Atomistic origin of enhanced fracture toughness of GO nanosheet

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Fig. 4 Atomistic origin of enhanced fracture toughness of GO nanosheet. Atomistic origin of enhanced fracture toughness of GO nanosheet. (A) The initial configuration of a layer in a precracked four-layered GO sample and the schematic of the constraints. (B to G) Snapshots of the distinct stages of fracture path through one of the layers in a precracked four-layered GO sample during uniaxial loading. Atoms in the precracked layer are colored on the basis of their shear strain magnitudes. For clarity, the functional groups are hidden in these images. Here, atomic strain is defined as the von Mises shear strain invariant of the atomic Green-Lagrangian strain tensor, which may be derived directly from the definition of the local deformation gradient. (H) Uniaxial stress-strain response of the layer and labels in stress-strain curve refer to MD snapshot panels in this figure. (I) Fracture pathways of constitutive layers in a four-layer GO sample. (J) MD simulations: Uniaxial stress-strain response of precracked monolayer and multilayer GO nanosheets subjected to uniaxial tensile loading. (K) Energy absorbed per unit volume by GO nanosheets of varying thicknesses during crack propagation. It is calculated as the area under the stress-strain curve in (J) from the point of fracture initiation to the 50% of their peak stress, where the sheet is considered to have failed completely. Changhong Cao et al. Sci Adv 2018;4:eaao7202 Copyright © 2018 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. Distributed under a Creative Commons Attribution NonCommercial License 4.0 (CC BY-NC).