Adam Kueltzo Thornton Fractional North High School August 2nd, 2012 University of Illinois at Chicago Advanced Materials Research Laboratory (AMReL) Mentors:

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Presentation transcript:

Adam Kueltzo Thornton Fractional North High School August 2nd, 2012 University of Illinois at Chicago Advanced Materials Research Laboratory (AMReL) Mentors: Sathess Selvaraj, Jorge Rossero, Dr. C.G. Takoudis, and Dr. G. Jursich Departments of Bioengineering and Chemical Engineering

Purpose Develop a plan for construction of an transportable atomic layer deposition (ALD) reactor ALD reactor will be transported to Argonne National Laboratory In-situ X-ray analysis at the Advanced Photon Source (APS)

Experimental Station at APS

Goals Assess the current status of the ALD system in place Vacuum pump completed …pressure…temperature… Configuration completed…valves…gaskets…tubing Flow meter control completed Other goals to will be met soon

Vacuum Pump Wasn’t pumping down to low enough pressure -30mTorr Tested at machine shop and singled out problems in lab Now pumping down to 10 mTorr Called company and verified parameters

Mass-flow meter calibration Found that the flow rate measured was double that found on flowmeter controller. Compared controller to bubble test. Flowmeter 1 – cc/min Flowmeter 2 – cc/min Flowmeter 3 – cc/min

Flow Bubble Test

Work still in progress Must be designed for transportation Precursor and water bubbler design Metal framing for reactor Exhaust pipe modification Module and solenoid placement Movable reactor Finalize water delivery

Precursor Bubbler

Precursor Bubbler- Conflat-lid type Volume ~ 150 cc T ~ C P ~ 300 mTorr

Water Bubbler

Water Delivery Line MKS P 3-way valve To reactor Water bath Flow meter From cylinder

Exhaust pipe modification

Proposed modification

System Schematic

Purpose Verify growth rate of Cerium Oxide using precursor- Tris(i-propylcyclopentadienyl)cerium Possible use as electrolyte when Yttrium doped in Solid Oxide Fuel Cells (SOFC) High ionic conductivity and lower operating temperature (700 o C) Allows for use of more readily available and cheaper materials

Current ALD Status

ALD Process “One Cycle” Precursor Purge (N 2 ) Oxidizer (H 2 O) Purge (N 2 )

Results

Current Testing TEM imaging taking place 400 cycle sample Annealed 600 o C and 800 o C As deposited

Acknowledgments CBET-NSF Grant # Mentors - Dr. Takoudis and Dr. Jursich Doctoral Students - Sathess Selvaraj and Jorge Rossero Air Liquide

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