Network for Computational Nanotechnology (NCN) UC Berkeley, Univ.of Illinois, Norfolk State, Northwestern, Purdue, UTEP Quantum Transport in Ultra-scaled.

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Network for Computational Nanotechnology (NCN) UC Berkeley, Univ.of Illinois, Norfolk State, Northwestern, Purdue, UTEP Quantum Transport in Ultra-scaled Phosphorus-doped Silicon (Si:P) Nanowires Hoon Ryu, Sunhee Lee and Gerhard Klimeck (Purdue University, USA) B. Weber, S. Mahapatra and M. Y. Simmons (University of New South Wales, Australia) L. C. L. Hollenberg (University of Melbourne, Australia)

Target of modeling STM planar patterned Si:P wire (1) Ultra-scaled narrow/thin channel. (W < 2(nm), L < 10(nm)) (2) Extremely high channel doping. (~ 1.7x10 14 (cm -2 ), 1/4ML doping) (3) Low-temperature transport in the quantum and quasi-ballistic regime. Features n-Si (~ ) i-Si (~ 25 nm) 2D phosphorus 1/4ML δ-doped layer λ F at T=4(K) ~ 5(nm) [1] L and W of wire channel ~ λ F [1] K. Goh et al, PRB 2007.

Problems to be tackled STM planar patterned Si:P wire (1) Extremely dense doping.  Is it a metal? Questions to answer (2) Gate modulation by in-plane contact  Why is there a local minimum in G? (3) Is the transport channel-confined?

Methodology (1) : Tight-binding band model (1) 10-band nearest neighbor spds* Tight-binding band model based on the localized atomic orbital treatment. Representation of electronic domain using TB approach (2)Appropriate for treating atomistic effects – Surface roughness, Alloy randomness, Lattice distortion due to strain… (3) Structural, material and potential variation treated easily. [1] Choose the crystal type [2] Represent the device atomistically [3] Obtain atomistic Hamiltonian for electronic structure calculation

Methodology (2) : Simulation domain SS DD GG (1)Assumption of homogeneous wire: Super-cell approach with periodic BC Can’t take the whole domain (2) 120ML (~16.3(nm)) thick Si layer to prevent impurity states from being affected by the confinement wall.

Methodology (3) : Charge-potential self-consistency (1) Schrödinger-Poisson equation for the charge-potential self-consistency Densely doped device with many electrons (2) Electron exchange and correlation energy – Local Density Approximation

Bandstructure at charge neutrality 3D: [010] [001] [100] 2D-1D: [110] dispersion G(Ballistic) ~ 6(2e 2 /h) 1Γ 2Γ 1Δ, 2Δ EFEF (1) Conduction band minimum of bulk Si  0 (eV) Semi-metallic property at charge neutrality Projection of 6 ellipsoid in Si bulk 1-D Bandstructure and Density of state (2) Band-anticrossing: play an important role in gate-modulation (next slide) EFEF

Bandstructure at charge neutrality 3D: [010] [001] [100] 2D-1D: [110] dispersion G(Ballistic) ~ 6(2e 2 /h) 1Γ 2Γ 1Δ, 2Δ EFEF (1) Conduction band minimum of bulk Si  0 (eV) Semi-metallic property at charge neutrality Projection of 6 ellipsoid in Si bulk 1-D Bandstructure and Density of state (2) Band-anticrossing: play an important role in gate-modulation (next slide) EFEF

Gate dependence of channel conductance (2) Change electron-filling in the super-cell and computes the bandstructure Understand the minimum in conductance shown with increasing Vg # of modes crossed  Local minimum due to band-anticrossing Nelectron2.0 (Neutral) G(Ballistic)~6(2e 2 /h)~4(2e 2 /h)~6(2e 2 /h) ~10(2e 2 /h) (1) Higher Vg will fill more electrons in channel (3) # of subbands (or modes) crossed by E F – conductance in the ballistic regime

Comparison of channel conductance Experiment vs. Calculation in the ballistic regime spds* TB (T=1.3(K)) Measured at T=1.3(K) Corrected w. contact Rs

Transport through confined channel Charge fraction at δ-doping narrow channel (1) Cut off charge: 1(%) of peak value at charge-neutrality. (2) Effective cross-sectional area ~ 4(nm 2 )

Conclusions Conduction properties of narrowest Si:P nanowires - Atomistic tight-binding calculation coupled with charge-potential self-consistency. Confirmed semi-metallic property of Si:P nanowires - From the bandstructure and fermi-level position. Understood the unusual gate modulation observed in Si:P nanowires - Local minimum in gate-conductance due to the sub band anticrossing. Confirmed channel-confined transport - From the electron distribution on the transport-perpendicular plane. Matching experimental data with gate bias is still under progress - Gate modulation has been considered with different electron-filling in the channel.