Surface hardness of flexible carbon fiber sheets enhanced by deposition of organosilicon oxynitride thin films with an atmospheric pressure plasma jet Yung-Sen Lin *, Yi-Chen Lai, Yui-Hung Chen Department of Chemical Engineering, Feng Chia University (Taichung, Taiwan 40724, R.O.C)
Outline Flexible carbon fiber sheets (FCFS) Low temperature plasma polymerization Film deposited via low temperature atmospheric plasmas Atmospheric pressure plasma jet (APPJ)-deposited SiOxCyNz films onto FCFS Characterization of APPJ-synthesized SiOxCyNz films
Vertu Ascent Motorsport Limited Edition FCFS www.boeing.com NOKIA Vertu Ascent Motorsport Limited Edition (http:// www.b2bcarbonfiber)
Low Temperature Plasma-Polymerized Organo-Silicon Oxynitride (SiOxCyNz ) Methods for Thin Film Deposition PECVD Physical (1) Evaporation (2) Sputtering Electrochemical (1) Electrodeposition (2) Anodization Chemical (1) Chemical Vapor Deposition (CVD) (2) Plasma Enhanced Chemical Vapor Deposition (PECVD) (3) Plasma Polymerization (4) Sol-Gel (5) Spray Pyrolysis (6) Thermal Oxidation (7) Chemical Oxidation (8) Dipping CVD Low temperature plasma polymerization H. Yasuda, ”Plasma Polymerization”, Academic Press, 1985.
low temperature atmospheric plasmas Film deposited via low temperature atmospheric plasmas economical advantage (low cost, high processing speed and simple system which does not use vacuum equipment) ecological advantage (thermal plasma) Thermal plasma G. S. Selwyn et. al. Physics Division Progress Report 1999–2000.
by Low temperature atmospheric pressure plasmas Thin Films Deposition by Low temperature atmospheric pressure plasmas Atmospheric plasma & (Deposition or Coatings)
Atmospheric pressure plasma jet (APPJ)-deposited SiOxCyNz films onto FCFRPCs (33.3 l/min) (1-3 sccm) Thickness: 330-410 nm Deposition rate: 2.2-2.7 nm/s Exposed duration: 150 seconds 20 kHz 1,000 Watts (2 sccm) (9 sccm) Tetramethyldisiloxan (TMDSO)
Aggolomerated nano-particles Characterization of APPJ-synthesized SiOxCyNz films ASTM D3363 @765 g --7H--8H 2B 8H 8H 7H 3 sccm 1 sccm 2 sccm Surface Morphology: FESEM images 0% 12.1% 20.0% 22.3% Grain boundary fraction (%) Aggolomerated nano-particles
Characterization of APPJ-synthesized SOxCyNz films 0000# steel wood @100g 0 cycle 92 cycles 76 cycles 58 cycles 2 sccm 3 sccm 1 sccm Surface Morphology: AFM images Surface roughness (nm) 8.7 nm 6.4 nm 6.9 nm 10.0 nm 38.3 nm 9.0 nm 18.4 nm 25.1 nm
Characterization of APPJ-synthesized SiOxCyNz films Atomic Compositions analyzed by XPS
Characterization of APPJ-synthesized SiOxCyNz films
Conclusions SiOxCyNz films have been sucessfully deposited onto FCFS by an atmospheric pressure plasma polymerization method with an APPJ is proven to highly enhance the surface hardness from 2B for as-received FCFS to 8H for FCFS/APPJ-deposited SiOxCyNz film by injecting air gases directly into the precursor TMDSO vapors at an air flow rate of 1 sccm. The scratch resistance of FCFS is improved from a poor scratch resistance on a scratch rate of 100% just scratched for 1st cycle for as-received FCFSW to a scratch rate of 0% after scratched for 92 cycles against a 0000#-grade steel wool at 100 g. Atmospheric pressure plasma-polymerized SiOxCyNz films are used to offer FCFS with the smooth (Ra 6.4 nm and Rms 9.0 nm) and the hard [high combined composition of Si-(O)4 bond of up to 56.8%] surfaces synthesized in SiOxCyNz film.
Thank you for your attention Acknowledgements This study is financially supported by the Ministry of Science and Technology of Republic of China (project No: MOST 104-2622-E-035-017-CC3, MOST 105-2622-E-035-014-CC3, MOST 106-2632-E-035-001 and MOST 107-2632-E-035-001). Thank you for your attention