Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz Introduction Pumps Valves Gauges Seals Vacuum Technology

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz UHV Pumps Capture pumps are the dominating pumps for vacuum systems for synchrotron light sources Titanium is the most common getter sputter-ion pumps use chemical and ionization pumping effects

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz Sputter Ion Pumps Standard Diode Highest pumping speed per unit volume. Low pumping speed for noble gases (<5% for Ar). Noble Diode A part of the cathode material is replaced with Tantalum to achieve a higher pumping speed for noble gases. Noble gas ions are neutralized and “bounced back” on the cathode and buried in other parts of the pump. Energetic neutrals have far greater penetrating depth. StarCell Cathode plates are replaced with grids of Ti-strips Number of neutrals due to glancing incidence is increased. Pumping speed for noble gases of 20-25%. Sputter Ion Pumps

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz At SLS storage ring we use standard diode pumps with Varian Dual controllers Typically 8 pumps share the same pump controller All pump controllers run in STEP VOLTAGE mode P > mbar7000 V < P < mbar5000 V P < mbar3000 V Sputter Ion Pumps

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz APS 5 mm Undulator chamber ST 707 NEG strips °C activation temperature High pumping speed and pumping capacity for noble gases NEG Pumps electron channel NEG Strips NEG Cartridges Courtesy SAES Getters Courtesy of E. Trakhtenberg Getter material Zr-V-Fe and Ti – V Very compact with high pumping speed and capacity Flange size DN 40, 100, 150 CF

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz Ti-Filament Ti-filament periodically heated with high currents. Ti evaporates and generates a getter film on the chamber wall or cooled screen. Progressive saturation and reduction of pumping speed with time. Chamber wall Titanium Sublimation Pumps

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz Valves All metal valves are used for vacuum systems of synchrotron light sources RF shielded sector gate valves All metal angle valves for the connection of roughing pumps All metal gate valves for beamline frontends

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz Valves SLS Sector Vacuum Scheme

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz Vacuum Gauges Total pressure gauges for synchrotron light sources Total pressure measurement Sensor for vacuum interlock Cold cathode gauges (IMG) are mainly used for total pressure measurement At SLS we use active gauges with on board electronics Pirani gauges RGA

Vacuum Workshop on Vacuum Systems for Synchrotron Light Sources, Barcelona, Vacuum Technology, 12 th and 13 th September 2005 L. Schulz CF-Flange with RF-Bridge (BESSY II) CF-Flange with Small gap (ESRF, ANKA) Flat Seal-Flange (ASP, CLS, SLS) Temperature control is required UHV flanges All Metal Flanges Connections