Fred Chen & Lixin Su SOI DRAM Low Power, Multi-Gigabit DRAM Cell Design Issues Using SOI Technology Fred Chen & Lixin Su May 12, 1999 A Presentation for.

Slides:



Advertisements
Similar presentations
Savas Kaya and Ahmad Al-Ahmadi School of EE&CS Russ College of Eng & Tech Search for Optimum and Scalable COSMOS.
Advertisements

Metal Oxide Semiconductor Field Effect Transistors
Predictably Low-Leakage ASIC Design using Leakage-immune Standard Cells Nikhil Jayakumar Sunil P. Khatri University of Colorado at Boulder.
Lecture 20 ANNOUNCEMENTS OUTLINE Review of MOSFET Amplifiers
Digital Integrated Circuits© Prentice Hall 1995 Devices Jan M. Rabaey The Devices.
VLSI Design Lecture 3a: Nonideal Transistors. Outline Transistor I-V Review Nonideal Transistor Behavior Velocity Saturation Channel Length Modulation.
Lateral Asymmetric Channel (LAC) Transistors
Introduction to CMOS VLSI Design Lecture 19: Nonideal Transistors
Introduction to CMOS VLSI Design MOS Behavior in DSM.
HW#10 will be posted tonight
8/29/06 and 8/31/06 ELEC / Lecture 3 1 ELEC / (Fall 2006) Low-Power Design of Electronic Circuits (ELEC 5970/6970) Low Voltage.
Design and Implementation of VLSI Systems (EN0160) Prof. Sherief Reda Division of Engineering, Brown University Spring 2007 [sources: Weste/Addison Wesley.
Lecture 11: MOS Transistor
Spring 2007EE130 Lecture 43, Slide 1 Lecture #43 OUTLINE Short-channel MOSFET (reprise) SOI technology Reading: Finish Chapter 19.2.
Important note regarding Pre-Lab this week This week you will finish the audio amplifier project by building the tone control and amplifier. In order to.
9/01/05ELEC / Lecture 41 ELEC / (Fall 2005) Special Topics in Electrical Engineering Low-Power Design of Electronic Circuits.
S. Reda EN160 SP’07 Design and Implementation of VLSI Systems (EN0160) Lecture 32: Array Subsystems (DRAM/ROM) Prof. Sherief Reda Division of Engineering,
VLSI Design Lecture 3a: Nonideal Transistors
© Digital Integrated Circuits 2nd Devices Digital Integrated Circuits A Design Perspective The Devices Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic.
EE415 VLSI Design The Devices: MOS Transistor [Adapted from Rabaey’s Digital Integrated Circuits, ©2002, J. Rabaey et al.]
The metal-oxide field-effect transistor (MOSFET)
Digital Integrated Circuits A Design Perspective
Reading: Finish Chapter 6
Week 9a OUTLINE MOSFET ID vs. VGS characteristic
Week 8b OUTLINE Using pn-diodes to isolate transistors in an IC
Chap. 5 Field-effect transistors (FET) Importance for LSI/VLSI –Low fabrication cost –Small size –Low power consumption Applications –Microprocessors –Memories.
Introduction to CMOS VLSI Design Nonideal Transistors.
CMOS VLSIAnalog DesignSlide 1 CMOS VLSI Analog Design.
Spring 2007EE130 Lecture 38, Slide 1 Lecture #38 OUTLINE The MOSFET: Bulk-charge theory Body effect parameter Channel length modulation parameter PMOSFET.
VLSI design Lecture 1: MOS Transistor Theory. CMOS VLSI Design3: CMOS Transistor TheorySlide 2 Outline  Introduction  MOS Capacitor  nMOS I-V Characteristics.
© Digital Integrated Circuits 2nd Devices VLSI Devices  Intuitive understanding of device operation  Fundamental analytic models  Manual Models  Spice.
Low Voltage Low Power Dram
UNIVERSITY OF CALIFORNIA, IRVINE
Digital Integrated Circuits© Prentice Hall 1995 Inverter THE INVERTERS.
1 EE 587 SoC Design & Test Partha Pande School of EECS Washington State University
EE466: VLSI Design Power Dissipation. Outline Motivation to estimate power dissipation Sources of power dissipation Dynamic power dissipation Static power.
MOS Capacitors MOS capacitors are the basic building blocks of CMOS transistors MOS capacitors distill the basic physics of MOS transistors MOS capacitors.
