Sources and Beam Lines of Canadian Light Source Emil Hallin Canadian Light Source (material organized and presented by D.T. Jiang)

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Presentation transcript:

Sources and Beam Lines of Canadian Light Source Emil Hallin Canadian Light Source (material organized and presented by D.T. Jiang)

First Phase CLS Beamlines 7 beam lines are funded and approved by the CLS Facility Advisory Committee (Facility Diagnostic Line #1: BM, visible light) Far IR (BM) Mid IR Spectromicroscopy (BM) Soft X-ray Spectromicroscopy (Elliptical Undulator) SGM (Undulator) VLS-PGM (Undulator) Protein Crystallography (Small Gap in- vacuum U) Hard X-ray microXAFS (Wiggler, Ec=10.7keV)

Main Hall Floor plan

Mezzanine Level Expansion Zone - Beamlines Lab Reserve Office Reserve Offices & Labs

High Resolution Far IR Spectroscopy PI: Bob McKellar: Wavelength range:  m, eV, cm -1 Resolution: < cm -1 Endstation: –High resolution Fourier Transform spectrometer –Sensitive FIR detectors; liquid He cooled –Gas Phase work: Coolable long-path cell Multi-pass electric discharge cell High temperature absorption cell Supersonic jet expansion chamber –High pressure: diamond anvil cell, focusing optics, bench & alignment tools –Surface & interface studies: UHV chamber, sample preparation and manipulation, 100  m spot size

Mid IR Spectromicroscopy Mike Jackson: Wavelength:  m, eV, cm -1 Spatial resolution: < 5  m

IR Beamlines

First Mirror Concept

02B1.1 Mid IR Schematic

02B1.1 Mid IR Floor Layout

01B1.1 Far IR Schematic

01B1.1 Far IR Floor Layout

Brightness 100 mA

Soft X-ray Spectromicroscopy PI Adam Hitchcock: Wavelength: 6-60 Angstrom, eV Insertion device: EPU (AppleII, ESRF termination) Infinity corrected entrance slitless PGM with vertical dispersion plane Optics: grating (SX700 style) & zone plate Resolution: 3000 or better Endstation: STXM + PEEM

*16.2 (15.0) 177 o M1 M2 G(1-3) PGM 6o6o STXM 3 exit slit 3 3 M4 PEEM 1 PEEM 177 o 6o6o exit slit 1.5 M3 STXM M3 PEEM EPU Feature XES SM Optical Layout

 Variable polarization: arbitrary linear eV, circular eV  Infinity corrected PGM: STXM at long arm branch (preserved brightness), PEEM (exchangeable) on short (preserve flux)  Nominal energy resolving power 3000, may be increased till 7000  Intensity on sample: STXM-10 8 ph/s at 40nm, PEEM ph/s in  40   Stable operation even for CLS 2005 e- beam parameters SM Optical Description

SGM and VLS PGM PI T.K. Sham: SGM Wavelengths: 200 – 1900 eV PGM Wavelengths: 5.5 – 250 eV SGM Resolution: 3000 PGM Resolution: Optics: grating monochromator Endstations: UHV Capabilities: photoemission, XAFS Both preliminary design reports are complete

Insertion Devices SGM- 44 mm PPM device ~1.2 m long PGM- 185 mm PPM device ~1.8 m long 1.25 mrad total canting between devices Preliminary designs for both devices complete

Protein Crystallography PI Louis Delbaere: Wavelengths: 1.9 – 0.68 Angstrom, 6.5 – 18 keV Resolution: 1.6 x 10 4 using Si(220) Typical Crystal size: 20 – 50  m Design goal: flux of photons/sec into a 50 x 100  m area Design will be modeled after beamlines at SBC- CAT and SER-CAT (APS). Preliminary design is almost complete.

Protein Crystallography Beamline Layout (Based on the Design of SER-CAT/APS)

Small Gap Undulator Brilliance Per =4.5 cm, N=26 (L=1.19m), B 0 =0.843T, K max =3.54

Micro-XAFS Superconducting Wiggler Parameters:  = m Magnet Period Length N = 35.5Number of Periods B = 1.9 TMagnetic Field K = 5.91K Parameter Front End Aperture: 1 mrad (H) x 0.24 mrad (V) Ray-tracing shows that the XAFS focus is ~1050  horizontal (FWHM) x ~257  vertical (FWHM) in size. The Kirkpatrick-Baez mirror pair reduces this down to ~[14-19]  horizontal (FWHM) x [6-9]  vertical (FWHM), using bent elliptical cylinders. PI De-Tong Jiang:

Wiggler Brilliance DTJ Note: This is from the first hybrid design concept, total power SR there would have been 23 kW. Gave up and switched to Superconducting design. The new design is at least another factor of 2 better yet half the total SR power. Smaller SR horizontal fan of course.

