DiPamat Direct Patterning Materials Etch / Plating Resist

What is resist is NOT washed away during resist development Remark: A photo resist is a chemical product that, under the influence of UV light, changes its chemical nature. Resist without UV: is washed away during resist development Resist with UV: is NOT washed away during resist development protects the copper in the etch batch is stripped away after etching Remark: 1 Etch resist: print & etch of inner layers 2 Plating resist: print, plate & etch of outer layers Eric Janssens May 2013

What is resist Liquid photo resist (20%) Dry photo resist (80%) Curtain, roller- or spray coated Thickness: 5 - 20µm Pro: high resolution Contra: dust inclusions and chemical sensitivity Dry photo resist (80%) Cold, hot or wet laminated Thickness: 25 - 75µm Pro: high yield and good tenting Contra: line width Tenting: Via’s must be tented to avoid resist getting in the via Eric Janssens May 2013

Traditional resist printing Workflow: Design Image and develop film, check Coat, laminate resist Image resist If laminated: peel cover layer Develop resist Etch Strip Working with resist is: A time consuming process step Expensive Fixed data Ecological unfriendly Eric Janssens May 2013

Inkjet resist printing Principle: apply etch / plating resist directly on the panel using a set of Inkjet nozzles mounted on a XY table ie without the use of a phototool or screen Workflow: Design Print (with pin curing) Curing (thermal and/or UV) Etch Strip Eric Janssens May 2013

Inkjet resit printing Advantages: Reduce cost no phototool, less production steps shorter production cycle, higher yields Registration panel per panel / distortion compensation front-to-back outer layer to inner layer Design changes & variable data per board Fast (no set up) Ecology Eric Janssens May 2013

Quid May 2013 R&D project is in progress Jetability and etch resistance: OK Stripability: concepts are tested Planning One ER fieldtest in operation by end 2013 Proliferation of ER in 2014 Concept study PR Eric Janssens May 2013

Quid May 2013 Eric Janssens May 2013

Quid May 2013 Eric Janssens May 2013

Quid May 2013 Eric Janssens May 2013

Competition: Dow (Rohm and Haas) www.dowelectronicmaterials.com Phase shift ink Eric Janssens May 2013

Competition: MacDermid www.macdermid.com Eric Janssens May 2013

Competition: MuTracx www.mutracx.com Spin-off from OCE Technologies (Canon) Announces Lunaris: print system and etch resist for IL Phase shift inkl Uses Predict Fieldtest summer 2010 in EU Commercially available by mid 2011 Eric Janssens May 2013

Competition: MuTracx Eric Janssens May 2013

System supplier: MuTracx lunaris animation.avi Eric Janssens May 2013

Inform your customers and prospects on our plans Conclusion Inform your customers and prospects on our plans Gather as much information as possible Don't forget film Eric Janssens May 2013