Weir PSFM Zspin side analysis II Dataset:Integrated_FEM_V_S4_Modified.csv Features:Focus Dose Matrix TEA Systems Corp. 65 Schlossburg St. Alburtis, PA.

Slides:

Advertisements

Similar presentations

Toolkit for testing CCD cameras

Advertisements

SPIE (2005) Vol. 5755_16 TEA Systems, Inc. Terrence E. Zavecz – TEA Systems Inc. March 3, 2005 Full-Field feature profile models.

TEA Systems Corp. Confidential LithoWorks PEB On-Wafer analysis of two wafers August 8, 2003 Thermal analysis of two PEB plates: _peb_bake7.csv _peb_bake8.csv.

Weir PW Analysis of wafer-chuck influence on features Dataset:80_D2_1_2 Features: Device: x5 1:1 / Level: ASML AMD T nm LotName No:80D2_1_2.

We Can Read About Mixing Colors

Approximating the area under a curve using Riemann Sums

Weiring Analysis Process Window Analysis Dataset:Several involving 1:1, 1:2 and 1:3 duty cycles Features:Focus Dose Matrix and Process Window Analysis.

1 ECE 495 – Integrated System Design I Introduction to Image Processing ECE 495, Spring 2013.

Patch Testing HYPACK 2013.

2012 pre-test. 1. Find the area of the region bounded by y=x+3, the x-axis, x=3 and x=5. | | | y = x y = x

Summary of 74 MHz Test with “Power Down” at Parkes Site ( ) New Data file: _1120_z20s.rpf (apparently no matched load data taken this.

Terrence E. Zavecz Vector Raptor VR Matching This presentation illustrates the VR Matching sub-module.

1.Name the quadrant a. (-5, 1)b. (6, -4) c. (5, 8) d. (-8, -1) e. (7, 2)f. (-9, 4)

Weir PW ASML XT14xx – ASML_OV_EX1 Dataset:Overlay & Registration Data Features: TEA Systems Corp. 65 Schlossburg St. Alburtis, PA

Chris A. Mack, Fundamental Principles of Optical Lithography, (c) 2007

Weir PSFM Fixed Focus Analysis Dataset:blanketfocmon.XLS Features:Full-wafer exposure, fixed focus Sections: Comparison of PSFM 180, 160 and PGM response.

TPC status Marian Ivanov. Outlook TPC performance ExB correction Alignment Nonlinearities and edge effects Drift velocity calibration.

Microwindow Selection for the MIPAS Reduced Resolution Mode INTRODUCTION Microwindows are the small subsets of the complete MIPAS spectrum which are used.

Weir Reticle Haze Detection and Monitor What, Why and How to control reticle haze issues.

TPAC update JC/31 st march TPAC1.2 Submitted – 2 nd March 2009 Lot started – 22 nd March 2009 Due date – 7 th May 2009.

TEA Systems Corp. Confidential LithoWorks PEB PEB and CD analysis of two plates August 14, 2003 Thermal analysis of two PEB plates: _peb_bake7.csv.

Areas How do you work out the area of this shape ? HINT.

Extending that Line into the Future St. Louis CMG February 12, 2008 Wayne Bell – UniGroup, Inc.

Correlation and regression 1: Correlation Coefficient

TEA Systems Products Critical Feature and Process Tuning Software Weir PW Weir PSFM Calibration Weir PSFM Fixed-Focus 65 Schlossburg St. Alburtis, PA

Weir PSFM Focus uniformity calculations for lens aberrations, stage & scan characterization and reticle-platen tuning Weir PSFM Weir PSFM and the Benchmark.

Weir PW & LithoWorks PEB Weir PW & LithoWorks PEB Critical Feature and Process Tuning Products Weir PWLithoWorks PEB Weir PW and LithoWorks PEB are a new.

Yield Enhancement thru Modeling TEA Systems TEA Systems Confidential & Proprietary Copyright © 2007 TEA Systems Corp Advanced.

Label the points where the graph crosses the x-axis. x y Problem 1.

Weir DM/DMA Getting Started Tips and procedures for setting up and starting a process automated Weir DM analysis TEA Systems Corp. 65 Schlossburg St. Alburtis,

Regression. Population Covariance and Correlation.

Terrence E. Zavecz TEA Systems Confidential & Proprietary Copyright © 2007 TEA Systems Corp. Vector Raptor.

Point Source Search with 2007 & 2008 data Claudio Bogazzi AWG videconference 03 / 09 / 2010.

COS signal to noise capabilities Limitation of COS S/N No good 2-D flat available. Fixed pattern noise dominates COS spectra. An uncalibrated COS spectrum.

Lecture PowerPoint Slides Basic Practice of Statistics 7 th Edition.

Modern Optics Lab Lab 8: Diffraction by Periodic and Non-Periodic Structures  Transmission grating spectrometer: Measuring and calculating the angular.

