Pre-formed channels for laser-plasma accelerators Euroleap kickoff meeting May, 2006, Orsay, France N. C. Lopes Grupo de Lasers e Plasmas Instituto Superior.

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Presentation transcript:

Pre-formed channels for laser-plasma accelerators Euroleap kickoff meeting May, 2006, Orsay, France N. C. Lopes Grupo de Lasers e Plasmas Instituto Superior Técnico, Lisbon cfp.ist.utl.pt/golp

Outline Laser-triggered disharge channels Capillary discharges Discharges on a capillary sequence Discharges through a sequence of thin dielectric plates Guiding & pulse collision on laser-triggered channels High voltage pulser IST Laser- system Previous work Ongoing work 2

Collaborators Laser-plasma Marta Fajardo João Dias R. Onofrei N. Lemos 4 underg. stds Laser Gonçalo Figueira L. Cardoso J. Wemans 2 underg. Stds. UCLA Chan Joshi Chris Clayton Ken Marsh Carmen Constantin F. Fang J. Ralph A. Pak IST 3

plasma channel +- lens HV source capacitor bank resistor Laser HV switch Main Beam: Channeling of main pulse Transversal Probe beam Laser-triggered high-voltage discharges N. C. Lopes et al., Phys. Rev. E, 68, (2003) Main Beam: Trigger pulse + Delayed main pulse Laser triggering No jitter Sync. with laser Helium 2 x ionization Straight plasma line Makes open geometry possible Open geometry Free expansion Transversal access to the plasma Easy to change channel length 4

Plasma production after laser triggering a b c d e f Gap 15 mm N 0 2.5x10 18 cm -3 Plasma diameter ≈150 µm Reproducible tunable delay Helium Trigger laser pulse 1053nm 800 fs 0.26 J contrast F/5 focusing 5

Plasma expansion and channel formation Gap 15 mm N 0 7.4x10 18 cm -3 Plasma diameter ≈150 µm Reproducible tunable delay Helium Electron density lineout Pre-pulse trigg. (worst plasma but more delay) Delay 110 ns Perp. shear interferometry Prop. matched to r 0 ≈35  m 6

Plasma source 1: D 500 um capillary discharge Vacuum chamber D 500 µm capillary + High-voltage pulser (thyratron based) for the capillary discharge, vacuum pumps, diagnostics Gas feed brass Plastic Ceram ic capilla ry Electrode laser n e (100Torr)=6.6*10 18 /cm 3. 5mm 500 µm HVGND UCLA 7

Measuring plasma density (H  Stark broadening) Spectrometer slit H  line  m -300  m x x   (x) -> density(x) n e (10 18 cm -3 ) Capillary UCLA 8

Low intensity laser guiding in single capillary We got n3 (density at 100µm subtract density on axis) about 0.5*10 18 /cm 3 at about 220 torr, which agrees our results from Stark broadening. Experimental data and fit for propagation of Gaussian beam w/wo guiding Output at 3 mm away from exit without guiding Input with guiding Spotsize (µm) capillary Input spotsize Matched spotsize UCLA 9

Measuring the Plasma Temperature using the I H-  /I c and I H-  /I c ratios Line Free-Bound Free-Free Temperature measured at t ≈ ns UCLA 10

Measuring the electron density (time resolved) n e max ≈(7.1 ± 0.8)x10 18 cm -3 UCLA 11

Plasma source 2: D 300  m, length 6 mm - 10 mm - … increase and change channel length decrease filling time and and gas leak to the vacuum system use of high and lower plasma density include transversal plasma diagnostics setup inside vacuum chamber use a sequence of capillaries aligned inside a gas cell Why How 1 cm, 3 capillaries UCLA 12

Guiding in multiple capillary discharges side view Schlieren with background subtraction Preliminary low intensity guiding Output without guidingOutput with guiding Channeling device at vacuum chamber, rep. rate 1 sh. / 5-20 s (vacuum limited, depending on pressure), lifetime > shots (so far) UCLA 13

Discharge trough a sequence of thin plates Why Radial plasma expansion No laser triggering Fast gas filling Different density regions How Reduce the capillary length to about the capillary diameter Keeping the gaps Length 2 cm Gaps 2.5 mm Plate tickness 0.25 mm Hole diameters 0.3 mm Voltage KV 14

High-voltage pulser Thyratron Switch 0-30 KV, 0-5KA Transmission Line Transformer 2 x 4 (input Z 6 Ohm, output Z 100 ohm) Shockline for ns rise time Pulse duration ns Trigger sync. with laser UCLA 15

IST laser system Oscillator Mira+Verdi fs, nm Offner grating stretcher  ~ 15 nm, t p ~ 0.9 ns Compressor E = 30 mJ, t p =200 fs P=0.15 TW Vacuum grating compressor  ~ 6 nm, E = 6 J Target E = 6 J, t p =300 fs P=20 TW 2x passed Ø 16 mm Nd:phosphate rod amplifer  ~ 7 nm, E = 1.5 J 2x passed Ø 45 mm Nd:phosphate rod amplifer  ~ 6 nm, E = 9 J Ti:sapphire regen. amplifier  ~ 9.5 nm, E = 4 mJ Yb:Glass Reg. Amp.  ~ 8 nm, E = 50 J 16

Conclusion Channels in a sequence of capillaries Characterization and guiding Ready for high-power guiding (1 cm dephasing length) Characterization at lower densities Laser-triggered channels on free space Channels in a sequence of thin plates Characterization after July 06 Support at IST High-voltage pulser 20 TW Laser system