GE1/1 GEM technology - High trigger performance during of late Phase I and throughout Phase II -Demonstrator in YETS2016 approved Plan for installation in LS2 TDR by October 2014 Station RE3-4: trigger and reconstruction coverage up to |  = 2.4 Technology: advanced detector (RPC, GEM) with optimized time resolution for PU rejection - ME0 GEM technology to ensure efficient trigger coverage up to |  = 2.4 and reconstruction up to |  = Station GE2/1 GEM technology to essure trigger and reconstruction efficiency The muon upgrade scenario

GE1/1: baseline detector for GEM project 1.55 < |eta| < Guarantee high trigger performance during late Phase I and throughout Phase II -Demonstrator in YETS2016 approved Plan for installation in LS2 GE2/1: station < |eta| < Station GE2/1 GEM technology to ensure trigger and reconstruction efficiency ME0: near-tagger to be installed behind new HE 2.0 < |eta| < layers of triple-GEM detectors Ensure efficient trigger coverage up to |  = 2.4 and reconstruction up to  = in very high background environment GEM Upgrade Projects GE1/1 GE2/1 ME0 Simulation ready in CMSSW

2010 Generation I The first 1m-class detector ever built but still with spacer ribs and only 8 sectors total. Ref.: 2010 IEEE (also RD51- Note ) Generation II First large detector with 24 readout sectors (3x8) and 3/1/2/1 gaps but still with spacers and all glued. Ref.: 2011 IEEE. Also RD51-Note Generation III The first sans-spacer detector, but with the outer frame still glued to the drift. Ref.: 2012 IEEE N Generation IV The current generation that we have built two of at CERN so far, with four more to come from the different sites. No more gluing whatsoever. Upcoming papers from MPGD 2013; And IEEE /14 Generation V The upcoming detector version that we will install. One long and one short version. Optimized final dimensions for max. acceptance and final eta segmentation. Installation of dummy chambers GEM foils production Single mask technology etching. Effects dramatically on foils production costs. Same performance of double mask New Front-end electronics development GEM R&D

GEM project achievements Performance Detector efficiencies ~98% Time resolution ~4ns Spatial resolution of about 290μm with VFAT2 (digital) and <110μm APV (analog) readout chip Operation of GEMs in magnetic field Gas mixture Ar/CO2/CF4 (45/15/40) Rate capability ~10 5 Hz/cm2 Good performance in test-beams at CERN SPS and FNAL Technology and assembly Validation of single-mask technology Production of large area GEM foils (GE1/1-type) NS2 technique for GEM assembly Integration Dummy GEMs for trial installation

Step 1: preparation of drift board Equip PCB with metallic inserts and HV probes Fix outer frame to PCB with guiding pins Step 2: preparation of GEM stack Place 1 st frame on support Place GEM1 + second frame Place GEM2 + 3rd frame Insert stretching nuts Place GEM3 + 4th frame Step 3: installation and stretching Remove the guiding pins Place stack on drift plane Check electrical contacts & HV divider Close chamber with readout PCB Insert gas in- and outlets Only 2 hours to assemble the full-scale GE1/1 (Compared to >2 days for the triple-GEM without NS2) 6 GE1/1-IV types have been built at various sites: Bari, LNF, CERN, FIT, Ugent,

Integration into CMS Ongoing investigations at P5 by technical crew Optimize cable and fibre routing, and layout of cooling pipes Racks for electronics equipment and powering (HV/LV) GE1/1 super chamber dummies produced (May 2013) 1st trial installation in Summer 2013 New dummies according to updated geometry (Jan 2014) 2nd trial installation in March 2014 Available space for GE1/1 YE1/1 nose Dummies with short and long chambers Disassembled GE1/1 dummies Assembled GE1/1 dummies

Bari Lab for GEM chamber characterization and construction: –Acquisition chain (FEE, DAQ, cosmic telescope, gas system for ternary mixtures) Set of measurements in progress: –Charge, timing, gas mixtures study Custom electronic tool developed for GEM foils and readout plane QC Present on-site infrastructures (clean room equipped for GEM construction and X-ray facility under preparation for gain uniformity study) Bari R&D Activities

