Aretouli E. Kleopatra 20/2/15 NCSR DEMOKRITOS, Athens, Greece

Slides:



Advertisements
Similar presentations
some things you might be interested in knowing about Graphene
Advertisements

Carrier and Phonon Dynamics in InN and its Nanostructures
What is graphene? In late 2004, graphene was discovered by Andre Geim and Kostya Novoselov (Univ. of Manchester) Nobel Prize in Physics Q1. How.
Quasi-vdW epitaxy of GaAs on Si Darshana Wickramaratne 1, Y. Alaskar 2,3, S. Arafin 2, A. G. Norman 4, Jin Zou 5, Z. Zhang 5, K.L Wang 2, R. K. Lake 1.
2012 Transfer-to-Excellence Research Experiences for Undergraduates Program (TTE REU) Characterization of layered gallium telluride (GaTe) Omotayo O Olukoya.
Optical properties of infrared emission quaternary InGaAsP epilayers Y. C. Lee a,b, J. L. Shen a, and W. Y. Uen b a. Department of Computer Science and.
Electron Spectroscopies of InN grown by HPCVD Department of Physics and Astronomy Georgia State University Atlanta, Georgia Rudra P. Bhatta Solid State.
Half-Heusler Compounds for Topological Insulators Joshua Sayre Materials 286G May 26, 2010.
Compact Power Supplies Based on Heterojunction Switching in Wide Band Gap Semiconductors NC STATE UNIVERSITY UCSB Measurements of the E-field Breakdown.
Status of TI Materials. Not continuously deformable Topological Invariant Topology & Topological Invariant Number of Holes Manifold of wave functions.
Raman Spectroscopy of Graphene Applications in Epitaxial Graphene/SiC MVS Chandrashekhar Department of Electrical Engineering University of South Carolina.
Introduction SiC substrate Process Expitaxial graphene on Si – face Expitaxial graphene on C – face Summary Graphene synthesis on SiC.
Techniques of Synthesizing Wafer-scale Graphene Zhaofu ZHANG
RAMAN SPECTROSCOPY Scattering mechanisms
Atomistic Simulation Group
GROWTH AND INVESTIGATION OF HALF-METALLIC Fe 3 O 4 THIN FILMS B. Vengalis, V. Lisauskas, A. Lisauskas, K.Šliužienė, V. Jasutis Semiconductor Physics Institute,
Alloy Formation at the Co-Al Interface for Thin Co Films Deposited on Al(001) and Al(110) Surfaces at Room Temperature* N.R. Shivaparan, M.A. Teter, and.
Optics on Graphene. Gate-Variable Optical Transitions in Graphene Feng Wang, Yuanbo Zhang, Chuanshan Tian, Caglar Girit, Alex Zettl, Michael Crommie,
Alloy Formation at the Epitaxial Interface for Ag Films Deposited on Al(001) and Al(110) Surfaces at Room Temperature* N.R. Shivaparan, M.A. Teter, and.
Applications of MeV Ion Channeling and Backscattering to the Study of Metal/Metal Epitaxial Growth Richard J. Smith Physics Department Montana State University.
CMP Seminar MSU 10/18/ What makes Surface Science “surface” science ? R. J. Smith Physics Department, Montana State Univ. Work supported by NSF.
Spectroscopy of Hybrid Inorganic/Organic Interfaces Vibrational Spectroscopy Dietrich RT Zahn.
Quantum Dots. Optical and Photoelectrical properties of QD of III-V Compounds. Alexander Senichev Physics Faculty Department of Solid State Physics
Optical properties and carrier dynamics of self-assembled GaN/AlGaN quantum dots Ashida lab. Nawaki Yohei Nanotechnology 17 (2006)
Growth and Characterization of IV-VI Semiconductor Multiple Quantum Well Structures Patrick J. McCann, Huizhen Wu, and Ning Dai* School of Electrical and.
Slide # 1 SPM Probe tips CNT attached to a Si probe tip.
Philip Kim Department of Physics Columbia University Toward Carbon Based Electronics Beyond CMOS Devices.
Molecular Dynamic Simulation of Atomic Scale Intermixing in Co-Al Thin Multilayer Sang-Pil Kim *, Seung-Cheol Lee and Kwang-Ryeol Lee Future Technology.
(In,Ga)As/(Al,Ga)As quantum wells on GaAs(110) R. Hey, M. Höricke, A. Trampert, U. Jahn, P. Santos Paul-Drude-Institut für Festkörperelektronik, Berlin.
