Investigation of global uniformity of pattern quality in a large area

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Presentation transcript:

Fig. 5 Investigation of global uniformity of pattern quality in a large area. Investigation of global uniformity of pattern quality in a large area. (A) Real image of a BCP thin film (1.2 cm by 1.2 cm) and a scheme showing nine-divided regions. (B) Hermans parameter, P2, (C) areal defect density (ρA), (D) SPU, and (E) scaled magnitude after Gabor filtering (M/Mi) obtained from each of the nine regions. (F) SEM image of fabricated Au 1D array after SS annealing with mixture for 7 min. Left bottom insets show enlarged and tilted view SEM image of Au 1D array. The right top inset shows the FFT image obtained from the SEM image. (G) Semilog plots for the rocking curves of Au nanowires [shear-only and SS annealing with different times (5, 7, and 8.5 min)] obtained by x-ray double crystal Bragg diffraction. For the sample with SS for 8.5 min, we marked several peaks corresponding to sequential diffraction order with arrows. (H) Ultraviolet–visible–near-infrared spectrometral behaviors of Au nanowires [shear-only and SS annealing with different times (5, 7, and 8.5 min)]. The behaviors were obtained from reflectance difference between transverse electric– and transverse magnetic–polarized incident light from the sample. The blue dashed line indicates RTE − RTM of 1D infinite parallel nanolines of Au on Si substrate calculated by rigorous coupled wave approximation. Ye Chan Kim et al. Sci Adv 2019;5:eaaw3974 Copyright © 2019 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. Distributed under a Creative Commons Attribution NonCommercial License 4.0 (CC BY-NC).