Plasmafysica & Stralingstechnologie Elementary Processes in Gasdischarges Plasma & Materials Processing Coherence & Quantum Technology Science and Technology of Nuclear Fusion

/ Applied Physics •Plasma medium: common interest to the PPRT thrust area •Same fundamental knowledge reservoir •Plasmas investigated vary in density and temperatures •Intrinsic nonequilibrium medium •Utilize fundamental knowledge in various applications •Very good example of applied science Plasma Physics and Radiation Technology Experiments and modeling approach

/ Applied Physics Plasma Physics and Radiation Technology •Physics and chemistry on short time and length scales •Use of high power lasers for in situ and real time plasma and surface diagnostics •Two groups: Research on plasma-surface interaction Plasma & Materials Processing (PMP) Research on homogeneous plasma processes Elementary Processes in Gasdischarges (EPG)

/ Applied Physics Plasma Physics and Radiation Technology CQT High phase space density plasmas Coherence & Quantum Technology DeBroglie wavelength: Phase space density: Quantum Effects become important

/ Applied Physics Plasma Physics and Radiation Technology Science & Technology of Nuclear fusion •Group will have experimental focus •Strong collaboration with national and international facilities world wide •Direct links with PMP and EPG groups are present

/ Applied Physics The track embraces research subjects such as: •the generation of plasma’s •plasma-surface interaction (e.g. plasma deposition, plasma etching, etc.), •plasma-accelerators, novel ion and electron sources •laser cooling techniques and atomic optics An important characteristic of the master track is the fundamental approach of the themes as well as the research into new applications of this broad field of research. Plasma Physics and Radiation Technology

/ Applied Physics General outline of the Master programme 1 st year 60 ECTS 3 compulsory courses 10ECTS (Compulsory) track courses 17ECTS Optional courses 14ECTS External Assignment 19 ECTS 2 nd year 60 ECTS Graduation project 60 ECTS General compulsory courses: 3 courses with a total of 10 ECTS Compulsory and optional track courses: 17 ECTS consisting 2 compulsory courses of 8 ECTS in total and at least 11 ECTS of optional track courses; optional courses: each student has to choose a well-balanced set of courses to a total of at least 14 ECTS points (about 3-4 courses); external assignment project of 19 ECTS points (12 weeks) usually outside TU/e; graduation project of 60 ECTS points (1 year). Plasma Physics and Radiation Technology

/ Applied Physics Coherence & Quantum Technology (CQT) • Extreme states of matter: Ultra-cold & ultra-hot, plasmas & gases; • Laser manipulation of atoms, electrons and ions; • Atom, electron & ion beams for femto-nano science & engineering. •Staff: •Prof. Jom Luiten •Prof. Ton van Leeuwen •Dr. Servaas Kokkelmans •Dr. Peter Mutsaers •Dr. Edgar Vredenbregt •Dr. Seth Brussaard

/ Applied Physics Coherence & Quantum Technology (CQT) Ultra-Cold Electron & Ion Beams: • Laser cooling & trapping; • Femtosecond (10-15 s) laser physics; • Ultra-low temperature ( kelvin) plasmas; • Femtosecond electron microscopy; • Sub-nanometer ion beam drilling & milling. Edgar Vredenbregt, Jom Luiten, Peter Mutsaers

/ Applied Physics Ultracold electron & ion beams 15 K Electron temperature e-e- ions V II Taban et al., to be published Ultracold plasmas Taban et al., Phys. Rev. Special Topics, 11, (2008)

/ Applied Physics Theory of Quantum Gases: • Atoms trapped in an optical lattice; • Superfluidity of ultra-cold (nano-kelvin) Fermi and Bose gases; • Quantum Plasmas & Beams. Servaas Kokkelmans Laser Wakefield Acceleration: • Tera-watt “light bullet” laser physics; • Extreme high-energy-density plasmas; Seth Brussaard Coherence & Quantum Technology (CQT)

