Kevin WangNanofabrication Seminar2008/4/27
Aguirre, C.M., Martel, R. et al. Engineering Physics, EP Montréal Chemistry, U. of Montréal Backgated Pentacene Island Thin Film
Double-wall nanotubes Form gaps - electrical breakdown Contacts – optical lithography Ti and Pd by e-beam evaporation Anneal (vacuum) 550°C, 1h Post-Breakdown
Spin-coat precursor 2 mg/mL chloroform solution 13,6-N-sulfinylacetamido- pentacene Converts to pentacene ( °C) Asymmetric CNT – Pd
SWNTs (10 nanotubes/μm 2 ) Ti contacts, optical Lithography, liftoff Sonicate free nanotubes Anneal (vacuum) 550°C, 1h Pentacene (50nm) Vacuum sublimation (0.2nm/s)
W/L = 200μm/20μm Au or Ti, 30 nm thick
40 nm gap device I on /I off = 100 I on = 2nA (V ds = 8V) Superlinear IV Poor gate control t ox = 20 nm Subthreshold Swing 1.3V/dec
Injection from CNT side 21x more current CNT good emitter, poor collector?
CNT array – ideal linear behavior Au, Ti – nonlinear, large contact barriers Barrier at CNT lowered by E-field enhancement Molecular energy shift
Carbon nanotubes enhance transistor current Effective barrier lowering at CNT-Pentacene interface
Ti contacts