1 Surface Roughness of Thorium and Thorium Oxide and its Effect on Optical Properties in the Extreme Ultraviolet Niki Farnsworth R. Steven Turley.

Slides:



Advertisements
Similar presentations
Optical Properties of Thin- film Uranium Oxide in the XUV Shannon Lunt, David D. Allred, R. Steven Turley, Elke Jackson, Kristi Adamson, Richard Sandberg.
Advertisements

2012 Transfer-to-Excellence Research Experiences for Undergraduates Program (TTE REU) Characterization of layered gallium telluride (GaTe) Omotayo O Olukoya.
Eliminating organic contamination on oxidized Si surfaces using atomic oxygen Liz Strein, David Allred, R. Steven Turley, and the EUV/thin films group.
Lecture 9: Surface Energy, Surface tension and Adhesion energy
 Light can take the form of beams that comes as close
1 Uranium Oxide as a Highly Reflective Coating from 2.7 to 11.6 Nanometers William R. Evans, Richard L. Sandberg, David D. Allred*, Jed E. Johnson, R.
1 Extreme Ultraviolet Polarimetry Utilizing Laser-Generated High- Order Harmonics N. Brimhall, M. Turner, N. Herrick, D. Allred, R. S. Turley, M. Ware,
Characterizing the Nanoscale Layers of Tomorrow’s Electronics : An Application of Fourier Analysis Chris Payne In Collaboration With: Apurva Mehta & Matt.
Silicon Wafer Cleaning for EUV Reflectance Measurements by Cold, High-Pressure CO 2 Jet William Evans Brigham Young University.
Determining Optical Properties of Uranium Oxide Richard Sandberg Brigham Young University Special Thanks to Kristi Adamson, Shannon Lunt, Elke Jackson,
Reflecting at 30.4 and Antireflecting at 58.4 nm David D. Allred and R. Steven Turley Department of Physics and Astronomy, Brigham Young University, Provo,
10 October 2005 Determining Optical Constants for ThO 2 Thin Films Sputtered Under Different Bias Voltages from 1.2 to 6.5 eV by Spectroscopic Ellipsometry.
16 Aug Aug 2006 Understanding DC-Biased Thoria Thin Films Useful in EUV Optics William R. Evans, Sarah Barton, David D. Allred Brigham Young University.
16 August 2006 Using Simultaneous Reflection and Transmission Measurements of Oxide to Help Determine Optical Constants in the EUV D. D. Allred, G. A.
Atomic Force Microscopy Studies of Gold Thin Films
What does the EUV and thin film group do? 1.Optical properties of matter in the EUV and Soft X-rays 2.Thin film preparation and characterization  Allred.
Thorium Oxide Thin Films as EUV Reflectors Jed Johnson Dr. David D. Allred Brigham Young University.
1 The Effects of Oxidation on the Index of Refraction of Uranium Thin Films in the Extreme Ultraviolet Heidi Dumais.
1 Oxidation Effects on the Optical Constants of Heavy Metals in the Extreme Ultraviolet Amy Grigg R. Steven Turley Brigham Young University.
2 May May 2006 Determining Optical Constants for ThO 2 Thin Films Sputtered Under Different Bias Voltages from 1.2 to 6.5 eV by Spectroscopic Ellipsometry.
Uranium Oxide as a Highly Reflective Coating from 2.7 to 11.6 Nanometers Richard L. Sandberg Thanks to Advisors: David D. Allred, R. Steven Turley Fellow.
Thorium Based Thin Films as EUV Reflectors
Simultaneous Reflection and Transmission Measurements of Scandium Oxide Thin Films in the Extreme Ultraviolet Guillermo Acosta Dr. David Allred Dr. R.
1 X-Ray Photoelectron Molecular By Amy Baker R. Steven Turley, David Allred, Matt Linford, Yi Lang, BYU Thin Special Thanks to R. Steven Turley, David.
Measurement of the index of refraction for uranium dioxide in the extreme ultraviolet and some other stuff to make the name longer Presented by Heidi Dumais.
Determining Optical Properties of Uranium Oxide Richard Sandberg Brigham Young University Special Thanks to Kristi Adamson, Shannon Lunt, Elke Jackson,
Andrew Jacquier Brigham Young University