.Abstract Field effect gas sensors based on zinc oxide were fabricated. In order to increase gas sensor’s sensitivity to carbon monoxide, Au nanoparticles.
Transport experiments on topological insulators J. Checkelsky, Dongxia Qu, Qiucen Zhang, Y. S. Hor, R. J. Cava, NPO 1.Magneto-fingerprint in Ca-doped Bi2Se3.
Molecular Beam Epitaxy (MBE)
Optical and structural properties of RF- sputtered Si x C 1-x thin films International Conference on Nano-Materials and Renewable Energies International.
AlGaN/InGaN Photocathodes D.J. Leopold and J.H. Buckley Washington University St. Louis, Missouri, U.S.A. Large Area Picosecond Photodetector Development.
Techniques of synthesizing mono-layer Molybdenum Sulfide (MoS 2 ) Wu Kam Lam.
Thermoelectric properties of ultra-thin Bi 2 Te 3 films Jesse Maassen and Mark Lundstrom Network for Computational Nanotechnology, Electrical and Computer.
Fabrication of oxide nanostructure using Sidewall Growth 田中研 M1 尾野篤志.
D.-A. Luh, A. Brachmann, J. E. Clendenin, T. Desikan, E. L. Garwin, S. Harvey, R. E. Kirby, T. Maruyama, and C. Y. Prescott Stanford Linear Accelerator.
日 期: 指導老師:林克默、黃文勇 學 生:陳 立 偉 1. Outline 1.Introduction 2.Experimental 3.Result and Discussion 4.Conclusion 2.
Epitaxial superconducting refractory metals for quantum computing
Erie H. Moralesa), M. Batzillb) and U. Diebolda)
Ferromagnetic Quantum Dots on Semiconductor Nanowires
S. A. Giamini. Graphene A hexagonal honeycomb lattice of carbon. In its basic form it is a one-atom thick (2D) sheet. Interesting properties: Better electric.
Gaetano Granozzi Francesco Sedona (PhD thesis) TiOx NANOSTRUCTURES ON A MONOCRYSTALLINE Pt SUBSTRATE Università degli Studi di Padova Dipartimento di Scienze.
Growth and optical properties of II-VI self-assembled quantum dots
MRS, 2008 Fall Meeting Supported by DMR Grant Low-Frequency Noise and Lateral Transport Studies of In 0.35 Ga 0.65 As/GaAs Studies of In 0.35 Ga.
Nano and Giga Challenges in Microelectronics Symposium and Summer School, Cracow, September 13-17, 2004 Atomic scale observation of interface defect formation.
Low-Dimensional Nanoelectronic Materials Use-Case Group Mark Hersam, NU Lincoln Lauhon, NU Albert Davydov, NIST Francesca Tavazza, NISTArunima Singh, NIST.
Saptarshi Das, PhD 2. Adjunct Birck Research Scholar Birck Nanotechnology Center Purdue University West Lafayette, Indiana Post-doctoral Research.
Dirac’s inspiration in the search for topological insulators
Thermal Strain Effects in Germanium Thin Films on Silicon Travis Willett-Gies Nalin Fernando Stefan Zollner.
Topological Insulators
Search for New Topological Insulator Materials April 14, 2011 at NTNU Hsin Lin Northeastern University.
Saptarshi Das, PhD 2. Adjunct Birck Research Scholar Birck Nanotechnology Center Purdue University West Lafayette, Indiana Post-doctoral Research.
MBE Growth of Graded Structures for Polarized Electron Emitters
Riphah International University, Lahore
Introduction Thin films of hydrogenated amorphous silicon (a-Si:H) are used widely in electronic, opto-electronic and photovoltaic devices such as thin.
Yanwen Liu, Weiyi Wang, Cheng Zhang, Ping Ai, Faxian Xiu
Band structure: Semiconductor
Atomic Picture of Crystal Surfaces
Molecular Beam Epitaxy (MBE) C Tom Foxon
Robust topological interfaces and charge transfer in epitaxial Bi2Se3/II-VI semiconductor superlattices (NanoLetters 2015) Zhiyi Chen, Lukas Zhao, Kyungwha.
Wei Luo, Hongjun Xiang* Introduction
2005 열역학 심포지엄 Experimental Evidence for Asymmetric Interfacial Mixing of Co-Al system 김상필1,2, 이승철1, 이광렬1, 정용재2 1. 한국과학기술연구원 미래기술연구본부 2. 한양대학교 세라믹공학과 박재영,
Co-Al 시스템의 비대칭적 혼합거동에 관한 이론 및 실험적 고찰
Anisotropic Polarized Emission from ReS2
Epitaxial Deposition
1.Oxidation effects of 2D-materials
Fig. 1 General characterizations of Bi2O2Se single crystals.
Presentation transcript:

