Compiled by Chris A. Mack Feb. 17, 2015

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Presentation transcript:

Compiled by Chris A. Mack Feb. 17, 2015 100W by the End of the Year A brief history of broken promises (or at least bad predictions) for EUV source power Compiled by Chris A. Mack Feb. 17, 2015

What I have to Say… EUV lithography has been under development for over 20 years For more than 10 years, promoters of EUVL have been saying the we are “close” to being manufacturing-ready EUV source developers have promised a 100W source “by the end of the year” (or early next year) every year since 2006 We’re still waiting…

History of EUV Litho Development (Peter Silverman, 1st EUVL Symposium, October, 2002)

History of EUV Litho Development (Peter Silverman, 1st EUVL Symposium, October, 2002)

2000

2002 “But to reach the 80-wafers/hour throughput targeted for EUV systems, the source power must be increased to the 50W to 100W range…” “When EUV scanners move into production in 2007 …”

2003 (Charles W. Gwyn and Peter J. Silverman, Photomask Japan 2003)

2005 (SEMICON Japan, December, 2005) “We are working to develop a 100W source by 2007 and to deliver a high volume manufacturing source by 2009.” - Robert Akins, CEO of Cymer …

2006 “IMEC plans to install their ~100W source sometime in early 2007…” …

2008 (Noreen Harned, Sematech Litho Forum 2008)

2008 (Hans Meiling, EUVL Symposium, Sep. 2008)

2009 “Cymer also hinted that it is eyeing a scale-up to 100W exposure power within the current quarter.”

2009 (Martin van den Brink, Imec Technology Forum 2009)

2009 (Martin van den Brink, Imec Technology Forum 2009)

2009 (David C. Brandt, Sematech EUVL Symposium, October 2009)

2010 (Hans Meiling, SEMICON West presentation, July, 2010)

2011 (Skip Miller, SEMICON West presentation, July, 2011)

2011 (Article by Mike Hatcher, Editor in Chief of optics 2011 (Article by Mike Hatcher, Editor in Chief of optics.org, March 23 2011, http://optics.org/indepth/2/3/3) The company is on track to deliver a 100W source to ASML in October 2011, with a 250W source to follow in 2012, with the initial 500W source delivery slated for mid-2013.

2012 (Press Report from the SPIE Advanced Lithography Symposium) "By summertime we should be at the 100W region [at 100 percent duty cycle]" - Marc Corthout, president of Xtreme Technologies GmbH

2012 (Hans Meiling, SEMICON West presentation, July, 2012)

2013 (Skip Miller, SEMICON West presentation, July, 2013)

In the end, it is the resist’s fault. Resist LER Needs Improvement (Peter Silverman, 1st EUVL Symposium, October, 2002) In the end, it is the resist’s fault.