LCWS13 at Tokyo, 2013 Nov. 121Eiji Kako (KEK, Japan) Status of STF2 Input Couplers Eiji KAKO (KEK, Japan)

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Presentation transcript:

LCWS13 at Tokyo, 2013 Nov. 121Eiji Kako (KEK, Japan) Status of STF2 Input Couplers Eiji KAKO (KEK, Japan)

LCWS13 at Tokyo, 2013 Nov. 122Eiji Kako (KEK, Japan) OUTLINE 1. STF2 couplers for STF-CM1 2. Results from S1-G cryomodule 3. Collaboration with Japanese companies (Introduction to the next talks) 4. Summary

LCWS13 at Tokyo, 2013 Nov. 123Eiji Kako (KEK, Japan) STF-1 and STF-2 Input Couplers STF1 input coupler (initial design) STF2 input coupler (improved design) no bellows variable coupling Cu 10  m SUS 1.0t Cu 5  m SUS 0.8t Cu 3  m  60mm Zo = 50  Zo = 43  Zo = 50 

LCWS13 at Tokyo, 2013 Nov. 124Eiji Kako (KEK, Japan) Cryomodule Operation in STF STF Phase-1 Four 9-cell cavities (2008’) S1-Global (4+4) 9-cell cavities (2010’) STF2 - Capture Cryomodule Two 9-cell cavities (2011’) 4 x STF1 input couplers 4 x STF2 input couplers 2 x STF2’ input couplers Total 22 STF1,2 input couplers were fabricated and tested. STF2 – CM1 Cryomodule (+CM2a) Eight (+4) 9-cell cavities (2014’) 8 (+4) x STF2’’ input couplers

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov. 125 RF conditioning of 12 STF2 input couplers Set-A. Set-B.Set-C. Set-D. Set-E. Set-F. not delivered.

LCWS13 at Tokyo, 2013 Nov. 126Eiji Kako (KEK, Japan) RF conditioning of 8 STF2 input couplers Set-A. Set-B. Set-C. Set-D. 1.2MW 0.8MW 1.2MW 0.8MW 1.5MW 1.0MW Total Conditioning Time ~ 88 hours Total Conditioning Time ~ 108 hours Total Conditioning Time ~ 74 hours 10  s 30  s 100  s 500  s 1500  s 5 Hz 2013’ Jan. ~ May 1.2MW 0.8MW Total Conditioning Time ~ 82 hours 8 pairs of STF2 input couplers

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov. 127 Cavity string assembly for STF2-CM1 cryomodule 2013’ Sept. ~ Nov. in the STF tunnel

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov. 128 TTF3/STF2 input couplers in S1-Global Cryomodule

LCWS13 at Tokyo, 2013 Nov. 129Eiji Kako (KEK, Japan) Input coupler performance in S1-G STF2 Input Coupler TTF3 Input Coupler two bellows (outer conductor) Q L =2~10 x10 6 Q L =2~4 x10 6 TTF3 STF2 one bellows (inner conductor) Stroke +/- 3 mm Stroke +/- 10 mm

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov Input coupler performance in S1-G Cryomodule-C (four TTF3 couplers) ave. processing time ~ 21 hours Cryomodule-A (four STF2 couplers) ave. processing time ~ 13 hours 20 hr. Vacuum I/L ; 2.x10 -4 Pa at Room Temperature; 0.5 ms, 5 Hz, 500 kW 1.5 ms, 5 Hz, 200 kW

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov Input coupler performance in S1-G

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov Cavity string assembly Warm coupler assembly Attachment of doorknob WG 5K, 80K thermal anchor Installation into vacuum vessel Hanging under He-GRP S1-G cryomodule assembly (STF2 coupler)

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov Transportation with coupler Cavity string assembly Welding of 2K-He pipe Hanging under He-GRP 5K and 80K thermal anchor Installation in vacuum vessel Warm coupler assembly Waveguide assembly S1-G cryomodule assembly (TTF3 coupler)

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov Collaboration with Companies on STF2 Input Couplers

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov Quality control of Cu-plating at Nomura-Plating

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov RRR measurement of Cu-plating at Tokyo-Denkai Cu-plating Samples : SUS 1.0t Ni-strike 0.2  m Cu 5  m (2005’) Sample X1X2X3X4 RRR (Cu+SUS) RRR (SUS) RRR (Cu)  m Au-strike + 3  m Cu-plating on 0.8t SUS pipe A B CD EF GH after anneal at 800 o C in hydrogen furnace

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov Coupler fabrication techniques at Toshiba 2012’ March Toshiba fabricated 22 STF input couplers for KEK. Toshiba fabricated 2 TTF3 input couplers for LAL.

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov SUMMARY 12 STF2 couplers for STF-CM1+CM2a; 8 couplers were conditioned and assembled. 2 couplers under conditioning. 2 couplers under fabrication. Coupler performance of TTF3/STF2 couplers in S1-G cryomodule was shown for comparison. Improvements of poor adhesion and low RRR of Cu-plating are necessary. (Detail will be presented in the next talks.)

Eiji Kako (KEK, Japan)LCWS13 at Tokyo, 2013 Nov END Thank you for your attention.