travel Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Fowler-Nordheim plots at 35 arbitrary points Each of the 7 frame includes data for 5 different locations No observation of field enhancement points 23 Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Surface Scan Mirror surface Etched surface 2mm scan Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Measured field emission distributions Mirror surface Etched surface Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

We found no surface damages after scanning on mirror surface Before scanning After scanning Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Setup commissioning We found out that pulse motor drive generates vibration so impossible to get accurate data Now we move sample manually Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Search for Location of Enhanced Field Emission Scanning grain boundary on the ultra-pure 7N-LG copper Random scan on the standard purity, OFHC Class1 copper Sample Surface Preparation Diamond Turning (20nm rms) 600 deg.C/1 hour heat treatment in vacuum 3 mm chemical etching Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Grain boundary of ultra-pure 7N-LG copper W Tip Scanning Line Grain Boundary Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Enhancement of field emission on a grain boundary 1mm 50mm Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Enhancement of field emission on another grain boundary and on contaminated surface Detail of boundary Grain boundary Scanning direction Contaminated surface Conditions Bias: 450V Gap: 2mm Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Typical Field Emission distribution on surface of standard, OFHC Class1 copper Conditions Bias: 450V Gap: 2mm 10 points field enhancement / 3.5mm travel Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Reproducibility check Back-and-forth scan of one point of enhanced field emission Low speed scanning High speed scanning Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Getting statistics on the field enhancement: 1D scans 12 random locations Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Comparison of currents from enhanced and “base” field emission Location of Enhanced Field Emission Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 P3, P3’ P2 P4,P4’,P4” p1 < 10mm < 3mm Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Summary We observed enhancement of field emission on a grain boundary of the ultra-pure 7N-LG copper We were able to reproducibly measure enhancement points on surface of standard copper 37 Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012

Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012 Future Work s th strength Perfect crystal Number of dislocations and microscopic defects Target (minimum dislocation density ~ 10E3/cm^2) Actual ACC structure material Y.Higashi, LCWS12 RF Structure WG, 26 October, 2012