EE 403 (or 503) Introduction to plasma Processing Fall 2011 Title of the project Your name

Outline -Introduction into your selected application -Equipment (Power Source, Reactor) -Plasma (properties: n e, T e, etc. & the role of the plasma species such electrons, photons, ions, atoms and molecules in your application) -Results (Advantages and disadvantages of plasma processing compared to other conventional techniques) -Conclusion -References & Links

Average Electron Energy, [eV] Electron Number density, [cm -3 ] Thermonuclear Plasmas Electron Beam Glow Discharge Arc Discharge Solid MHD Generator Ionosphere Solar Corona Interstellar Gas Gaseous Nebulae 1 cm 1 m 1  m 1 Å 1 nm 1 mm P = 100 Hz P = 10 KHz P = 1 MHz P = 100 MHz P = 10 GHz P = 1 THz Type of Plasma and Plasma Parameters

DC, AC, RF, MW Power Supplies Capacitors Focused Laser Beam Electron and ion beams Coupling Solid (e.g. iron, copper, …) Liquid (Mercury, …) Gas (Ar, H 2, SF 6, …) Breakdown Man-Made Plasmas Maintenance