A Class Presentation for VLSI Course by : Fatemeh Refan Based on the work Leakage Power Analysis and Comparison of Deep Submicron Logic Gates Geoff Merrett.

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Presentation transcript:

A Class Presentation for VLSI Course by : Fatemeh Refan Based on the work Leakage Power Analysis and Comparison of Deep Submicron Logic Gates Geoff Merrett and Bashir M. Al-Hashimi ESD Group, School of Electronics and Computer Science, University of Southampton, UK Integrated Circuit and System Design, Power and Timing Modeling, Optimization and Simulation; 14th International Workshop, PATMOS 2004, Santorini, Greece September 15-17, 2004

Outline Background Introduction Design of Low Order Gates Design of Higher Order Gates Input Pattern Ordering

Background Design styles : COMP Partitioned CPL TG DCVSL DPL LP Power Consumption Leakage Current Estimation

Complementary CMOS (COMP) NMOS pull-down & dual PMOS pull-up Complementary inputs High number of transistors (XOR : 12) … NAND XOR

Partitioned Logic (NAND) Breaks down a higher order gate into lower order gates Faster than a CMOS high order gate

Complementary Pass Logic (CPL) Two NMOS logic networks Two small pull-up PMOS transistors for swing restoration Two output inverters for the complementary outputs Number of transistors (10) NAND XOR

Transmission Gate (TG) XOR An NMOS to pull-down and a PMOS to pull-up Solution to the voltage- drop problem Based on the Complementary properties of NMOS and PMOS Low number of transistors (4)

Differential Cascade Voltage Switch Logic (DCVSL) XOR Two NMOS logic networks Two small pull-up PMOS transistors for swing restoration Differential logic and positive feedback Number of transistors (8)

Double Pass Logic (DPL) XOR Dual-rail pass-gate logic Both NMOS & PMOS logic networks are used in parallel High number of transistor (12)

Low Power (LP) XOR Using drivers to complete the high output logic when input is “11” Low number of transistors (6)

Power consumption Dynamic : switching Short-circuit Static: Gate leakage Sub-threshold leakage: weak inversion current

Leakage Current Estimation Number of stacked transistors Parallel or series transistors

Introduction Decreasing the Dimensions ? Effects on power consumption Solution and limitation Leakage power reduction techniques: Supply voltage reduction Supply voltage gating Multiple or increased threshold voltages Minimizing leakage power consumption in sleep states

Parameters Variation Berkeley Predictive Technology Models (BPTM) Basic gates : NAND, NOR, XOR Three DSM process tech. : 0.07, 0.1, and 0.13um Different design styles : NAND, NOR : COMP, Partitioned, CPL XOR : COMP, CPL, TG, DCVSL, DPL, LP FAN-in : 2, 4, 6, 8 Input ordering

Design of Low Order Gates (NAND/NOR) The leakage power of a CPL gate is four times that of the COMP gate There are no stacks Extra leakage current is drawn through: level-restoring output-driving circuitry The leakage power in a CMOS circuit increases as the technology shrinks

Design of Low Order Gates (XOR) LP (area, speed and power): The least leakage power Few transistors Low delays Low dynamic power COMP Low leakage power Less than 30% worse than LP

Design of Higher Order Gates COMP gate consumes less power more transistors there in the stack Partitioned logic is faster, for fan-in greater than 6

Input Pattern Ordering (2-input NAND) leakage current in a stack is ‘almost’ independent of ordering for a constant number of ‘off’ transistors the leakage power is the same for inputs “0,1” and “1,0” at 0.35u the difference increases as the DSM process shrinks

Input Pattern Ordering (higher order gates) The leakage power varied considerably for patterns containing only one ‘zero’ For NMOS stacks (NAND gates): a ‘zero’ closest to the output gives the largest IS1 a ‘zero’ closest to ground gives the smallest IS1 For PMOS stacks (NOR gates): a ‘one’ closest to the output gives the largest IS1 a ‘one’ closest to Vdd gives the smallest IS1