Flash Memory Fault Modeling and Test Algorithm Development

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Presentation transcript:

Flash Memory Fault Modeling and Test Algorithm Development Adviser: Prof. Cheng-Wen Wu 吳誠文 教授 Student: Jen-Chieh Yeh 葉人傑 May 06, 2004 LAB for Reliable Computing Department of Electrical Engineering National Tsing Hua University Hsinchu, Taiwan 30013

Outline Introduction Flash Memory Overview Flash Memory Testing Issues Flash Disturb Fault Modeling Flash Test Algorithm Development Built-In Self-Test (BIST) Design Experimental Results Conclusions

Semiconductor Memory Market Forecast of Web Feet Inc.

Introduction Flash memories are becoming widely used in many applications High density, Low power, On-line update, Non-volatile … Embedded Flash cores thus play an important role in the System-on-Chip (SoC) environment MP3 player MD Cell-phone DSC

Flash Memory Applications NAND SSD USB Drive Serial Access MCP PDA DSC NOR G3 Phone MP3 Cell Phone DVD STB Industrial Controls Random Access PC BISO Low Density High Density Note: MCP = NOR or NAND based Flash devices including RAM in a Multi Chip Package

Two Major Architectures of Flash NOR (Code Flash) NAND (Data Flash) Low Density Higher Cost/Bit Faster Random Access Not Scalable Supplier Differences Higher Density Lower Cost/Bit Faster Sequential Access Scalable Single Standard B$ Forecast of Web Feet Inc.

NAND and NOR Architectures Bit-line Word-line Source line NAND NOR

Read Operation ID “1” “0” ID(“1”) VT Decoder SA ID(“0”) VT_Erase GND GND Vread ID(“1”) VT GND Decoder SA ID(“0”) VT_Erase Vread VT_Program VGS “0” or ”1”

Program Operation (μs) Write Mechanism Program Operation (μs) Erase Operation (m s) Vwl>>0 Vwl<<0 GND Vbl>0 Vs>0 Vbl>0 Vbody>0 Channel Hot Electron (CHE) injection in the floating gate at the drain side Fowler-Nordheim (FN) electron tunneling current through the tunnel oxide from the floating gate to the silicon surface  Erasure is usually performed over a complete block or chip, and hence the name “Flash”  Different process technologies and even manufactures may differ in their choice of the program/erase mechanism

Flash Memory Testing Issues Reliability issues Disturbances: inadvertent change of the cell content due to reading or programming another cell Over-erasing: overstressed cell after erase, leading to unreliable program operation Endurance: capability of maintaining the stored information within specified operation count Retention: capability of maintaining the stored information within specified time limit Long program/erase time Difficult test access for embedded Flash memory ATE price is high, and grows rapidly

Growth of Embedded Flash Memory Embedded Flash Memory Shipments (Worldwide, $ Millions) $ 600 $ 500 $ 400 $ 300 $ 200 $ 100 2000 2001 $ 0 2002 2003 2004 2005 Forecast of CISG (Cahners In-Stat Group)

Approaches Reasonable fault models for reliability-related defects Efficient test algorithms to reduce test time and increase fault coverage Built-in self-test (BIST) circuit for embedded Flash memories Replace or reduce the requirement of ATE “Built-in self-test and built-in self-repair will be essential to test embedded Flash memories and to maintain production throughput and yield.” [Quoted ITRS 2003]

Contribution to Flash Memory Testing Study of Flash Memories Flash Disturb Fault Modeling Fault Simulator: RAMSES-FT Test Algorithm Development Test Algorithm Generation by Simulation: TAGS Proposed First Built-In Self-Test Design for Flash Complete Experimental Results

Fault Modeling Fault model is defined faulty cell behavior Fault model makes analysis possible Fault model makes effectiveness testing Fault model limits the scope of test pattern Defects in Layout Defects in Transistor Faulty Cell Behavior Fault Model

Flash Memory Specific Faults IEEE Standard 1005, “Definitions and Characterization of Floating Gate Semiconductor Arrays”, defines the disturbance conditions Flash memory functional fault models Word-line Program Disturbance (WPD) Word-line Erase Disturbance (WED) Bit-line Program Disturbance (BPD) Bit-line Erase Disturbance (BED) Over Erasing (OE) Read Disturbance (RD) Program Disturb Fault Erase Disturb Fault Read Disturb Fault

