Fabrication of Grid Mask and Test  Requirements of fiducial mark  Fabrication of sample mask  Test by beam exposure (X-ray & UV)  Summary S. H. Kim.

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Presentation transcript:

Fabrication of Grid Mask and Test  Requirements of fiducial mark  Fabrication of sample mask  Test by beam exposure (X-ray & UV)  Summary S. H. Kim and J. S. Song Gyeongsang National University Korea

Mark size : up to 0.1  m  (grain size) Gap of each mark : 100  m in a changeable sheet (12.5 ×10 cm 2 ) Requirements of fiducial mark

Size of mask : 15x15cm 2 Area of hole marks : 15 x 7.5cm 2 (half below) Base : Quartz crystal (3.2mm thick) Coated material : Chrome (10  m thick) Gap distance of each marks : x: 99.6  m, x: 99.3  m Hole size : 0.89  m  Fabrication of samlple mask

Exposure by UV beam Mounter Unit : mm

by ×20 obj. lens Exposure time : 1 sec UV wave length : 255 nm Distance from source to trget : 30cm Mask holesExposed image in X-ray film

Diffractive effect by UV beam ABC Spacer Hole size: ~4  m Gap distance: ~100  m B

by ×20 obj. lens Exposure time : 15 sec UV wave length : 350 nm Exposed image in the emulsion by ×50 obj. lens Hole size: ~5  m Gap distance: ~98  m

X-ray beam in GSNU Hospital Energy: 40 kVp(General), 23 kVp(Mamography), 60 kVp (Dental) Target: X-ray film and litho film(Low sensitivity) We could not get hole images! Exposure by X-ray beam

Summary  We need more test by two beams, especially a few keV X-ray.  In case of UV beam, we have to get best conditions : - beam energy - exposure time - need to use parallel beam