Mar. 2007 KOLON Electronic Materials B.C. TDS (Technical Data Sheet) KP-2100.

Slides:



Advertisements
Similar presentations
Technical Aspects: the machine the image
Advertisements

Delphi Confidential Precision Bump Formation Mushroom type bump X-Sec laser ablate plated up bump Fabrication process.
Instructions of making PCB by using Negative Film Resist
0 HIGHLY CONFIDENTIAL ILFS New Technology and Product Presentation Presented By: Scott Goldstein-President.
Adhesive bonding Ville Liimatainen Contents Introduction – Adhesive bonding – Process overview – Main features Polymer adhesives Adhesive.
Advanced Manufacturing Choices
Machine Tools And Devices For Special Technologies Chemical machining Slovak University of Technology Faculty of Material Science and Technology in Trnava.
Recent achievements and projects in Large MPGDs Rui de Oliveira 21/01/2009 RD51 WG1 workshop.
Photo Chemical Etching Presentation.  Since 1977, Lancaster Metals Science Corporation has met industries' need for precision metal parts and components.
C h e m i c a l R e a c t i o n s. C h e m i c a l R e a c t i o n A p r o c e s s i n w h i c h o n e s u b s t a n c e i s c h a n g e d i n t o a n.
CHAPTER 9: PHOTOLITHOGRAPHY.
ECE/ChE 4752: Microelectronics Processing Laboratory
FUNCTIONAL CHEMICALS RESEARCH LABORATORIES Copyright(c) NIPPON KAYAKU Co., Ltd. 1 KAYAKU MicroChem. Co., Ltd. MicroChem. Corp. NIPPON KAYAKU Co., Ltd.
INTEGRATED CIRCUITS Dr. Esam Yosry Lec. #6.
One Way Circuits Limited Printed Circuit Board Manufacturer A Guide To Manufacturing Multilayer PCBs Use Left and Right Cursor keys to navigate ESC to.
Photolithography Photolithography is the transfer of patterns, circuits, device structures, etc. to a substrate or wafer using light and a mask.
Pin hole Photograph. WHAT WE DID Photo Paper + Can with a hole + light + Chemicals = An Image.
(Printed Circuit Board) Presented By S.Muthumari
University of Palestine Industrial Engineering Department Materials And Construction Technology Chapter (2) Blocks And Stone works.
 Shutter controls exposure of the film to light by opening and closing at various speeds.  Focal-plane shutter is built into the camera body at the.
Topic 1 different attributes that characterize sensors ETEC 6405.
Atsuhiko Ochi, Kobe University 18/03/2015 RD51 CERN.
Contact Print. A contact print is a photographic image produced from a film, usually a negative. The defining characteristic of a contact print is that.
Lecture 4 Photolithography.
Micro-fabrication.
What are the 3 factors that control exposure?. 3 factors that control exposure Aperture.
By: Anthony Disbrow, and Tyler Ista ENG 45 SRJC 12/13/06.
The Graphical look at typefaces All typefaces are measured in the POINT SYSTEM, usually called pt. One point is equal in line spacing to 0.351mm. The.
VTS Sputter Roll Coater
KOLON Central Research Park Film Research Institute 0 Heat Shrinkable PET Film.
II-Lithography Fall 2013 Prof. Marc Madou MSTB 120
GEM foil and Simulation work at CIAE Xiaomei Li Shouyang Hu, Jing Zhou, Chao Shan, Siyu Jian and Shuhua Zhou Science and Technology Science and Technology.
THGEM-process Rui De Oliveira RD51 22/11/2011 WG6 WG6 22/11/20111Rui De Oliveira.
ISAT 436 Micro-/Nanofabrication and Applications Photolithography David J. Lawrence Spring 2004.
Low Mass Rui de Oliveira (CERN) July
FILM CASSETTES & INTENSIFYING SCREENS WEEK 9
Osaka Organic Chemical Ind., Ltd.
CERN Rui de OliveiraTS-DEM Rui de Oliveira TS-DEM Large size detectors practical limits based on present knowledge.
Lithography. Lithography in the MEMS context is typically the transfer of a pattern to a photosensitive material by selective exposure to a radiation.
 A PCB is printed circuit board, also known as a printed wiring board. It is used in electronics to build electronic devices. A PCB serves 2 purposes.
GO 3 Describe ideas used in interpreting the chemical nature of matter, both in the past and present, and identify example evidence that has contributed.
Soils NOT Just Dirt By: Rebekah Triolo. Defining Soil “a natural body consisting of layers (horizons) of mineral and/or organic constituents of variable.
Antenna Project in Cameron clean room Wafer preparation, conductor deposition, photolithography.
Workshop How to make a PCB
PK-1500 Technical data sheet
PK-1500 Technical data sheet
Chapter 25: Current, Resistance and Electromotive Force
Wisconsin Center for Applied Microelectronics
Sierra Assembly Technology Inc.
Photolithography Photolithography is the transfer of patterns, circuits, device structures, etc. to a substrate or wafer using light and a mask.
Photography Lab.
Drying & Curing Condition
Soft Magnetic Business Unit
Prof. Jang-Ung Park (박장웅)
Lithography.
WELCOME TO AEROLAM INSULATIONS.
3M™ Industrial Packaging Tape Guide
Glass Fractures bsapp.com.
STRAIN GAGE CHARACTERISTICS
JC Technology Resistors.
BioMEMS Device Fabrication Procedure
What determines impedance ?
Product Model Foil Tape
LITHOGRAPHY Lithography is the process of imprinting a geometric pattern from a mask onto a thin layer of material called a resist which is a radiation.
Product Model Black Cloth Duct Tape Fixmart Data Sheet V01
PRODUCT IDENTIFICATION STANDARD ACE FOAM SIZE (±1 TOLERANCE VALUE)
Fluoroscopy: Static Image Recording Systems
Photolithography.
Presentation Pasteruizer Chain for Glass Bottles
Fixation and Optical Lamination
Presentation transcript:

Mar KOLON Electronic Materials B.C. TDS (Technical Data Sheet) KP-2100

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 2 KS-8700 Series GENERAL FEATURES Scum Free Excellent Plating Chemical Tolerance Excellent Alkaline Etching Resistance APPLICATION Plating Process Selective Gold Plating Alkaline Etching FILM SPECIFICATION Thickness : 40, 50 m Color (Unexposed) : Green Color (Exposed) : Blue

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 3 General Properties [Circuit Properties] KP-2140KP-2150 Dry film Thickness (  m) 3848 Minimum Develop Time (sec.) 2634 Step21sst41sst Exposure Property Exposure Energy *1 (mJ/cm 2 ) Circuit *2 Properties Resolution (  m) Adhesion (  m) L/S=1/1 Resolution (  m) *1: Exposure Energy ; Real Exposure energy (ORC UV meter), *2: Circuit properties : Perkin-Elmer 5Kw Collimated Exposure, KOLON TEST Artwork ( Glass Artwork )

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 4 General Properties [Strip Properties] KP-2140KP-2150 Step21sst41sst Strip Properties Stripping Time (sec) 3.0 wt% NaOH Tenting Strength(kg) Instron Elongation(mm) ScumScum GeneratorScum free Skin Size - S : Small, M : Medium, L : Large

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 5 Sensitivity vs. Exposure Energy Test condition Stouffer 21 and 41 Step Tablet, Resist step Exposure System : Perkin-Elmer 5kw Collimated Exposure

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 6 Resolution Test Condition Stouffer 21 and 41 Step Tablet, Resist step Test Artwork : KOLON Test Artwork(Glass Artwork) Lamination Condition : Auto cut sheet laminator(Hakuto 610-I), Temp. 110  C, Pressure 4kg/cm 2, speed 2.0m/min Develop. condition : 1.0wt% Na 2 CO 3, Temp. 30 ℃,Break Point 50%, Spray pressure 1.5kg/cm 2

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 7 Adhesion (Minimum Survived Line Width) Test Condition Stouffer 21 and 41 Step Tablet, Resist step Test Artwork : KOLON Test Artwork(Glass Artwork) Lamination Condition : Auto cut sheet laminator(Hakuto 610-I), Temp. 110  C, Pressure 4kg/cm 2, speed 2.0m/min Develop. condition : 1.0wt% Na 2 CO 3, Temp. 30 ℃,Break Point 50%, Spray pressure 1.5kg/cm 2

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 8 1/1 Resolution Test Condition Stouffer 21 and 41 Step Tablet, Resist step Test Artwork : KOLON Test Artwork(Glass Artwork) Lamination Condition : Auto cut sheet laminator(Hakuto 610-I), Temp. 110  C, Pressure 4kg/cm 2, speed 2.0m/min Develop. condition : 1.0wt% Na 2 CO 3, Temp. 30 ℃,Break Point 50%, Spray pressure 1.5kg/cm 2

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 9 Strip Properties Test Condition Pretreatment ->Lamination->Exposure->Develop->Etching -> Strip Temperature : 50  C, Conc. : NaOH 3, 4 wt% TEST Method : Dipping Method

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 10 Tenting: INSTRON Method KP-2140KP-2150 Step Held (21 SST and 41 SST) 8/21 ; 22/41 Strength(kg) Elongation(mm) INSTRON X = 3Ø Y = 6Ø X = 3Ø Y = 6Ø Stress : Load of Max load when the 6mm hole broken. Average of 8 times test. Strain : Displacement during the hole broken at Max.load(mm) Average of 8 times test.

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 11 SEM Images of KP-2140 (X200, X350) Line / Space = 50 / 50  m 200 Times 350 Times 19 / 41SST(7 / 21SST)22 / 41SST(8 / 21SST)25 / 41SST(9 / 21SST)

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 12 SEM Images of KP-2150 (X250, X400) Line / Space = 50 / 50  m 250 Times 400 Times 19 / 41SST(7 / 21SST)22 / 41SST(8 / 21SST)25 / 41SST(9 / 21SST)

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 13 Evaluation Parameters (Sensitivity) Kolon Step (21) Kolon Step (21) Exposure Step Held Development

[Do It Now] [Execution defines Value] Confidential : Properties of Kolon Ind., Inc. 14 General Process Guideline ProcessRecomendationSpecification Lamination Roll Temp. (°C)110 ± 10 Exit Temp.: 50  10 °C Speed (m/min)2.0 ± 1.0 Roll Pressure (Kgf/cm 2 )3.5 ± 1.5 Holding Time Time (min)15min – 8hrsUnder Yellow Light Exposure Exposure Energy (mJ/cm 2 ) Step Held 7~10/21 ST Without Artwork Resist Step Holding Time Time (min)15min – 8hrsUnder Yellow Light Development Chemical1.0 ± 0.2wt% Na 2 CO 3 *Antifoam: Non-silicon Type (0.05 ~ 0.1 vol%) Temp. (°C)30 ± 2 Break Point50~70% Spray Pressure (Kgf/cm 2 )2.0 ± 0.5 Stripping Chemical2 - 4wt% NaOH Temp. (°C)45-55 Break Point40~60% * Clean Room: 20~22 °C, 50 ± 10 % RH