Flux at Sample (Shadow tracing) Photon Energy (keV) Photon Flux  -probe Focus: [14-19]  horizontal (FWHM) x [6-9]  vertical (FWHM) x x x x x x 10 7

Micro-XAFS photon flux

Summary of CLS BL Status First 7 lines scheduled operation time: Jan Preliminary designs for most of the first 7 lines are complete Tendering process has been started on beamline and endstation Instrumentation Phase I Insertion device preliminary designs are completed Front ends conceptual design completed

CLS Design Parameters Circumferencem Periodicity12 Optics x (tune) y  x (natural chromaticity)  y Momentum compaction Straights center Number Length  x (betatron)  y  (dispersion) mmmmmmmm RFFrequency Total voltage MHz MV E (energy)GeV2.9 B dipole T1.354 Damping times xyzxyz ms E-loss/turnMeV0.876 DipolesTotal Rad. SR Rad. SR Power per meterkW/m9.76  x (emittance) nm-rad17.8  (energy spread) %0.11 Bunch length (full)ps54

CLS Reference Specifications

CLS Source Point Sizes and Machine Functions

Bending Magnet Brilliance

Bending Magnet Total Flux

Wiggler Total Flux

Small Gap Undulator Flux

Cell 6 Block diagram layout Cell 6 includes the following beamlines, none of which are as yet approved: Hard X-ray Microprobe Powder diffraction CSRF DCM replacement

Cell 6 Elevation concept layout

Cell 7 Block diagram layout

Cell 7 Elevation concept (XAFS Center line)

Cell 7 Elevation concept (Sidestation)

FLUX 100 mA

EPU (conceptual design is issued, no significant influence on machine) Front End (Duplex, conceptual design is issued) Following ALS co-development: M1 mirror (Glidcop), PGM, Mirror manipulator for M1-M4: eng. drawings and part order spec. Vacuum chambers and supports for mirrors need to be designed. PEEM (ordered, summer 2002), STXM (engineering design due to April 02) Exit slits, vacuum equipment, electronics, maintenance/ commissioning equipment- commercial SM AutoCAD layout

Heat load estimation for CSRF SGM at the CLS

Progress Report: (11B1.1) Medium Energy X-ray Facility Beamline (DCM) Updated Calculations 1. Photon flux curves 2. Resolution curves [InSb(111),Si(111)] 3. Resolution from SHADOW Design specification has been written: “Engineering Request for Finite Element Analysis (FEA)/Design of Double Crystal Monochromator beamline crystal cages” Submitted to CLS Engineering (Dan Lowe). Possible Outsourcing: 1. Instrument Design Technology 2. Physical Sciences Laboratory 3. Advanced Design Consulting, Inc. 4. Oxford Danfysik Preliminary design report is still being written. October, 2001  Overlap with Lijun Lu

Photon Flux on sample The theoretical photon flux (photons/second) on sample for a 500 mA beam at the Canadian Light Source in InSb(111) crystals were used in the calculation from eV, while Si(111) crystals were used above this photon energy. Below ~2100 eV the harmonic filter mirror (M5) was “in” place, while above this photon energy it was assumed to be moved “out”. The two curves illustrate the expected photon flux on sample for the conditions of the carbon filter being “in” place, then “out”.

Theoretical resolution (FWHM) and s-polarization peak % reflectivity for Si(111) and InSb(111) crystals The theoretical DCM resolution (FWHM) and s-polarization peak % reflectivity for Si(111) and InSb(111) crystals in parallel orientation (+,-) versus photon energy. The calculated resolutions and reflectivities are based on the combination of both crystals in this configuration.

Comparison of resolution at the experimental focus: SHADOW versus XCrystal (XOP) Comparison of the resolution at the experimental focus calculated by SHADOW using a continuous photon energy input, with that from XCrystal (XOP), for 1840 eV. InSb(111) crystals were used in parallel orientation (+,-) for the calculations.

Protein Crystallography Endstation