Program Disturb Faults Word-line Program Disturbance (WPD) A cell transits from 1 to 0 when another in the same word-line is being programmed (1 to 0) Word-line Erase Disturbance (WED) A cell transits from 0 to 1 when another in the same word-line is being programmed (1 to 0) Bit-line Program Disturbance (BPD) A cell transits from 1 to 0 when another in the same bit-line is being programmed (1 to 0) Bit-line Erase Disturbance (BED) A cell transits from 0 to 1 when another in the same bit-line is being programmed (1 to 0)

Word-line Program Disturbance WPD Conditions: 1.Victim cell initial value is a logic ‘1’ 2.Aggressor “10” (program) Victim “10” (program) G Control Gate S D Floating Gate V(L) V(H) Source Drain V(H) Substrate V(L) B V(Gd)

Word-line Erase Disturbance WED Conditions: 1.Victim cell initial value is a logic ‘0’ 2.Aggressor “10” (program) Victim “01” (erase) G Control Gate S D Floating Gate V(L) V(H) Source Drain V(H) Substrate V(L) B V(Gd)

Bit-line Erase Disturbance BED Conditions: 1.Victim cell initial value is a logic ‘0’ 2.Aggressor “10” (program) Victim “01” (erase) G Control Gate S D Floating Gate V(L) V(H) Source Drain V(H) Substrate V(L) B V(Gd)

Bit-line Program Disturbance BPD Conditions: 1.Victim cell initial value is a logic ‘1’ 2.Aggressor “10” (program) Victim “10” (program) V(H) During programming, erased cells on unselected rows on a bit-line that is being programmed may have a fairly deep depletion region formed under them Electrons entering this depletion region can be accelerated by the electric field and injected over the oxide potential barrier to adjacent floating gates V(H) V(L) V(Gd)

Read Disturbance and Over Erase RD A cell transits from 0 to 1 during the read cycles Relationship with read count (n) <Rn0, 1> In here, we assumed n = 1 OE The threshold voltage of a cell is low enough to turn the cell into a depletion-mode transistor Cell can not be programmed correctly Reading a cell on the same bit line induces a leakage current, resulting in an erroneous read

Conventional RAM Faults Several conventional RAM fault models are also considered useful for testing Flash memory Stuck-At Fault (SAF) Cell or line sticks at 0 or 1 Transition Fault (TF) Cell fails to transit from 0 to 1 or 1 to 0 Stuck-Open Fault (SOF) Cell not accessible due to broken line State Coupling Fault (CFst) Coupled cell is forced to 0 or 1 if coupling cell is in given state Address-Decoder Fault (AF) A functional fault in the address decoder

Test Algorithm Development for the sake of fault coverage (FC) March algorithm often applies test to the SRAM and DRAM Ex: {(w0); (r0,w1,r1);} bit-oriented Ex: 0000 {(wa); (ra); (wb); (rb);} word-oriented Fault Model Test Algorithm Built-In Self-Test Built-In Self-Repair Tester 1 1 1 1

Bit-oriented Flash Memory Test Conventional March tests can not detect all Flash specific faults No (w1) operation in Flash technology Proposed March Flash Test (March-FT) {(f ); Ý(r1,p0,r0); (r0); (f ); ß(r1,p0,r0); (r0);} Regular, easier to generate, covering more functional faults and do not rely on the array geometry or layout topology Notation Operations f Erase p0 Program r1 or r0 Read 1 or 0 Notation Address Sequence Ý Ascending ß Descending Ascending or Descending

Word-oriented Flash Memory Test Word-oriented memory may have intra-word faults Add simple test with multiple standard backgrounds to cover intra-word faults {(f ); (pa,ra); (f ); (pb,rb);} Number of backgrounds is log2(m)+1 m : word width 1 : solid background Example (m = 4): 0000 (f ); Ý(rb,pa,ra); (ra); (f ); ß(rb,pa,ra); (ra); 0011 (f ); (pa,ra); (f ); (pb,rb); 0101 (f ); (pa,ra); (f ); (pb,rb); “0000” is solid background “0011” & “0101” are standard backgrounds

Flash Memory Fault Simulator RAMSES-FT Detect all base fault & disturb fault Used scaling technique Support word-oriented Flash Support physic-address for disturb fault

