The SEM and Ion Pumps
UHV Systems UHV – Ultra High Vacuum Pressures of less than 10^-11 mbar Pumps at an “atomic level”
Ion Pump Also known as a “sputter ion pump” Ionizes and captures gas via high electric potentials Several different breeds, with common components.
Penning Trap
Standard Diode Pump Contains one anode cathode set. Common cathode material is Ti. Efficiency/speed based on several factors.
“Pumping Action” Sputtered Ti atoms act as getters. Chemisorption and physisorption. Net decrease in targeted particles.
Triode Pump Contains one anode and two cathodes.
Noble Diode Pump Same design as a standard or triode pump. Makes use of tantalum to capture rebounding neutrals. Ideal for applications dealing with light inert gasses like He or H2
Cost and Lifetime Cost varies greatly... Lifetime inversely proportional to pressure. Industry standard at 40k hours at 1.3X10^-6 mbar
Main Advantages No moving parts.(In contrast to turbo molecular pumps, and diffusion pumps) No vibrations. Little maintenance, no “regeneration”