Cleaning of Hydrocarbon Buildup on Metallic-oxide Thin-Films Richard Sandberg Shannon Lunt, Elke Jackson, Kristi Adamson, Ross Robinson, Guillermo Acosta,

Slides:

Advertisements

Similar presentations

Optical Properties of Thin- film Uranium Oxide in the XUV Shannon Lunt, David D. Allred, R. Steven Turley, Elke Jackson, Kristi Adamson, Richard Sandberg.

Advertisements

Sputtering Eyal Ginsburg WW46/02.

Eliminating organic contamination on oxidized Si surfaces using atomic oxygen Liz Strein, David Allred, R. Steven Turley, and the EUV/thin films group.

1 Uranium Oxide as a Highly Reflective Coating from 2.7 to 11.6 Nanometers William R. Evans, Richard L. Sandberg, David D. Allred*, Jed E. Johnson, R.

Silicon Wafer Cleaning for EUV Reflectance Measurements by Cold, High-Pressure CO 2 Jet William Evans Brigham Young University.

Determining Optical Properties of Uranium Oxide Richard Sandberg Brigham Young University Special Thanks to Kristi Adamson, Shannon Lunt, Elke Jackson,

Laser etching of GaN Jonathan Winterstein Dr. Tim Sands, Advisor.

Alloy Thin Films by Multi-Target Sputtering Karla L. Perez MSE/REU Final Presentation Adv. Prof. King and Prof. Dayananda August 5, 2004.

Scanning Electron Microscope Jamie Goings. Theory Conventional microscopes use light and glass lenses SEM uses electrons and magnetic lenses to create.

Plasmon enhanced thin-film solar cells: Advanced theoretical analysis and ellipsometric characterization Supervisor: Jesper Jung Postdoc

Removing Contaminants From Si Wafers Using an O 2 Plasma Ross Robinson Aaron Jackson.

Working towards High Reflectivity in the Extreme Ultraviolet & Soft X-ray Students: Guillermo A. Acosta, Marie K. Urry, Richard L. Sandberg, Kristi R.

1 Oxidation Effects on the Optical Constants of Heavy Metals in the Extreme Ultraviolet Amy Grigg R. Steven Turley Brigham Young University.

2 May May 2006 Determining Optical Constants for ThO 2 Thin Films Sputtered Under Different Bias Voltages from 1.2 to 6.5 eV by Spectroscopic Ellipsometry.

Uranium Oxide as a Highly Reflective Coating from 2.7 to 11.6 Nanometers Richard L. Sandberg Thanks to Advisors: David D. Allred, R. Steven Turley Fellow.

X-ray Photoelectron Spectroscopy —— Application in Phase-switching Device Study Xinyuan Wang A

1 X-Ray Photoelectron Molecular By Amy Baker R. Steven Turley, David Allred, Matt Linford, Yi Lang, BYU Thin Special Thanks to R. Steven Turley, David.

An Initial Study of the Surface Contamination and Oxidation on Silicon Liz Strein, Amy Grigg, and Dr. David Allred.

Comparison of Cleaning Methods for Thin Film Surfaces Lena Johnson, Mitch Challis, Ross Robinson, Richard Sandberg Group 4 English 316 Oral Report June.

REMOVING SURFACE CONTAMINATES FROM SILICON WAFERS Jed Johnson Brigham Young University.

Determining Optical Properties of Uranium Oxide Richard Sandberg Brigham Young University Special Thanks to Kristi Adamson, Shannon Lunt, Elke Jackson,

Thin Film Quantitation of Chemistry and Thickness Using EPMA John Donovan Micro Analytical Facility CAMCOR (Characterization of Advanced Materials in Oregon)

The Deposition Process

MEMs Fabrication Alek Mintz 22 April 2015 Abstract

ELECTROPLATING OBJECTS WITH CHROME MERVE BIYIKLI 9/A 244.

Metal photocathodes for NCRF electron guns Sonal Mistry Loughborough University Supervisor: Michael Cropper (Loughborough University) Industrial Supervisor:

Ion implanter – HV terminal 500 kV a number of Nielsen and RF ion sources for gaseous and solid materials mass analysis better than 1 a.m.u. beam current.

Cleaning of Hydrocarbon Buildup on Metallic-oxide Thin-Films Richard Sandberg Ross Robinson, Dr. David Allred, Dr. R. Steven Turley, Aaron Jackson, Shannon.

Electron Microscopy 1 Electron Microscopy (EM) Applying Atomic Structure Knowledge to Chemical Analysis.

Methods in Surface Physics Experimentation in Ultra-High Vacuum Environments Hasan Khan (University of Rochester), Dr. Meng-Fan Luo (National Central University)

Andrew Jacquier Brigham Young University

Optical Constants of Uranium Nitride Thin Films in the EUV (7-15 nm) Marie K. Urry EUV Thin Film Group Brigham Young University.

Uranium Oxide and Uranium Nitride as Highly Reflective Coatings from 2.7 to 11.6 Nanometers Richard L. Sandberg, Marie K. Urry, Shannon Lunt David D. Allred,

Optical and structural properties of RF- sputtered Si x C 1-x thin films International Conference on Nano-Materials and Renewable Energies International.

