1 ECE 556 Design Automation of Digital Systems By Prof. Charlie Chung-Ping Chen ECE Department UW-Madison.

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Presentation transcript:

1 ECE 556 Design Automation of Digital Systems By Prof. Charlie Chung-Ping Chen ECE Department UW-Madison

2 Outline ä Microprocessor Technology Trends and Design Issues ä Interconnect delay trends ä Circuit type trends ä Research summary

3 Microprocessor Design Challenges ä High performance ( > 500 Mhz) ä Low cost (< $100) ä Low power consumption (< 10W mobile) ä More functionality (KNI MMX) ä Shorter time to market (< 18 months) ä Satisfies different market segments (server, sub- $1000) ä Competition ä …. Mission Impossible!

4 Tentative Class Schedule ä Technology Trends (1 class) ä Interconnect Modeling and Optimization: (1 week) ä basic routing: maze-routing ä wire-sizing, buffer-sizing, buffer-insertion ä Introduction to Verilog (1 week) ä Linear programming and Introduction to C and C++ language (1 week) ä Routing: (2 week) ä Clock routing (0.6 week) ä Global and channel routing, Tree routing (1.4 week) ä Timing Analysis (1 week) ä Delay Characterization, Power Characterization ä PERL and Latch based timing analysis ä Partitioning and Placement (1.5 week) ä Floorplanning (1 week)

5 Deal With It! ä Higher clock frequencies ä New processes: 0.18 micron, copper ä Architecture level ä Superscalar, super-pipeline, out-of-order execution, speculative execution, EPIC, VLIW, ILP, multi-thread ä Circuit level ä Aggressive dynamic circuits synthesis ä Sizing, parallel re-powering, logic minimization ä Physical Design ä Performance-driven place and route, floorplaning ä Wire-sizing, buffer-sizing, buffer-insertion

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12 Size of Team Explodes

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14 Process Overview ä New process (0.18 um) ä High aspect ratio ä Low sheet rho (resistance)  Low-  dielectric (capacitance) (3.55 vs. 4.10) ä Good Electromigration property ä 6 metal layers ä M1 tight pitch for density (X-cap) ä M2-M3 middle pitch for density & performance (X-cap) ä M4-M6 high pitch (low resistance) for performance (Inductance) ä Future ä Copper - Less resistance more inductance effect ä SOI - the M1 coupling strange

Micron, 5 Layer Technology IEDM 96

16 M6 M5 M4 M3 M2 M Micron, 6 Layer Technology IEDM 99

17 Gate Delay.v.s. Scaling IEDM 99

18 Interconnect Resistance Grows Super Linearly IEDM 99

19 Interconnect Delay Trend IEDM 99

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23 Interconnect Complicated Design Flow Architecture RTL Logic Gate Layout Over tens of iterations!

24 Signal Integrity A new design challenge CrossCap 1 2 Crosstalk

25 Inductance effect emerging ä An old clock tree ä Freq domain up to 1Ghz ä PVL and PRIMA with order 16 find the exact ä A newer ckt, a section of power grid ä Has L’s ä PVL and PRIMA with 60th order ä Frequencies more than 0.6 Ghz are not covered Frequency (Ghz)

Multi-Point PRIMA-34 PRIMA-80 TIM PVL-80 Some MOR result

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29 Model order reduction ä We need efficient tools to analyze the interconnect dominant circuits (power grids, packages etc.) accurately in a reasonable amount of time  Promising Model Order Reduction (MOR) techniques Nonlinear Elements Linear Elements Nonlinear Elements Reduced Model

30 Power Consumption  P  C V 2 f, where ä C = Capacitance ~ Area ä V = Supply Voltage ä f = Operation Frequency

31 Power Trend

32 Supply Voltage Trends

33 Deal With It! ä Interconnect ä Wire- and Repeater- Sizing ä Repeater Insertion ä Performance-driven noise-aware routing ä New material: Low resistance (Cooper), Low k material (SiN2) ä Gates ä Gate Sizing ä New Circuit Exploration - Dynamic Circuit, Dual Vt ä ….

34 Standby Power Trend

35 Threshold Voltage v.s. Supply Voltage

36 Vt v.s. Delay

37 Dual Vt circuit High Vt Low Vt

38 Aggressive circuit styles

39 Clock delayed and Self-resetting dynamic circuits

40 Process limitations