/ Applied Physics Femtosecond structural dynamics “The (bio)molecular movie...” The poor man’s X-ray Free Electron Laser Luiten et al., PRL 93, (2004) Claessens et al., PRL 95, (2005) Van Oudheusden et al., JAP 102, (2007) VICI project Luiten: Exploring extreme beam regimes for femtosecond electron imaging Phase space density = Beam Brightness

/ Applied Physics •Staff: •Prof.dr.ir. Gerrit Kroesen •Prof.dr. Joost van der Mullen •Dr.ir. Eddie van Veldhuizen •Dr.ir. Peter Bruggeman •Dr.ir. Sander Nijdam •Dr.ir. Jan van Dijk •Prof.dr. Ute Ebert •Prof.dr. Marco Haverlag Elementary Processes in Gas Discharges (EPG) • Light and photons: Efficient lamps and EUV sources • Environmental technology: using plasmas for air / water cleaning • Biomedical technology: sterilisation; new medical treatments

/ Applied Physics Plasmas: Heaven and earth Elementary Processes in Gas Discharges (EPG)

/ Applied Physics Plasmas in lab and industry (1) Elementary Processes in Gas Discharges (EPG)

/ Applied Physics Plasmas in lab and industry (2) Elementary Processes in Gas Discharges (EPG)

/ Applied Physics Stereo-photography of Corona discharges S. Nijdam et al., Appl. Phys. Lett (2008)

/ Applied Physics Plasma & Materials Processing (PMP) •Staff: •Dr.ir. Erwin Kessels •Dr. Richard Engeln •Dr. Adriana Creatore •Dr. Ageeth Bol •Prof.dr. Fred Roozeboom •Prof.dr.ir. Richard van de Sanden • Plasma physics and chemistry of plasma & materials processing; • Advanced plasma and surface diagnostics • Micro- and nano-engineering of functional materials

/ Applied Physics Physics and chemistry of plasma & materials processing Micro- and nano-engineering of functional materials Advanced plasma and surface diagnostics Plasma chemistry Ion/radical densities/fluxes Energy distribution fcts. Plasma surface interaction Plasma enhanced CVD Dry etching Plasma-assisted ALD Thin films & devices Ellipsometry Nonlinear surface spectroscopy Novel surface diagnostics (Laser) based gas phase diagnostics Plasma & Materials Processing (PMP)

/ Applied Physics In situ dangling bond detection during a-Si:H growth H-abstractionadsorption on DBweakly-adsorbed stateinsertion into Si-Si 1 µm mc-Si Ag ZnO glass substrate High rate plasma deposition of amorphous and microcrystalline silicon: Understanding the film growth mechanism Aarts et al. Appl. Phys. Lett (2007) Aarts et al. Phys. Rev. Lett (2005)

/ Applied Physics In situ dangling bond detection during a-Si:H growth Evanescent wave cavity ring down absorption spectroscopy on dangling bonds dangling bond absorption Aarts et al. Appl. Phys. Lett (2007) Aarts et al. Phys. Rev. Lett (2005)

/ Applied Physics Si-radical growth pulse Surface dangling bond density during growth ~ 5x10 11 cm -2 surface coverage ~ 5x10 -4 !! In situ dangling bond detection during a-Si:H growth Aarts et al. Appl. Phys. Lett (2007) Aarts et al. Phys. Rev. Lett (2005)

Waar komen onze afstudeerders terecht? •Lokale industrie (ASML, NXP, OTB-Solar, Fujifilm, FEI) •Instituten (TNO, ECN, etc.) •Promotieplaatsen bij diverse universiteiten (ook buitenland via de verschillende zeer internationaal georienteerde groepen) / Applied Physics

•Plasma medium: common interest to the PPRT thrust area •Same fundamental knowledge reservoir •Plasmas investigated vary in density and temperatures •Intrinsic nonequilibrium medium •Utilize fundamental knowledge in various applications •Very good example of applied science Plasma Physics and Radiation Technology Experiments and modeling approach