Aretouli E. Kleopatra 20/2/15 NCSR DEMOKRITOS, Athens, Greece Epitaxial growth and study of 2D Se-based ultrathin films: Bi2Se3, MoSe2, HfSe2 , ZrSe2 Aretouli E. Kleopatra 20/2/15 NCSR DEMOKRITOS, Athens, Greece

Outline Topological insulators: Bi2Se3 MBE growth and structural characterization Semiconducting Transition metal dichalcogenides (TMDs) MoSe2 HfSe2 ZrSe2 Conclusions/ Future work

3D Topological Insulators Bi2Se3 , Bi2Te3, Bi1-xSbx Spin locked to orbital momentum Gapless metallic surface states Spin polarized (helical) Dirac cones “insulating” bulk relativistic movement of e- : light-like particles Topologically protected spin k -k k Non-magnetic impurity e- -k -k Backscattering is suppressed Novel switching mechanisms/functionalities Y. Xia et al., Nat. Phys. 5, 398 (2009)

Ultra high vacuum champers for growth and structural characterization XPS RHEED ARPES STM MBE

HRTEM and XPS [11-20] Substrates : 200 nm AlN(0001) /200 mm Si (111) 3QL epitaxial Bi2Se3 Substrates : 200 nm AlN(0001) /200 mm Si (111) 1 QL ~ 1 nm Thick ~ 20 Quintuple Layers (QL) Bi2Se3/AlN No reaction –sharp crystalline interfaces 1 QL Se Bi [11-20] *P. Tsipas et al., ACS Nano, 8 (7), 6614 (2014) High epitaxial quality and “clean” crystalline interfaces

Gapless surface states in ultrathin Bi2Se3 In-situ ARPES Ultrathin films: Hybridization-gap opening Thick films (>6QL exp.): Non-interacting k//,y (Å-1) k //,y (Å-1) Γ Μ 0.47 eV 2nd derivative CB VB Gapless surface states 3 QL Bi2Se3/AlN(0001) 5 QL Bi2Se3/AlN(0001) EF EB (eV) EF Gapless surface states 3QL: Thinnest Bi2Se3 with gapless surface states (Dirac cone) ever reported experimentally ! Reduce surface to volume ratio - applications in nanoelectronics