2.002 Tutorial Presentation Problem 1-Atomic Force Microscopy Justin Lai.
Optical Constants of Uranium Nitride Thin Films in the EUV (7-15 nm) Marie K. Urry EUV Thin Film Group Brigham Young University.
Uranium Oxide and Uranium Nitride as Highly Reflective Coatings from 2.7 to 11.6 Nanometers Richard L. Sandberg, Marie K. Urry, Shannon Lunt David D. Allred,
1 X-Ray Photoelectron Spectroscopy to Examine Molecular Composition Amy Baker R. Steven Turley Brigham Young University.
Advantages of a Grazing Incidence Monochromator in the Extreme Ultraviolet By Sarah Barton.
NANO 225 Micro/Nanofabrication Characterization: Scanning Probe Microscopy 1.
Optical Properties and Application of Uranium-based Thin-Films for the Extreme Ultraviolet and Soft X-ray Region Richard L. Sandberg, David D. Allred,
Optical Constants of Uranium Nitride Thin Films in the EUV ( eV) Marie K. Urry EUV Thin Film Group Brigham Young University.
Determining the Optical Constants of EUV Reflectors Jedediah Johnson Dr. David Allred.
Statistical Description of Charged Particle Beams and Emittance Measurements Jürgen Struckmeier HICforFAIR Workshop.
Area of a quadrilateral is when you calculate Length X Width length width Area = length x width.
WAVE LOADS ON CAISSONS. DETERMINATRIOTION OF WAVE PRESSURE SAMPLING FREQUENCY IN MODEL TESTS Burcharth, Lykke Andersen & Meinert COPEDEC 7, Dubai, Feb,
Jaehyun Park EE235 Student presentation / Mar 09, 2009.
7 April 2006 Simultaneous Reflection and Transmission Measurements of Scandium Oxide Thin Films in the Extreme Ultraviolet G. A. Acosta, D. D. Allred,
+ Analysis of Anomalous Film Growth when Yttrium Oxide Thin Films are Exposed to 7.2eV Light Alison Wells Dr. David D. Allred Devon Mortenson Kristal Chamberlain.
Atomic Force Microscope Nanoindentation/Scratching
7 April 2006 Determining Optical Constants for ThO 2 Thin Films Sputtered Under Different Bias Voltages from 1.2 to 6.5 eV by Spectroscopic Ellipsometry.
Extreme Ultraviolet Polarimetry Utilizing High-Order Harmonics Nicholas Herrick, Nicole Brimhall, Justin Peatross Brigham Young University.
Kristal Chamberlain Wellesley College Class of 2012.
Thorium Dioxide (ThO2) And Its Optical Constants in The Extreme Ultraviolet Elise Martin & David Muhlestein.
Electromagnetic Radiation, Atomic Structure & Spectra.
Roughness and Electrical Resistivity of Thin Films Spencer Twining, Marion Titze, Ozgur Yavuzcetin University of Wisconsin – Whitewater, Department of.
Determining Physical and Chemical Constants of Sputtered Uranium and Thorium as Thin Film Reflectors Within the Extreme Ultraviolet (EUV) Winston Larson.
24.2 Gauss’s Law.
Pulsed Energetic Condensation of Nb Thin Film Cavities at JLab
Ching-Rong “Ada” Chung Mentor: Dr. Jing Zhou Department of Chemistry
Multi-scale Tribology Laboratory
Modeling Atomic Force Microscopy Helen Tsai Group 10
Determining the Index of Refraction of AlF3
Scanning Probe Microscopy History
N. BRIMHALL, N. HEILMANN, N. HERRICK, D. D. ALLRED, R. S. TURLEY, M
Rough surface reflections
Scanning Probe Microscopy History
Reverse Engineering Using Optical Constants
Gisselle Gonzalez1, Adam Hinckley2, Anthony Muscat2
Niki Farnsworth R. Steven Turley
Use of a commercial RF Plasma Cleaner in eliminating
Calculate Area with grid lines no grid lines. Calculate Area with grid lines no grid lines.
Determination of the Dielectric Function of Nickel Ferrite Thin Films
Calculate Area with grid lines no grid lines. Calculate Area with grid lines no grid lines.
States of Matter & Their Properties
Nanometer-Scale Shearing and Curvature-Driven Grain Boundary Migration in Diblock Copolymer Thin Films Matthew L. Trawick, Physics Department, University.
Presentation transcript:

1 Surface Roughness of Thorium and Thorium Oxide and its Effect on Optical Properties in the Extreme Ultraviolet Niki Farnsworth R. Steven Turley

2 Why the Extreme Ultraviolet?

3 Roughness Why do we care?Why do we care?

4 Roughness Roughness affects the way a surface reflects.Roughness affects the way a surface reflects.

5 Characterization of Roughness The easiest way to characterize roughness is to measure it directly.The easiest way to characterize roughness is to measure it directly. ATOMIC FORCE MICROSCOPYATOMIC FORCE MICROSCOPY

6 Our Data RMS roughness of 4.3 nm over a 1000x1000nm length scale. Peak roughness at horizontal length scales on the order of 50 nm.

7 Too Good to be True? It wouldn’t be physics research if it were this simple.It wouldn’t be physics research if it were this simple. Problem: What happens when the tip size is on the order of the horizontal length scales of our roughness?Problem: What happens when the tip size is on the order of the horizontal length scales of our roughness?

8 Too Good to be True?

9 Now what? Do AFM measurements tell us anything about the surface?Do AFM measurements tell us anything about the surface? How accurate are the RMS roughnesses it reports?How accurate are the RMS roughnesses it reports? How accurate are the power spectral densities it reports?How accurate are the power spectral densities it reports?

10 Solution: Model it Different types of rough surfacesDifferent types of rough surfaces Change horizontal length scalesChange horizontal length scales Change correlation lengthChange correlation length Change magnitudesChange magnitudes Different types of tipsDifferent types of tips Change tip shapeChange tip shape Change tip sizeChange tip size

11 Solution: Model it Assumptions:Assumptions: Horizontal length scale = 20 nm.Horizontal length scale = 20 nm. Magnitude is a Gaussian of width 1nm around zero.Magnitude is a Gaussian of width 1nm around zero. Tip shape is a parabola. Tip shape is a parabola.

12 Changing Tip Sizes

13 Changing Tip Sizes tip width = 10 nm tip width = 15 nm tip width = 20 nm tip width = 30 nm

14 Changing Tip Sizes Tip Size (nm) RMS roughness of the surface (nm) RMS roughness measured by the tip (nm)

15 Changing Tip Sizes

16 Changing Tip Sizes tip width = 10 nm

17 Changing Tip Sizes tip width = 15 nm

18 Changing Tip Sizes tip width = 20 nm

19 Changing Tip Sizes tip width = 30 nm

20 Comparing to Our Data dx = 20 nm, tip width = 30 nm

21 Comparing to Our Data The horizontal length scales of our surface roughness are approximately 2/3 the size of our tip.The horizontal length scales of our surface roughness are approximately 2/3 the size of our tip. Tip Size (nm) RMS roughness of the surface (nm) RMS roughness measured by the tip (nm) The real RMS roughness of our surface could be up to 2.7 times that measured by the AFM (up to 11.6 nm).The real RMS roughness of our surface could be up to 2.7 times that measured by the AFM (up to 11.6 nm).

22 How Does this Affect Reflectance Data?

23 Conclusions The discrepancy in the roughness measured by the tip and the actual roughness of the surface could be different by as much as 7.3 nm.The discrepancy in the roughness measured by the tip and the actual roughness of the surface could be different by as much as 7.3 nm. Failure to take this difference into account could change our calculated reflectance by up to 35%.Failure to take this difference into account could change our calculated reflectance by up to 35%. This discrepancy could be fatal to our calculation of optical constants for that material.This discrepancy could be fatal to our calculation of optical constants for that material.

24 Acknowledgements Dr. R. Steven TurleyDr. R. Steven Turley Dr. David D. AllredDr. David D. Allred The BYU Thin Films GroupThe BYU Thin Films Group Physics and Astronomy Department FundingPhysics and Astronomy Department Funding Rocky Mountain NASA Space GrantRocky Mountain NASA Space Grant