Revolution in physical vapor deposition BY MEAN OF PLASMA ARC ACCELERATOR

Technology Highlights  Coating of heat labile materials  Effective operation in the residual gas atmosphere and reactive gases (nitrogen, oxygen) environment  Coatings with specified properties  Several different materials can be deposited simultaneously or in controlled sequence  Synthesis of the non-transferable material on the surface  Multilayer films can be grown  Roll-to-Roll modification of linear model  Different types of consumables  Operation without micro-drop fraction  Substrate control and transfer of composition  Transfer of electrophysical properties  Substrate zone plasma beam focusing  Permanent “activation” of the substrate by helicon source

Technology Highlights  Known vacuum coating technology, such as thermal, electron-beam, vacuum-arc evaporators and magnetron sputtering systems, cause fractionation of consumable materials and ensure the preservation of its composition in the deposited film. In case this is due to the evaporators Time of Flight effects for components with different masses, and for the magnetron systems - due to the effect of selective spraying at which light components from the target sprayed with greater speed.  Technology from GreSem is performed using a specially designed magnetically activated vacuum-arc source as the generator of the accelerated plasma flow of multi-component coating film and helicon plasma source for surface preparation and its activation during the coating process. TRL rate stage 8 of 9

Specification Deposition rate of metal coatingsto 5 µm / min Deposition rate of dielectric coatingsto 3 µm / min Electricity consumption while depositing 1 µm per 1 dm²0.068 kWh Working pressure for stainless steel depositionFore-vacuum - 3×10+3 to 1×10−1 Pa Ion flow density of the coating material30 mA/cm 2 Energy ion flow eV Coating thickness µm

Plasma source Ion flow density of the coating material is 30 mA/cm 2

Properties of the coatings  Adhesion allows punching, bending and polishing without flaking of the coating;  Coating stainless steel with a thickness of 2 microns to reproduce the purity of the surface treatment article, at a thickness of greater than 5 microns roughness of µ;  If using two sources consumable cathodes of 70 mm diameter, inhomogeneity of the coating thickness is plus or minus 2.5% at the site of an 800 mm wide;  Specific conductivity and density of the coating film thickness of microns tabulated values ​​correspond to the volume of fused material

Helicon source Helicon source affects on stainless steel substrate with eV ion flow energy Evaporation of Cr is visible (blue)

Comparison Our PVD technologyMarket leader PVD technology Deposition rate 300 µm per hr0.5 – 3 µm per hr Deposition temperature (adhesion is equal) 20 … 90 °C250… °C Cathode Regular alloy cathodeSpecial alloy cathode Cathode usage % Up to 60 on substrate…35 recyclable.5…40 Electricity consumption while depositing 1 µm per 1 dm² kWh15…21 kWh Working pressure for stainless steel deposition Fore-vacuum - 3×10+3 to 1×10−1 PaHigh vacuum - 1×10−1 to 1×10−7 Pa x100 faster x10 cheaper x2..20 effective x250 cheaper and ecoFriendly x2..10 easier

Deposit Materials  Any steel alloy and contactors  Elements – Ag, Au, Al, C, Cr, Co, Cu, Fe, Hf, In, Mg, Mo, Mn, Nb, Ni, Pd, Ru, Si, Sn, Ta, Ti, V, W, Y, Zn, Zr.  Nitrides – most nitrides of the elements listed  Oxides – most oxides of the elements listed  Carbides – most carbides of the elements listed  Precious metals – gold, platinum, silver, palladium, ruthenium and iridium.  Compounds and alloys – AlSi, AlSn, AZO, B4C, brass, CrB2, CoCrMo, CuO, Hastelloy, Inconel, ITO, Monel, MoS2, MoST, MoSi2, NiCr, NiCrAlY, NiTi, Permalloy, Stainless Steel, TiAlV, TiB2, WS2, ZnS, ZrB2.  Multilayers  Synthesis of the non-transferable material on the surface

Substrate Materials  Plastic  Steel  Ceramics  Any alloys incl. heat labile  Graded compositions  Co-deposited coatings  Some optical coatings  Ceramics

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