Heterostructures with Chemically compatible semiconductors Two Layer MoSe2 on Bi2Se3Template RHEED 2ML MoSe2/5QL Bi2Se3 2ML MoSe2 at 300 oC 5QL Bi2Se3 at 300 oC AlN [11-20] azimuth 3QL Bi2Se3/2ML MoSe2/3QL Bi2Se3 aAlN=3.11Å aBi2Se3=4.14Å mismatch of~ 33% 5 QL aBi2Se3=4.14Å aMoSe2=3.299 Å mismatch of ~20% Perfect alignment of the 2 hexagonal lattices No rotated domains-single crystal [11-20] MoSe2 //[11-20] Bi2Se3 // [11-20] AlN

Semiconducting 2D Transition Metals Dichalcogenides (TMDs) Layered TMDs crystals of the composition MX2 : M: transition metal (VIB: Mo, W and IVB: Zr,Hf ) X: Chalcogen species (S, Se, Te) Honeycomb like structures superior properties to those of graphene ??? 2H structure 1T structure Se x y z Mo x y z 6.5Å Se Hf Indirect to direct band gap crossover when thickness reduces to a single layer Indirect band gap very close to Si MoSe2 : E. Xenogiannopoulou et al. submitted 2014 HfSe2 : K.E. Aretouli et al. submitted 2015 anisotropic mechanical optical and electrical properties Sizable band gap in the visible and NIR region of the solar spectrum Applications in Optoelectronic devices(energy conversion systems) and Field Effect Transistors/ low power logic devices

RHEED, TEM, STM of 3ML MoSe2/AlN(0001) Two step growth process d AlN AlN MoSe2 350°C 690°C d AlN vdW gap e b MoSe2 350°C Bi2Se3 300°C MoSe2 350°C MoSe2 350°C MoSe2 690°C f MoSe2 300°C MoSe2 690°C STM image: honeycomb structure Line 1 3.3Å Se 2 1 Se Mo 2Å Line 2 Se Mo estimated distance of 3.3 Å between Se-Se atoms ~ aMoSe2=3.299 Å

Valence Band Imaging He I 1st Brillouin zone MoSe2 He II 1ML MoSe2 3 ML EF 6ML Γ Κ Γ/Α Κ/Η (a) (b) (c) He I Binding energy (eV) K A Γ L M H ΓKMoSe2 =1.274 Å-1 EF He II k// ,y(Å-1) He II (d) (e) (f) Binding energy (eV) k//,y (Å-1) Shift of VB at Γ-point to higher binding energy Indirect to direct band gap transition in the 1ML limit k//,y (Å-1) RT measurements E. Xenogiannopoulou et al. submitted 2014

Raman and PL characterization of MoSe2 films at ML-limit on AlN(0001) Active modes of MoSe2: A1g at 240.8 cm-1 E2g at 288.5 cm-1 B2g at 352 cm-1 in few layer material 190 meV Γ Μ Κ A B The direct band gap in single layers results in intense room temperature photoluminescence (PL) Applications from optoelectronics to energy conversion

HfSe2 and MoSe2 / HfSe2 films on AlN(0001) HfSe2 deposition at 570 oC Annealing at 810 oC 6ML HfSe2 Κ Γ Μ Ef 2 -1 1 -2 -3 -4 -5 Energy (eV) K/H Μ/L Γ/Α M Binding Energy EB (eV) kx (Å-1) (a) (b) AlN 1ML HfSe2 6ML HfSe2 3ML MoSe2 [11-20] azimuth XPS mismatch of ~6% DFT calculations mismatch of ~15% Absence of strain aHfSe2=3.78Å v.d. Waals heteroepitaxy

Conclusions Thinnest Bi2Se3 (3QL) with gapless surface states (Dirac cone) ever reported experimentally High structural quality MoSe2 and HfSe2 on AlN/Si substrates MoSe2/Bi2Se3 and MoSe2/HfSe2 multilayers can be produced Future work Exploring the semiconductors HfSe2, ZrSe2 Electrical characterization of Bi2Se3, MoSe2 HfSe2 , ZrSe2 and their heterostructures Magnetoresistance measurements/ Hall effect measurements

Thank you for your attention