J.M. Karam President & CEO MEMSCAP Phone: +33 4 76 52 55 80 Fax: +33 4 76 52 55 81

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Presentation transcript:

J.M. Karam President & CEO MEMSCAP Phone: Fax:

Slide 2 J. M. KaramCompany Confidential SpecificationsArchitectureOptimization Schematic Capture Behavioral Simulation Design Centering Automatic Layout Generation DRC Etching Verification Cross-Section Viewing 3D Viewing FEM/BEM Process Variations

Slide 3 J. M. KaramCompany Confidential SpecificationsArchitectureOptimization FEM/BEM Analysis Behavioral Modeling Behavioral Simulation Layout Generation DRC Etching Verification Cross-Section Viewing 3D Viewing Design Centering Full System Functionality Process Variations

Slide 4 J. M. KaramCompany Confidential Schematic Capture (e.g. DA) Schematic Capture (e.g. DA) Mixed-Technology Simulator (e.g. Continuum/Eldo) Mixed-Technology Simulator (e.g. Continuum/Eldo) Place&Route [Layout Tool] (e.g. IC Station) Place&Route [Layout Tool] (e.g. IC Station) MEMS HDL-A/ VHDL-AMS Library MEMS HDL-A/ VHDL-AMS Library Layout Generators Layout Generators Technology Files Technology Files FEM to HDL-A Translator FEM to HDL-A Translator DRC Cross-Section Viewer Cross-Section Viewer Etching Verification Etching Verification Result Interface Result Interface Field Solvers (FEM, etc.) ANSYS Device Designer System Designer Optimization & Manufacturing Yield Management Tools Layout to 3D Solid-Model Layout to 3D Solid-Model Material Data Base Material Data Base

Slide 5 J. M. KaramCompany Confidential Generic : VULCAIN TM Customizable by the User to the targeted process technology Seamless Design Flow: from Front-End to Back-End Anisotropic & Sacrificial Etching Simulation Multi-Segment, Multi-Angle Cross-Section Viewer Layout to/from 3D Solid-Model Generator EDD TM -Mesh : FEM to HDL-A Translator Foundry Modules : KANAGA TM [MCNC/Cronos] More than 75 Device Generators !

Slide 6 J. M. KaramCompany Confidential MEMS HDL-A Model Schematic Symbol Layout Generator Building Block Level Device Level Generic FEM Validated Characterized Level 2 Level 1

Slide 7 J. M. KaramCompany Confidential Algorithms : Monte Carlo & Surface Response Methods Customizable for any MEMS Process Extract Data from Process of Critical Monitors Build Statistical Model Behavioral Simulation Considering Process Variations Design Centering

Slide 8 J. M. KaramCompany Confidential

Slide 9 J. M. KaramCompany Confidential

Slide 10 J. M. KaramCompany Confidential

Slide 11 J. M. KaramCompany Confidential Ensure Schematic Driven Layout Generators Coupled to System Level Model Improve Productivity at Layout Custom Design Device Generators Functions (Non-Manhattan Shapes) Building Blocks Device Level

Slide 12 J. M. KaramCompany Confidential

Slide 13 J. M. KaramCompany Confidential

Slide 14 J. M. KaramCompany Confidential Anisotropic Etching SimulationSacrificial Etching Simulation

Slide 15 J. M. KaramCompany Confidential

Slide 16 J. M. KaramCompany Confidential  Layout Area Selection o Layout FEM o 3D Viewer (VRML, etc.)

Slide 17 J. M. KaramCompany Confidential

Slide 18 J. M. KaramCompany Confidential