March-FT Simulation Result {(f); (r1,p0,r0); (r0); (f); (r1,p0,r0); (r0)} This Flash memory is NOR type (STACK gate) Memory size(N) : 65536 Test length : 2(chip erase time) + 131072(word program time) + 393216(word read time) Test length time : 7.207173 sec SAF : 100% (131072 / 131072) P.S. TF : 100% Flash Type = NOR SOF : 100% (65536 / 65536) Gate Type = Stack AF : 100% (4294901760 / 4294901760) Row Number = 256 CFst : 100% (17179607040 / 17179607040) Col Number = 256 WPD : 100% (16711680 / 16711680) Word Length = 1 WED : 100% Chip erase time = 3 sec BPD : 100% Word program time = 9u sec BED : 100% Word read time = 70n sec RD : 100% OE : 100%

Test Complexity 2F + 2NP + 4NR Test Complexity 2F + 2NP + 6NR Simulation Results Bit-oriented Flash memory tests simulation result (128Kbits Flash memory) Flash March [VTS2001] WPD 100% WED 100% BPD 100% BED 100% OE 100% RD 0% SAF 100% TF 100% SOF 50% AF 100% CFst 75% Test Complexity 2F + 2NP + 4NR Test Time 2.503 sec March-FT (proposed) WPD 100% WED 100% BPD 100% BED 100% OE 100% RD 100% SAF 100% TF 100% SOF 100% AF 100% CFst 100% Test Complexity 2F + 2NP + 6NR Test Time 2.516 sec Assumption: F=190ms, P=8us, R=50ns, and N=128K

Simulation Results (cont.) Word-oriented Flash memory tests simulation result (128Kx4bits Flash memory, word width: 4) March FT (Only solid background) WPD 100% WED 100% OE 100% RD 100% SAF 100% TF 100% SOF 100% AF intra 0% AF inter 100% CFst intra 50% CFst inter 100% Test Complexity 2F + 2NP + 6NR Test Time 2.516 sec March FT (With standard backgrounds) WPD 100% WED 100% BPD 100% BED 100% OE 100% RD 100% SAF 100% TF 100% SOF 100% AF intra 100% AF inter 100% CFst intra 100% CFst inter 100% Test Complexity 6F + 6NP + 10NR Test Time 7.497 sec Assumption: F=190ms, P=8us, R=50ns, and N=128K

Test Algorithm Generation by Simulation TAGS [VTS2000] T(N) March-like Tests 2N 3N 4N 5N 6N 7N 8N 9N 10N (f); (r1) (f); (p0); (r0) (f); (r1,p0); (r0) (f); (r1,p0,r0); (r0) (f); (r1,p0,r0); (r0,p0) (f); (r0); (r1,p0,r0); (r0,p0) (f); (r1,p0); (f); (r1,p0,r0); (r0) (f); (r1,p0); (r0); (f); (r1,p0,r0); (r0) (f); (r1,p0,r0); (r0); (f); (r1,p0,r0); (r0)

TAGS Results

BIST Advantages Flash core Functional test (Go / No go) Tester functional easily (Few Logic I/O) Test throughput increased (Pin Count Reduction) Test program simply (Engineer Mode) System-on-Chip (SoC) testing easily Normal Mode Signal Flash core Go/NoGo BIST BNS BMS MUX CLK

Built-In Self-Test Design Flash memory BIST block diagram BSI: BIST serial input BSO: BIST serial output BMS: BIST mode select BRS: BIST reset BNS: BIST/Normal select BCE: BIST commend end CLK: System clock

Case I A typical 4Mbits (512K x 8) embedded Flash memory core with BIST circuitry

Case II A commodity 1Mbits (128K x 8) Flash memory chip with BIST circuitry

Experimental Results Embedded Flash Core Commodity Flash Chip Memory Size 512K bytes 128K bytes Mass Erase Time 200ms 190ms Byte Program Time 20us 8us Erase Penalty 2.5ms 1us Program Penalty 21us Scrambling Type Data Address Built-In Test Algorithm March FT (Only solid background) March FT (With standard backgrounds) Hardware Overhead 3.2% 2.28% Testing Time 44.612 sec 13sec

Conclusions Bit-oriented and word-oriented Flash memory tests are proposed Implemented the BIST circuit for the embedded Flash memory core and commodity Flash memory chip A Flash memory simulator has been developed to facilitate the analysis and generation of the tests Developed March-like test methodology that can be used and reused for various Flash memories Our future work is to support more Flash memory types and other realistic fault models, and to develop a diagnosis and repair methodology for Flash memories

Thank you for your attention!