1. Introduction 2. The model and experimental design 3. Space-time structure of systematic error 4. Space-time structure of forecast error 5. Error growth.

Terrence E. Zavecz Weir Temporal Response New TEA Systems Software Presentation from new Weir Temporal.

Text on a CCR Matrix using the SuperStar Sequence Editor Brian Bruderer.

Gravitational Lensing

Updated sensitivity estimate Suguru Shimizu Osaka University Sep. 1, 2007 JPARC TREK Collaboration meeting at Saskatchewan (1)Statistical error (2)Systematic.

Crank arm = orange plate with cavity crank axis = black x cam 7 = blue plate inside cavity in crank arm cavity generator = closed red curve on blue plate.

Crank arm = orange plate with cavity crank axis = x at center of black circle cavity 6 = hole in crank arm cam 7 = blue plate inside cavity in crank arm.

Photometry and Astrometry: Bright Point Sources May 16, 2006 Cullen Blake.

Reflection of Light Reflection – The bouncing back of a particle or wave that strikes the boundary between two media. Law of Reflection – The angle of.

Date of download: 7/11/2016 Copyright © 2016 SPIE. All rights reserved. In extreme ultraviolet lithography (EUVL), the leakage of the EUV light in the.

Date of download: 7/11/2016 Copyright © 2016 SPIE. All rights reserved. (a) Red-free scanning ophthalmoscope image of rabbit retina after infrared irradiation.

Matrices Rules & Operations.

How do you assign an error to a measurement?

NAC flat fielding and intensity calibration

Examinations of the relative alignment of the instruments on SOT

Some examples Noughts and crosses exercise

Subpixel Registration and Distortion Measurement

Using Laser Raman Spectroscopy to Reduce False Positives of Autofluorescence Bronchoscopies: A Pilot Study Michael A. Short, PhD, Stephen Lam, MD, Annette.

CHAPTER 1: Picturing Distributions with Graphs

Vector Raptor Overlay Analysis for High-Density ASML Data

Math-2 Honors Matrix Gaussian Elimination

T. J. Okamoto (NAOJ/Kyoto Univ.)

Numerical differentiation

Directional Selection Stabilizing Selection Disruptive Selection

Matrix Addition

Christopher Deufel, Michelle D. Wang Biophysical Journal

Confidence Is the Bridge between Multi-stage Decisions

Franco Pestilli, Marisa Carrasco, David J. Heeger, Justin L. Gardner

Franco Pestilli, Marisa Carrasco, David J. Heeger, Justin L. Gardner

Xbar Chart By Farrokh Alemi Ph.D

Fredrik Elinder, Michael Madeja, Hugo Zeberg, Peter Århem

Phase Equilibria in DOPC/DPPC-d62/Cholesterol Mixtures

Molecular Imager: Focal Plane Array

Presentation transcript:

Weir PSFM Zspin side analysis II Dataset:Integrated_FEM_V_S4_Modified.csv Features:Focus Dose Matrix TEA Systems Corp. 65 Schlossburg St. Alburtis, PA March 29, 2005

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -2- Zspin, site in field center X & Y Calibration

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -3- Upper left corner Y slope is a lot noisier. Could be mask or Archer

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -4- Offset/ full field (mean offset)

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -5- Offset response Xreg = meanYreg +

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -6- Higher-Order Response Variation from Mean response Chart (above) shows variation in slope as a function of its height on field. ?More slope variation in top row

TEA Systems Corp. Confidential ZSPIN Principle: Illustration of systematic errors due to patterning 1 st Exposure: reference pattern 2 nd Exposure: focus sensitive pattern with pinhole offset Resulting behavior through focus: offset focus Black: Individual calibration curve with pinhole aligned Blue and Red: Individual calibration curve with pinhole misalignment Dashed Green: Calibration after combining both calibration curves for any case of misalignment

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -8- Calibration (assume its the Xleft & Xright data) + - offset focus =Xreg-average =(Xleft – Xright)/2 ONLY <> if there is a mask-hole mialignment Simply subtracting is more sensitive to the metrology errors. Better to add in both curves, negate the values of the 2 nd reading and then fit the curve to the result.

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -9- Plotting all points Best response analysis is to include all points Theyll be calibrated out anyway Splitting from: Local aberration of lens or Metrology tool (Y-axis noise) Mask-tool stripe error flat response from: Local aberration of lens or Exposure-tool focus stepping error

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -10- Calibration Summary Calibration stability Focus estimation, one sigma, is only (1.8, 1.3) uncertainty! Focus & Uncertainty

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -11- Calibration Residuals

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -12- X & Y Focus response X slit Y-Scan

TEA Systems Corp. Confidential March 2005Weir PSFM/ ZspinPage -13- Mean Focus response