© Digital Integrated Circuits 2nd Devices Digital Integrated Circuits A Design Perspective The Devices Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic.
The Devices Digital Integrated Circuit Design Andrea Bonfanti DEIB
© Digital Integrated Circuits 2nd Devices Digital Integrated Circuits A Design Perspective The Devices Jan M. Rabaey Anantha Chandrakasan Borivoje Nikolic.
Jan M. Rabaey The Devices Digital Integrated Circuits© Prentice Hall 1995 Introduction.
Silicon – On - Insulator (SOI). SOI is a very attractive technology for large volume integrated circuit production and is particularly good for low –
Source: Lundstrom/Fossom/Yang/Neudeck, Purdue EE612 lecture notes.
SOI SPECIFIC ANALOG TECHNIQUES FOR LOW-NOISE, HIGH-TEMPERATURE OR ULTRA-LOW POWER CIRCUITS Promoteurs:Prof. J.-P. Colinge Prof. D. Flandre Jury:Dr. J.-P.
Overview and Device Physics
S. Mattiazzo 1,2, M. Battaglia 3,4, D. Bisello 1,2, D. Contarato 4, P. Denes 4, P. Giubilato 1,2,4, D. Pantano 1,2, N. Pozzobon 1,2, M. Tessaro 2, J. Wyss.
1 Fundamentals of Microelectronics  CH1 Why Microelectronics?  CH2 Basic Physics of Semiconductors  CH3 Diode Circuits  CH4 Physics of Bipolar Transistors.
ECE340 ELECTRONICS I MOSFET TRANSISTORS AND AMPLIFIERS.
EE141 © Digital Integrated Circuits 2nd Devices 1 Digital Integrated Circuits A Design Perspective The Devices Jan M. Rabaey Anantha Chandrakasan Borivoje.
Subcircuits Example subcircuits Each consists of one or more transistors. They are not used by themselves.
THE ELECTROTHERMAL ANALYSIS OF A SWITCHED MODE VOLTAGE REGULATOR Krzysztof Górecki and Janusz Zarębski Department of Marine Electronics Gdynia Maritime.
Vanderbilt MURI meeting, June 14 th &15 th 2007 Band-To-Band Tunneling (BBT) Induced Leakage Current Enhancement in Irradiated Fully Depleted SOI Devices.
Digital Integrated Circuits© Prentice Hall 1995 Devices Jan M. Rabaey The Devices.
Minimization in variation of output characteristics of a SOI MOS due to Self Heating Sahil M. BansalD.Nagchaudhuri B.E. Final Year, Professor, Electronics.
Subcircuits Example subcircuits Each consists of one or more transistors. They are not used by themselves.
11-1 Integrated Microsystems Lab. EE372 VLSI SYSTEM DESIGNE. Yoon Latch-up & Power Consumption Latch-up Problem Latch-up condition  1   2 >1 GND Vdd.
Chapter 2 MOS Transistor Theory. NMOS Operation Region.
MOS Transistor Other handouts Project Description Other “assignments”
The MOS Transistor Polysilicon Aluminum. The NMOS Transistor Cross Section n areas have been doped with donor ions (arsenic) of concentration N D - electrons.
Suppression of Random Dopant-Induced Threshold Voltage Fluctuations in Sub-0.1μm MOSFET’s with Epitaxial and δ-Doped Channels A. Asenov and S. Saini, IEEE.
EE141 © Digital Integrated Circuits 2nd Devices 1 Digital Integrated Circuits A Design Perspective The Devices Jan M. Rabaey Anantha Chandrakasan Borivoje.
Clear Performance and Demonstration of a novel Clear Concept for DEPFET Active Pixel Sensors Stefan Rummel Max-Planck-Institut für Physik – Halbleiterlabor.
Modeling of Failure Probability and Statistical Design of Spin-Torque Transfer MRAM (STT MRAM) Array for Yield Enhancement Jing Li, Charles Augustine,
MOSFET The MOSFET (Metal Oxide Semiconductor Field Effect Transistor) transistor is a semiconductor device which is widely used for switching and amplifying.
INTRODUCTION: MD. SHAFIQUL ISLAM ROLL: REGI:
EE141 Chapter 3 VLSI Design The Devices March 28, 2003.
Week 9a OUTLINE MOSFET ID vs. VGS characteristic
Reading: Finish Chapter 19.2
University of Colorado at Boulder
Hangzhou Dianzi University
Presentation transcript:

