USC INFORMATION SCIENCES INSTITUTE MOSIS OVERVIEW MSE99 July 19, 1999 César A. Piña
USC INFORMATION SCIENCES INSTITUTE THREE PHASES: n Phase I: DARPA Direct Funded Era: 100% DARPA Funded n Phase II: Multi-Agency Direct Funding DARPA: ~80% Subsidized All Undesrsubscribed Runs NSA, NSF: ~15% Purchased Needed Projects Only Commercial Customers: ~5% Helped to defray Government Costs by using excess area. n Phase III: Self-Sustaining Operations Commercial Customers are Primary Source of Income: ~90% DARPA: ~5%; NSA/NSF: ~5%
USC INFORMATION SCIENCES INSTITUTE TECHNOLOGIES n Supertex SCNA20: 2.00µ 2-metal, 2-poly, NPN, n-well 5V Analog/Digital Integrated CMOS MEMs Orbit Fab purchased by Supertex n AMI ABN: 1.20µ 2-metal, 2-poly, NPN, n-well 5V Analog/Digital Integrated CMOS MEMs n HP AMOS14TB: 0.50µ 3-metal, 1-poly, linear cap, silicide block, n-well 3.3V n AMI C5N: 0.50µ 3 metal, 2 poly, non-silicided, n- well 5V Analog/Digital n HP GMOS10QA: 0.35µ 4-metal, 1-poly, silicided, n-well 3.3V n TSMC : 0.35µ polycided, n-well 3-metal, 2-poly, 3.3/5V 4 metal, 1-poly 3.3V Analog/Digital n TSMC : 0.25µ 5-metal, 1-poly, silicided, n-well 3.3/5v I/O, 2.5/3.3v Core
USC INFORMATION SCIENCES INSTITUTE 20x20mm Die From a 0.35µ Multiproject Run
USC INFORMATION SCIENCES INSTITUTE Future TECHNOLOGIES n HP/CSP/CSM C07: 0.25µ 5-metal, 1 poly, silicided, n-well, 3.3v I/O, 1.8/3.3v I/O, 1.8v Core, 4Q99 5v I/O, 1.8v Core, 1Q00 n TSMC 0.18µ: 0.18µ 6-metal 2.5/3.3v I/O, 1.5/1./8v Core 2Q00 n Peregrine SOI-SOS: 0.50µ 3 metal layers, various options 3Q99 QUAL RUN IN PROGRESS n TSMC 0.15µ: 0.15µ 2.5/3.3v I/O, v Core 4Q01 n HP/CSP/CSM C/G04: 0.15µ 6-metal, 1 poly, silicided, Cu 1.5/3.3v I/O, 1.5v Core 4Q01 n TSMC 0.13µ: 0.13µ 6-metal, 1 poly, silicided, Cu 1.8/2.5v I/O, 1.0/1.2v Core 2Q02 n HP/CSP/CSM C/G04: 0.13µ 6-metal, 1 poly, silicided, Cu 1.8/3.3v I/O, v Core 4Q02
USC INFORMATION SCIENCES INSTITUTE 21st Century MOSIS CMOS will continue to be the dominant technology for the foreseeable future Only known circuit configuration that draws 0 power when not switching CMOS feature sizes will continue to decrease 0.25 0.18 logic 5 yearsCOST 0.25 and 0.18 will probably be the “workhorse” logic technologies for the next 5 years - because of COST I line lithography (365nm) OK nm excimer lasers-fused silica ok “Leading Edge” nm laser-close to short limit for refractive optics Scaling of 0.18 m Lots of engineering problems but doable0.13 Lots of engineering problems but doable
USC INFORMATION SCIENCES INSTITUTE PHOTOLITHOGRAPHY: CONTROLS THE COST Full wafer lithography (FWL) is lowest cost Large payload: >5000sqmm 2um is lowest practical limit 1X Stepper Lithography is next Medium payload: ~ 900 sqmm 1.2um is lowest practical limit 5X Stepper Lithography is next Small Payload: sqmm max. Technology of choice for 1.2um and below 1um defect on mask is 0.2um on wafer 0.5 um - 1.6um mask tech. straightforward Below 0.5um masks become VERY expensive BUT - (Fortunately) THE RETICLE SIZE IS INCREASING AS THE FEATURE SIZE DECREASES!
USC INFORMATION SCIENCES INSTITUTE MOSIS EDUCATIONAL PROGRAM n What is the MOSIS Educational Program? The MOSIS Educational Program provides free fabrication of integrated circuits designed by students in organized classes at accredited U.S. educational institutions. n Who is eligible for funding? Funding is available to accredited U.S. universities who agree to the following terms: Designs must be sent to MOSIS in CIF or GDSII format via the Internet. A report must be sent to MOSIS for each fabricated circuit. n Further Details can be found at:
USC INFORMATION SCIENCES INSTITUTE MOSIS EDUCATIONAL PROGRAM Funding Sources n AMI has donated 4 wafer runs/yr (1.2 /1.5 ) n HP has donated 2 wafer runs/yr (0.5 ) n IBM has donated 2-3 wafer runs (0.35 ) n MOSIS contributes: All administrative costs The Educational share of the 2 wafer costs 0.35 fabrication for a selected number of projects from advanced classes in the regularly scheduled runs. (The 0.25 runs will also become available in the near future) BUT n NSF funding decreasing, BUT some funding remains and will help transition the program to a self-sustaining mode. n Various industrial firms and professional societies have made cash contributions