Weir PW ASML XT14xx – ASML_OV_EX1 Dataset:Overlay & Registration Data Features: TEA Systems Corp. 65 Schlossburg St. Alburtis, PA May 25,2007

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -2- Project Summary Program:Weir PW Situation: ?Import of AMAT NanoSEM 3D with multi-feature types.

TEA Systems Corp. Confidential ASML_OV_EX1_family Analysis of data by wafer

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -4- Overall Data for 3 wafers

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -5- Wafer model Wafer modeled values This is a “Process Model” since we look for vector change as a function of position on the wafer rather than it’s grid location.

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -6- Wafer Response “WaferResponse_Vector” workbook sheet showing residual & systematic variation

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -7- Modeled values for each wafer WaferModel_Vector worksheet

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -8- Residuals to the wafer model

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -9- Wafer & Field Fitted response Only first 5 terms of field model used Validation is turned on Model is fitted to each column of data ?So no trap values

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -10- Field Response only Fitted wafer contribution is not shown here (above) X-offset by column location for 3 wafers

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -11- Offset +/- Std Error Graph generated for each “family” ?In this case for each wafer

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -12- Range of Field Fitted Response

TEA Systems Corp. Confidential ASML_OV_Ex1 May 2007

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -14- ASML XT1400 Family Data Overlay and Matching data Note: ?Data headings have been changed from the dz-H, dz-V names to the correct Xreg & Yreg nams ?Please ignore and dz-h,v names on these graphs

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -15- Imported overlay XY Overlay Data Image Data is summarized on a data sheet Four (4) data sheets are imported 1.Overlay Data 2.Excluded Data points 3.Registration #1 and 4.Registration #2 data

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -16- Excluded Data 25 Data points were excluded All were on the last field of wafer #3

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -17- Registration & Overlay Data Overlay = Reg2 – Reg1 Registration 1Registration 2Overlay

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -18- Raw Overlay Wafer #1 Xoverlay Yoverlay

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -19- Wafer #2 raw overlay XoverlayYoverlay

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -20- Precision Calculation Precision of the Raw X,Y overlay data X & Y registration have an average 2 nm precision (one sigma) Most of the variation comes from InterField or Field-to-Field variation ? i.e. “Stage-stepping precision” Variation within a field is (0,3, 1.6) nm one sigma Wafer to wafer variation is (0.3, 0.6) nm

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -21- Covariance

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -22- ASML Wafer Model

TEA Systems Corp. Confidential Column-base modeled overlay First 5 terms of the ASML model will be applied to each individual column of each field.

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -24- Column model, offset only

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -25- Field-Column Model Response FieldResponse_Column

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -26- Column Model Summary Sheet

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -27- Modeled column offset

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -28- Column offset values Field is next Collapsed into the vector results for a single field

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -29- Offset by column position

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -30- Xreg Column offset by wafer This is X overlay data The “dz-H” value shown here is wrong but the data is right This has been changed Wafer 1 Wafer 2 Wafer 3

TEA Systems Corp. Confidential ASML Row Model

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -32- ASML Row Model Applied

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -33- Row Model Summary Data sheet: “FieldModel_Row_Summary_Xyvec” Only offset values shown Summary of each model fit by row location on field

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -34- Row-model response FieldResponse_Row_Xyvec

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -35- Row Magnification Change

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -36-

TEA Systems Corp. Confidential ASML Full Field Model

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -38- Overall Response of Raw Data

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -39- Overall Model Response

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -40- Wafer (process) based response Vectors are modeled by their location on the wafer ?Does not use “grid” stepping location of scanner ?Process-induced response of overlay or ?Overall effect of wafer mag/rotation error.

TEA Systems Corp. Confidential May 2007Vector Raptor import of ASML dataPage -41- Full-Field, selected components Wafer & Field were modeled Only the offset, mag & rotation were displayed Fitted data is only for these 3 coefficients