One GEM based 10x10 cm 2 detector built and under characterization readout by a board based on the GASTONE chip for a total of 128 channels Anodic readout planes custom designed for spatial resolution study Measurements with different gas mixtures Freon-free are foreseen and in progress GEM1/1_IV prototype built and under characterization Cs137 and Fe55 irradiation source measurements for gain and gas mixtures test Bari R&D Activities

LNF R&D Activities

GE1/1 Power system The GEM power system will provide high and low voltages to the 144 GEM chambers and to the front-end electronics boards. The design of the power system is strongly related to the chamber design and to the grounding schema of the full system. Custom solutions have been adopted by KLOE and LHCb. Commercial solution are available. Pierluigi Paolucci - INFN of Napoli 11 Napoli R&D Activities

R&D Materials and Stretching of GEMS (I) L.Benussi S.Bianco M.Caponero M.Ferrini L.Passamonti D.Piccolo D.Pierluigi G.Raffone A.Russo G.Saviano 1.Safe operation of GEM detector made of composite materials Over 20 yrs, in harsh hirad envronm, eco-friendly 2.Develop simple, cost-effective, mass production tool to assess GEM foils’ planarity and parallelism within 100um over the 1mm gap Thus addressing a specific question by Apollinari review committee 3.Discover if an in situ monitoring of stretching and planarity is possible 1.Characterization of materials pre- and post- irradiation Kapton, glue, etc New eco-gas 2.Characterize stretching of GEMs, develop optical Moire’-based techniques 3.Install optical sensors permanently on GEM chambers ? CHALLENGES SOLUTIONS LNF R&D Activities

L.Benussi S.Bianco M.Caponero M.Ferrini L.Passamonti D.Piccolo D.Pierluigi G.Raffone A.Russo G.Saviano 100um 300um MOIRE’ FRINGES SENSITIVE TO 100um, EXPECT MUCH BETTER WITH PHASE-SHIFT DGEM=(3.3 ± 0.1)10-­ ‐ 10 cm2/s FULL SCALE MOIRE’ GEM CHAMBER HERE Preliminary R&D results 1.G.Saviano et al. Study of GEM film and foil materials… SIENA 2013, accepted by JINST 2.V.A.Franchi et al., Measurement of Diffusion coefficient…, INFN-13-09/LNF 3.G.Raffone, CHE and related stress in GEM foils, INFN-13.11/LNF 4.G.Raffone,, CMS trapezoidal GEM foil stuctural analysis, INFN-10/20(IR) ECO-GAS CHARACTERIZATION WITH GASCROMATOGRAPH R&D Materials and Stretching of GEMS (I) LNF R&D Activities

Pierluigi Paolucci - INFN of Napoli 14 General requirements: 1.working in high magnetic field (up to 2 Tesla) ; 2.working in an high radiation environment (5*10 10 p/cm 2  5*10 11 n/cm 2  kRad) ; 3.local system in control room + distributed remote systems on the detector (at least for the LV); 4.redundancy of the control electronic devices (  P per board) 5.input voltage from the CMS AC/DC 48V power supply; 6.Floating channels up to 5 V each other 7.looking forward common CMS solutions in order to simplify the hardware and software development/maintenance of the systems Napoli R&D Activities

GEM detector Requirements The main requirements of the GEM power system are: 1.assure a very high stability of the detector 2.low noise induced on the chamber and front-end electronic (floating channels + filters) 3.Reduced number of cables to run out from the chamber 4.HV range 4-5 KV with 1 mA per chamber !!! 5.compatible with CMS DCS and DSS system 6.be modular and accessible and have a reasonable cost. Pierluigi Paolucci - INFN of Napoli 15 Napoli R&D Activities

HV schema - proposal PS system PS system GEM 1 filter HV Distributor + filter HV Distributor + filter GEM 2 filter GEM n filter CAEN EASY PS and is under test in Napoli A first passive filter* will be introduced on the HV board or on the distributor A second and most important passive filter* will be mounted as close as possible to the chamber. This can be also used to protect the chamber from spikes. Test at CERN or LNF will be done in the first part of the Cables routing on the chamber is under study in Napoli. H V D I v i d e r H V D I v i d e r * Any resistor along the HV line introduce a Voltage drop. Napoli R&D Activities