Daniel Wamwangi School of Physics

Li-Mn-O Thin Film Cathode prepared at Room Temperature Thin Film & Battery Materials Lab. National Research Lab. Kangwon Nat’l Univ. Jeong-Kyu Lim a, Hyeon-Young.

1 X-Ray Photoelectron Spectroscopy to Examine Molecular Composition Amy Baker R. Steven Turley Brigham Young University.

Optical Properties and Application of Uranium-based Thin-Films for the Extreme Ultraviolet and Soft X-ray Region Richard L. Sandberg, David D. Allred,

Optical Constants of Uranium Nitride Thin Films in the EUV ( eV) Marie K. Urry EUV Thin Film Group Brigham Young University.

Determining the Optical Constants of EUV Reflectors Jedediah Johnson Dr. David Allred.

Department of Chemistry-BK 21, SungKyunKwan Univ.

Thorium Based Thin Films as EUV Reflectors Jed Johnson Brigham Young University.

Thin Film & Battery Materials Lab. National Research Lab. Kangwon Nat’l Univ. Cycle performance of Si-based Thin Film Anodes for Li-ion Batteries Kwan-Soo.

Sputter deposition.

Preparation of cross-section TEM specimen on sapphire substrate

University of Arkansas Fayetteville, Arkansas Plasma Diagnostics for the Deposition of Nanomaterials (Alumina) Jay Mehta Undergraduate.

LIGO-G ITM07 Postmortem H. Armandula, G. Billingsley, D.Cook, R. DeSalvo, G.Harry, B. Kells and L. Zhang LSC Meeting - March 2006.

Center for Materials for Information Technology an NSF Materials Science and Engineering Center Substrate Preparation Techniques Lecture 7 G.J. Mankey.

S.M. Deambrosis*^, G. Keppel*, N. Pretto^, V. Rampazzo*, R.G. Sharma°, D. Tonini * and V. Palmieri*^ Padova University, Material Science Dept * INFN -

About Nanotechnology - general informations -.

MPRI Centralised Laboratories Gerrard Peters School of Physics 1.

Zachary DeLong Advisors: Forrest Schultz and John Kirk University of Wisconsin-Stout Research Problem: - Wood products are limited by their physical properties.

Titanium Nitride Coating by Reactive DC Magnetron Sputtering as a Multipactor Suppressor on Coupler RF Ceramic Windows Walid KAABI Anti e - Cloud Coatings-

Kristal Chamberlain Wellesley College Class of 2012.

Bump Bonding Development

Peking University Improvement of Multilayer Film Growth for Accelerator Cavity by ECR deposition Jiao, Fei.

Sputtering. Why? Thin layer deposition How? Bombarding a surface with ions which knocks out molecules from a target which in turn will redeposit onto.

Study of some gilded film/glass interfaces and of one standard type of “liquid gold” XVI ICF TECHNICAL EXCHANGE CONFERENCE 9 th -12 th October 2004 Karlovy.

Effective substrate cleaning method prior to thin film deposition Sami Kinnunen

Determining Physical and Chemical Constants of Sputtered Uranium and Thorium as Thin Film Reflectors Within the Extreme Ultraviolet (EUV) Winston Larson.

Conclusion An ACF bonding system dedicated for curved substrates has been set up and bonding of polyimide flexcable to curved glass has been successfully.

Pulsed Energetic Condensation of Nb Thin Film Cavities at JLab

Plasma synthesis and processing

Searching for One of Nature’s Missing Crystal Structures

REMOVING SURFACE CONTAMINATES FROM SILICON WAFERS

Nicolas Vandencasteele

Use of a commercial RF Plasma Cleaner in eliminating

IC AND NEMS/MEMS PROCESSES

BONDING The construction of any complicated mechanical device requires not only the machining of individual components but also the assembly of components.

Presentation transcript:

Cleaning of Hydrocarbon Buildup on Metallic-oxide Thin-Films Richard Sandberg Shannon Lunt, Elke Jackson, Kristi Adamson, Ross Robinson, Guillermo Acosta, Nick Webb, Mike Dheil, Luke Bissell

Purpose: Will the Opticlean polymer remove hydrocarbon? Does this cleaning process damage our thin films? Outline 1. Sample Creation &Contamination rate 2. Effects of hydrocarbon “goo” buildup 3. Opticlean Process 4. Opticlean Residue 5. Damage to thin films 6. Removing Opticlean Residue 7. Conclusions

Sample Creation & Contamination Rate  Creation in vaccum chamber RF Sputtering Evaporation  Rates Goo Thickness (Ǻ) Action Performed Elapsed Time (Hrs) 21Open Air Touch fingersInstantaneous 10Dipped in WaterInstantaneous

Reflectivity Effects With Goo Thickness

Opticlean Process Opticlean Residue Opticlean significantly removes goo, but leaves a residue Ellipsometric Results Goo thickness on two runs: 1.17 Anstroms Anstroms

Thin Film Damage  Scanning Electron Microscope with EDAX showed no thin film damage  X-Ray Photoelectric Spectroscopy found no metal traces

Scanning Electron Microscope with EDAX

X-Ray Photoelectric Spectroscopy

Conclusions Subsequent removal of Opticlean residue with plasma etch Conclusion: Opiclean a very effective way to remove hydrocarbon buildup 1.Sufficiently removes goo 2.Does not damage the surface of thin film samples