Work in progress Do not publish or distribute ITRS Factory Integration (FI) Update Public Conference Gopal Rao Factory Integration Chair July 2011 San.

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Presentation transcript:

Work in progress Do not publish or distribute ITRS Factory Integration (FI) Update Public Conference Gopal Rao Factory Integration Chair July 2011 San Francisco, CA 2011 FI Contributors: Gopal Rao, James Moyne, Les Marshall,Richard Oechsner,Julian Montoya, Al Chasey, Parris Hawkins, Leo Kenny, Shige Kobayashi,Daniel Babbs, Terry Francis, Akira Kashimoto, Mike Mocella, Andreas Neuber, Peter Csatary,, Reiner Missale, Mike Czerniak, Silke Hermanns, Mike Garner, Scott Jones, Dan Herr, Dave Eggleston, Astrid Gettel, Dave Eggleston, Gino Crispieri, Daniel Stevens Kristy McDonald

Work in progress Do not publish or distribute Factory Integration Summary All FI technology requirements tables and potential solutions tables updated Operations, Equipment, AMHS, FICS and Facilities Chapter write up done – finals edits in progress Very good job by FI team members – Thanks to all who participated and contributed! Identified key focus areas for FI Energy issues identified from 2 Workshops on Energy Productivity, quality improvements and waste reduction for 300/450mm Energy & Resource Conservation, efficiency and compliance Migration from reactive to predictive approach in control, scheduling, maintenance and yield management Green technologies for facilities management Decision Support based on effective data usage & management

Work in progress Do not publish or distribute Factory Integration Summary Key Focus areas in 2 nd half of 2011 Cost and Energy modeling for process tools Linking facilities and fabs to common goals Explore predictive systems and control methodologies Workshop topic in July 2012 Yield based control methodologies Manufacturing process quality improvements 300mm/ 450mm productivity improvements Energy conservation/efficiency/metrics (collaboration with ESH) Feedback to Standards (FI will facilitate a better alignment with relevant Semi Standards) EUV introduction Long Term Focus Areas Future generation Fab productivity and cost optimization Fab Simulation with Real time adjustments

Work in progress Do not publish or distribute Factory Integration Scope and Drivers Fab Sort Assembly & Test Distribution FEOL BEOL Probe/Test Singulation Packaging Test Si Substrate Mfg Reticle Mfg Increasing cost & Cycle time implications Factory is driven by Cost, Quality, Productivity, and Speed Reduce factory capital and operating costs per function Faster delivery of new and volume products to the end customer Efficient/Effective volume/mix production, high reliability, & high equipment reuse Enable rapid process technology shrinks and wafer size changes Factory Operations Production Equipment AMHS Factory Information & Control Systems Facilities UI

Work in progress Do not publish or distribute 5 Factory Integration Requirement Drivers Cycle Time/Operational Flexibility: Multiple lots per carrier and/or fewer wafers per carrier. Get new products to customer much faster. Cycle Time Reduction & Operational flexibility Output per tool must increase: Find breakthrough solutions that result in significant increases in good wafer out and increased OEE (eg: APC, e-Diag) More good wafers out per tool The 300mm factory is much more automated and must be designed to transport hot-lots and hand-carrys. Highly automated factory Reduce time to $$$/Cycle-time reduction: What are stretch goals for cycle time from ground-breaking to first full loop wafer out. How to achieve quicker shrink? Reduce Time to Money Increased floor space effectiveness: Dont want each new generation to drive big increase in cleanroom size, esp. since fab is segregated Cu/non-Cu and new metal layers added at each node. Factory size is becoming an issue

Work in progress Do not publish or distribute 2011 ITRS Factory Integration 6 FI Sub team –Some Emerging Themes/Challenges Subteam2011 Challenges 1Factory Operations (FO) Focus: 1) Reduce Lot Cycle times, 2) Improve Equipment Utilization, 3) Reduce Losses from High Mix Wait time waste reduction Proactive data visualization 2Production Equipment (PE) Focus: 1) NPW reduction, 2) Reliability Improvement, 3) Run rate (throughput) improvement 4) Equipment Intrinsic efficiency Equipment Engineering capabilities 300mm/450mm Productivity and Quality improvement Energy Conservation and Efficiency Reactive to Predictive control Designed in APC for tools 3Automated Material Handling Systems (AMHS) Focus: 1) Increase throughput for Traditional and Unified Transport, 2) Reduce Average Delivery times, 3) Improve Reliability AMC Prepositioning of carriers 4Factory Information & Control Systems (FICS) Focus: 1) Increase Reliability, 2) Increase Factory Throughput Data Quality Reactive to Predictive control 5Factory Facilities (FF) Focus: 1) Reduce Costs 2) Utility 3) Footprint Improve integration between PE and Facility Systems Improve Facility design and construction cost control Improve Facility and PE Interface Improve Facility response to ESH requirements

Work in progress Do not publish or distribute 7 Some Projected Attributes of a 300mm < 45nm Fab SECS Control Line Equipment Data Acquisition (EDA) Standards to get Rich Equipment Data Manufacturing Execution Systems Predictive Factory Scheduler And Material Control Full Wafer Level Tracking & Recipe/Parameter Changes 100% Direct Tool Delivery AMHS Ubiquitous APC; Rapid Process Matching & New Product Qualification Standard, Detailed Equipment Performance Tracking (EPT) Data Systems Scaled for > 50k wspm Data standards and Systems for Rapid Mask Set Creation Aggressive NPW Reduction & Efficient Spares Mgmt Very Fast Cycle time Fabs for Hot & Normal lots Wafer Data Standard For Packaging Offline tools to test schedule rules and rapidly put in Mfg. Predictive Maint. and PM scheduling. Pervasive E-Diagnostics SPCR2RFDC YieldVMEPT Equipment Engineering Capabilities Recipes E-Diag Equipment Control Systems Partner, Customer Or Supplier Equipment & Systems designed for High Mix operation & Mega Fabs Equipment & Process Data Source: International Technology Roadmap for Semiconductors PPM

Work in progress Do not publish or distribute 8 EES (Equipment Engineering System) Factory Network APC App 1 APC App 2 e-Diag App 1 OEE App 1 OEE App2 FDC App1 EE Applications Equipment Engineering Network EE Access Control EE Data Collection And Storage MES Equipment Control WIP Tracking Factory Scheduling Global EE Data Fire Wall SECS/GEM Interface Interface C Interface A Interface B Communication Standards EQIP E126 PCS E133 EDA E134/132 Moyne 2006 Other standards to list: E147: Time Sync Data Quality (E151 + …) EPT standard??? E84? Parallel/IO GEM E30

Work in progress Do not publish or distribute Building Information Model & Vision in support of Facility Life Cycle

Work in progress Do not publish or distribute Factory Integration Conclusions All FI technology requirements tables and potential solutions tables updated Operations, Equipment, AMHS, FICS and Facilities Identified key focus areas for FI Plans defined for 2011 and beyond Migration from reactive to predictive mode of operations Working with other TWG on cross-cut issues 2 Workshops on Energy organized with ESH Alignment between facilities and ESH Definition of energy metrics for ITRS tables Virtual metrology and other predictive techniques with Metro EUV Timing and alignment with Facilities design 450mm timing and requirements