MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 1 May 15 Source Reduction Efforts at MTV Christopher M. Dott, EHSS Manager

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 2 May 15 History Changes in manufacturing operations correspond directly to the type and amount of waste generated Increase in wafer size and number of layers deposited on wafers contributes to increase in waste creation MTV has undergone cost cutting activities and source reduction is a viable way to help the business help the environment.

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 3 May 15 Do you know where “it” goes? Chemical Input-Chemical Output Process Flow-Chemical Pathway BYPRODUCTS of production Where are toxics being lost? Is there an opportunity for recovery, elimination or reduction? Is there an opportunity for reuse? Forget about treating it, focus on reducing or eliminating it at the source

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 4 May 15 Source Reduction Activities- Wastewater Installation of recirculation filters in cleaning and etching baths to extend bath life Use of dry plasma etch to eliminate the use of aqueous hazardous materials for etch and the use of DI water for rinse Install spray tools to replace wet sinks Identify water trickle purges that are unnecessary and possible diversion valves that have been left in the open position Identify and correct piping leaks Reduce slurry dispense rate for polish and pad conditioning Reverse Osmosis / Recycle loops

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 5 May 15 Source Reduction Activities- Solvents Switch to positive photoresist Reduce CUP rinsing activities Extend number of lots that can be run through a solvent bath Optimize spin coating process by installing more precise pumps Automate as many processes as possible for efficiency Identify any water sources that make up solvent waste stream to minimize water content

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 6 May 15 Source Reduction Activities- Corrosive Liquids Modify bath change-out schedules and procedures Re-circulate baths through filters Check bath concentrations to identify when a more dilute bath can be utilized without affecting quality Replace ammonium fluoride, hydrofluoric, acetic acid mixtures with an all dry single step operation using a reactive ion etcher Identify waste in polishing operations and replace with more updated systems and equipment

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 7 May 15 Source Reduction Activities- Contaminated Debris Replace glass chemical bottles with NOW Packs Increase # of wafers polished per pad Employee training on segregation of non-contaminated debris from hazardous waste Eliminate IPA in many wipe down operations by using DI water Adjust cleaning schedules to minimize wipe downs Limit locations and amount of wipes used where cleaning takes place Optimize maintenance activities to minimize waste materials and debris

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 8 May 15 Other Source Reduction Opportunities Implement a Chemical management System Install efficient processes Minimize water contamination of solvents and acidic wastes –Code requirements? Understanding of constituents? Segregate photoresist strippers Spin dry instead of using IPA

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 9 May 15 Characterizing and Analyzing Processes Gather and organize detailed and comprehensive information Choose process/waste stream for focused examination Create Process Flow Diagram and/or Chemical Pathway Analyses Estimate total byproducts with materials accounting Conduct a Mass Balance

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 10 May 15 Case in Point = Ammonia MTV has a effluent ammonia wastewater limit that did not correspond to our manufacturing need. MTV has undergone a massive ammonia reduction process that has reduced up to 150 gallons of proposed ammonia hydroxide usage through efficiencies and recipe changes, without affecting product quality. MTV was successful in negotiating a load limit for ammonia equivalent to our permit levels which also allows us to recycle more water through RO systems

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 11 May 15 Brainstorming Product Reformulation Input Substitution –Can any raw material be replaced with a less toxic substitute? Process Redesign –Are there alternative ways of processing that would cut down on the use of toxics or byproduct generation? Process Modernization –Are there ways to alter, adjust, modify or replace existing procedures or equipment to cut toxics use or byproduct generation? Improved Operations and Maintenance –How might we reduce the needless waste of the toxic substances we store, transport, handle and use? In Process Recycling and Reuse –Can any of the toxic materials be recycled or reused without leaving the process

MICRON CONFIDENTIAL © 2008 Micron Technology, Inc. All rights reserved. Products are warranted only to meet Micron’s production data sheet specifications. Information, products, and/or specifications are subject to change without notice. All information is provided on an “AS IS” basis without warranties of any kind. Dates are estimates only. Drawings not to scale. Micron and the Micron logo are trademarks of Micron Technology, Inc. All other trademarks are the property of their respective owners. Company Confidential | © 2008 Micron Technology, Inc. | 12 May 15 Low Hanging Fruit Using TOO MANY wipes when cleaning Placing non-hazardous trash in with hazardous waste Placing general trash in with non-hazardous trash Misjudging when to change a bath Fixing leaks and ensuring diversion valves are closed Completely emptying a container of all liquid before sending for disposal Implement an inspection checklist to inspect module debris cans weekly-have waste segregation as part of training procedure