Fred Chen & Lixin Su SOI DRAM Low Power, Multi-Gigabit DRAM Cell Design Issues Using SOI Technology Fred Chen & Lixin Su May 12, 1999 A Presentation for EE241 Term Project Department of Electrical Engineering and Computer Sciences University of California at Berkeley

Fred Chen & Lixin Su SOI DRAM Outline of the Project Background Study –SOI Technology –Low Power DRAM Design DRAM Conceptual Design Using SOI –Spice3 for SOI Simulation –Simulations/Results/Conclusions Summary and Future Work

Fred Chen & Lixin Su SOI DRAM SOI Technology for DRAM Fully Depleted (FD) Partially Depleted (PD) Dynamically Depleted (DD) T box Substrate Body S ource Drain Depletion Gate VsVs VgVg VdVd T ox T si VbVb VpVp V bg

Fred Chen & Lixin Su SOI DRAM SOI Technology for DRAM Low Power Small channel leak for same drivability (1) Junction leak reduction (3) Charge/discharge current reduction (2) Body control current reduction (6) Related SOI Features (1) Small S-factor (4) Small substrate bias effect (2) Small Junction Cap. (5) Complete body isolation (3) Small Junction Area (6) Small Body Cap. Low Voltage High drive capability for same leak (1) Large cell readout signal (2) High speed operation (2) (4) Large high-data write margin (4) Easy to apply body control (5) Source: Shimomura et al., JSSC vol. 32, No. 11, Nov. 1997

Fred Chen & Lixin Su SOI DRAM SOI Technology for DRAM What Else? There’s more? : Reduced Second Order Effects –Radiation hardened: Almost Soft Error Free C s reduced  AREA reduced –Free from latchup Disadvantages: –Floating body effect –Self-heating effect Solution: –Body control through body contact schemes –Fully depleted SOI

Fred Chen & Lixin Su SOI DRAM Spice3 for SOI Simulation Source: UC Berkeley Device Group Versions: BSIMPD2.0 & BSIMPD2.0.1 & BSIMFD2.0 & BSIMDD2.0 BSIM3SOI1.3 Model Card: {PD,DD,FD} x {PMOS, NMOS} Spice3 Limitations: –Restricted.subckt & !.param => ! Sweep/Change MOS Parameter –!.measure => Extra Data Processing Need to Improve Work Efficiency!

Fred Chen & Lixin Su SOI DRAM Spice3 for SOI Simulation Simulation Flow: Perl Spice Deck Parameters Results Spice Model Card Script Switch PD DDFD Spice 3 Simulation Engine

Fred Chen & Lixin Su SOI DRAM Single Transistor SOI: The S-Factor

Fred Chen & Lixin Su SOI DRAM Single Transistor SOI: The S-Factor

Fred Chen & Lixin Su SOI DRAM Single Transistor SOI: The Kink

Fred Chen & Lixin Su SOI DRAM Single Transistor SOI: Pass Gate Leakage Current 0v 1.5v 0v ???

Fred Chen & Lixin Su SOI DRAM Low Power DRAM Design Typical large scale low power architectures –Multi-divided data lines –Shared sense amplifiers –Divided word lines Reduce C B, reduce C B ! Half-V dd pre-charge Boosted sense ground SOI

Fred Chen & Lixin Su SOI DRAM DRAM: Comparison Scheme Technology Comparison –Use identical architectures –Match relative performance of each technology model –Use single cell comparison (with SA) –Compare DRAM metrics for each technology

Fred Chen & Lixin Su SOI DRAM DRAM SOI: Cell & Sense Amplifier aa rr pp V dd /2 D Dbar W Wbar WrWr WL Cell Dummy Cell

Fred Chen & Lixin Su SOI DRAM DRAM SOI: Control Signals phip phia phir wr w wbar wl Write 0Read/RestoreWrite 1

Fred Chen & Lixin Su SOI DRAM DRAM SOI: Bit-Line Capacitance

Fred Chen & Lixin Su SOI DRAM Simulation Results

Fred Chen & Lixin Su SOI DRAM Round 1: Bulk vs. SOI

Fred Chen & Lixin Su SOI DRAM Round 2: PD vs. FD

Fred Chen & Lixin Su SOI DRAM Conclusions Performance: FDPD-ActBPD-FltBPD-FixB HighLow Power: FDPD-FixBPD-FltBPD-ActB LowHigh

Fred Chen & Lixin Su SOI DRAM PD vs. FD Tradeoffs Which to choose for DRAM? –Fully Depleted SOI Pros: Low Power, Low C J, low S-factor, no body contact needed, less sensitive to temperature variation Cons: Manufacturability, sensitivity to process variation –Partially Depleted (floating body) Pros: Easy to manufacture Cons: Floating body –Inside PD: body contact tradeoffs, see last slide

Fred Chen & Lixin Su SOI DRAM Work Done & Future Work Work Done: –Single transistor characterization for SOI –Comparison between bulk/different SOI body contact schemes for DRAM cell design Future Work: –More SOI simulation of each component of DRAM –More SOI simulation to study coupling effect, standby current, & pass gate leakage current –Voltage scaling & transistor sizing with SOI