Network for Computational Nanotechnology (NCN) Purdue, Norfolk State, Northwestern, MIT, Molecular Foundry, UC Berkeley, Univ. of Illinois, UTEP Tight-Binding.

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Presentation transcript:

Network for Computational Nanotechnology (NCN) Purdue, Norfolk State, Northwestern, MIT, Molecular Foundry, UC Berkeley, Univ. of Illinois, UTEP Tight-Binding Modeling of Intermediate Valence Compound SmSe for Piezoelectronic Devices Zhengping Jiang*, Yaohua Tan, Micheal Povolotskyi, Tillmann Kubis, Gerhard Klimeck (Purdue University) Marcelo Kuroda, Dennis Newns, Glenn Martyna (IBM) Timothy Boykin (The University of Alabama in Huntsville)

2 Outline Motivation »Beyond Moore’s Law »Next Generation Switch Piezoelectronic Transistor »Device Design »Working Principle Metal Insulator Transition in SmSe Tight Binding Parameterization Summary

3 Beyond Moore’s Law Heat dissipation prevents any performance improvement through increasing clock frequency! Thinking Beyond Moore’s Law → Beyond Si FET Technology drives device to scaling limit. Latest Generation FinFET 60mV/dec barrier still exist

4 Next Switch Energy Filtering Internal Voltage Step-upInternal Transduction TFET Ferroelectronic FET & quantum capacitive device Spin fet & nano-electromechanical switch Low Subthreshold Swing → Circumvent the Boltzmann distribution or break the direct voltage-barrier relation Quantum tunneling instead of thermal emission Lower voltage to flip spin then modulate barrier height

5 Piezoelectronic Transistor (PET) Energy Filtering Internal Voltage Step-up Internal Transduction PiezoResistive Material (e.g. SmSe) Relaxor PiezoElectric Material (e.g. PMN-PT) 2 Channels3 Contacts Voltage INPUT Current OUTPUT Properties of PE and PR enable internal voltage step-up and internal transduction of acoustic and electrical signals. Pressure induced metal insulator transition Deformation due to E field

6 Working principle Internal Voltage Step-up Internal Transduction Pressure on PR PR: insulator to metal transition Deformation Gate Voltage Vg How does PET achieve SS<60mV/dec? Voltage applied on Gate – Common terminals: Deformation inside PE channel Electrical → Acoustic Vg Current in PE channel Acoustic → Electrical

7 Mechanical and Electrical Features SmSe Phys. Rev. Lett. 25, 1430 (1970) Internal Transduction Internal Voltage Step-up D. M. Newns, B. G. Elmegreen, X. H. Liu and G. J. Martyna, Advanced Materials (2012). PET is capable of high performance and large scale integration! Large Area / Volume Ratio Between PE/PR Hammer-Nail Effect Small Deformation in PE → Large Strain in PR High response PE and big conductance change in PR 1.High response Relaxor Piezoelectric Material 2.Sound velocity in nanostructure → high speed 3.Small Volume Change → Big Resistivity Change in PR 1.High response Relaxor Piezoelectric Material 2.Sound velocity in nanostructure → high speed 3.Small Volume Change → Big Resistivity Change in PR

8 Metal-Insulator Transition in SmSe Conventional Ec Conventional Ev 5d 4p 4f Eg = 0.45eV 5d 4p 4f Pressure Insulating materialConducting material Scaling limit of PET determined by onset of tunneling. Quantum transport for MIT in tight-binding. f-electron band, New Ev

9 Methods 1. ab-initio calculation 2. Determine TB model and fitting variables → Analytical formula for TB basis functions is Tesseral function, is to be parameterized 2. Determine TB model and fitting variables → Analytical formula for TB basis functions is Tesseral function, is to be parameterized Ab-initio band structure E i (k) Wave functions GGA + U 3. Iteratively optimization  DFT Hamiltonian to TB Hamiltonian: basis transformation H ab-initio  H TB  Approximate H TB by two center integrals  Compare Ek with DFT and redo Step Iteratively optimization  DFT Hamiltonian to TB Hamiltonian: basis transformation H ab-initio  H TB  Approximate H TB by two center integrals  Compare Ek with DFT and redo Step 3. 4.Parameter refinement by simplex method → Target: Ek along high symmetry directions 4.Parameter refinement by simplex method → Target: Ek along high symmetry directions

10 Determine tight binding model Require TB model: sp3d5f7s* + SO SmSe: DFT bandstructure DFT decomposition: DOS into angular momentum Se p-orbital: lower valence band Sm d-orbital: conduction band Sm f-orbital: top valence band Splitting of f-orbital: covered through SO coupling DFT density of states: f-electron splitting due to strong correlation

11 Strain effects on bandstructure of SmSe Bandgap is closing with strain in linear trend TB matches DFT trend! Bandstructure without strain Energy range most relevant to transport Parameter fitted to band structure of hydrostatic strain and applied to clamped (uniaxial) strain with no modification.

12 Transport simulation PR layer is measured in thin film. Lateral length > Thickness Simulation is approximated by 1-D model. Extract 1-D simulation model with and without electric field. Periodic BC

13 Results Modeled imaginary band (b) and transmission (c) of SmSe thin film.

14 Summary Piezoelectronic Transistor shows promising properties to overcome 60mV/dec limit. »Internal transduction »Internal “voltage” step-up Metal-Insulator Transition in piezoresistive material is critical Tight binding model could reproduce MIT from bandstructure effects »Second nearest neighbor TB model: sp3d5f7s*+SO »Strain model Need modeling of Metal-SmSe interface and e-e scattering for f- electrons (work in progress)

15 THANKS

16 1.Step: ab-initio calculation  E i (k), φ i,k (r), H ab-initio 2. Step: Define analytical formula for TB basis functions  n,l,m (r, ,  ) = R n,l (r)Y l,m ( ,  ) Y l,m ( ,  ) is Tesseral function, R n,l (r) is to be parametrized Method Ab-initio band structure E i (k) Wave functions φ i,k (r) Y l,m (θ,φ)

17 Method (continue) 4. Step:  basis transformation (low rank approximation): H ab-initio  H TB  Approximate H TB by two center integrals; 4. Step:  basis transformation (low rank approximation): H ab-initio  H TB  Approximate H TB by two center integrals; 5.Step: Compare the TB results (band structure, wave functions) to ab-initio results; Measure the overlaps of basis functions; 5.Step: Compare the TB results (band structure, wave functions) to ab-initio results; Measure the overlaps of basis functions; J. Slater & G.Koster PR. 94,1498(1964) A. Podolskiy & P. Vogl PRB 69, (2004) Iteratively optimize the TB results 3.Step: Parameterize get transform matrix U: ab-initio basis  TB basis 3.Step: Parameterize get transform matrix U: ab-initio basis  TB basis 6.Step : Parameter refinement by simplex method → Target: Ek along high symmetry directions 6.Step : Parameter refinement by simplex method → Target: Ek along high symmetry directions