University of Illinois Optical and Discharge Physics SPEED AND SELECTIVITY: CUSTOM WAVEFORMS 200 V (Slow, selective) MASK SiO 2 Si  15 mTorr, Ar/C 4 F.

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University of Illinois Optical and Discharge Physics SPEED AND SELECTIVITY: CUSTOM WAVEFORMS 200 V (Slow, selective) MASK SiO 2 Si  15 mTorr, Ar/C 4 F 8 = 75/25, 100 sccm, 10 MHz/10%  Recipies combining custom waveforms and dynamically adjusted biases optimize speed and selectivity V (Fast, non-selective) 1500/200 V (Fast, selective) ICPP04_21

Ref: E. Aydil 80 mTorr SF 6, 200 W

University of Illinois Optical and Discharge Physics MODELING ADVANCES ADDRESS TECHNOLOGY DEVELOPMENT !The pressure of (hot) HIDs is many atm. !After turn off, the tube must cool to reduce the metal density (increase E/N) so that the available voltage can re-ignite the lamp. !Lamp designs are often driven by startup considerations. !Electron density 5 x x cm ns Ar (75 Torr cold fill) / Hg 100/ Ambient 99.9/ C 97/3 140 C 7/3 220C GE R400 ICPP04_30

PLASMA PROPERTIES: PULSED NEGATIVE CORONA  Development of plasma streamer produces large electric field, electron sources, ionization and radical production.  N 2 /O 2 /H 2 O =79.5 / 19.5 / 1, 1 atm, 15 kV, 0-15 ns  E/N MINMAX Animation Slide  Net Ionization ICPP04_41  [e] OO

University of Illinois Optical and Discharge Physics  Ion penetration is ultimately controlled by surface charging.  O radicals penetrate deeper into the features. SURFACE INTERACTIONS: O RADICALS, IONS  15 kV, 1 atm, N 2 /O 2 /H 2 O=79.5/19.5/1 1x x10 14 MIN (log scale) MAX  [O] cm x x ns 1.4 ns 10  m 1.65 ns4 ns7 ns 10  m +15 kV cycle  Positive Ions (10 9 – 5x10 13 cm -3 ) ICPP04_43