Work in Progress --- Not for Publication p. 1--PIDS Summary, Dec.04 PIDS Summary Peter M. Zeitzoff US Chair ITWG Meeting Tokyo, Japan November 30 - December 1, 2004

Work in Progress --- Not for Publication p. 2--PIDS Summary, Dec.04 PIDS Summary Logic –With Design: need to further explore leakage and performance requirements Relation between gate and S/D leakage –Re-evaluate LOP and LSTP performance vs. leakage requirements –Consider alternate, parallel scenarios for introduction of non-classical CMOS options in our scaling/technology requirements table for high- performance logic Extending planar bulk until multiple-gate MOSFET is available vs. current option of introducing UTB FDSOI in 2008, then introducing multiple gate in 2010 The reason to do this: better reflect reality A test case for doing this using 2003 PIDS high- performance logic has been carried out –Tentative: main impact of extending bulk: increased leakage current, increased mobility enhancement factor from strain, mobility enhancement

Work in Progress --- Not for Publication p. 3--PIDS Summary, Dec.04 PIDS Summary DRAM: no change in scaling of half pitch (F) from 2003 ITRS F=90nm in 2004 –Definition of F is bitline (M1) half-pitch –Survey sent out to main vendors, most of vendors have replied –Important issue: a=(storage cell area)/F^2. Currently is 8 for most vendors, when will it be reduced to 6? Flash: preliminary survey acceleration of scaling (for NAND/AND) by one year compared to DRAM