F LORIDA S OLAR ENERGY C ENTER A Research Institute of the University of Central Florida Development of Tribological Coatings for Cryocoolers Task III.

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F LORIDA S OLAR ENERGY C ENTER A Research Institute of the University of Central Florida Development of Tribological Coatings for Cryocoolers Task III. 4 Hydrogen Storage for Spaceport and Vehicle Applications Neelkanth G. Dhere and Anil Pai

Titanium Nitride (TiN) Coatings ' Additional TiN samples on glass substrate have been prepared by DC magnetron sputtering using optimized parameters for measurement of microhardness with the assistance of Dr. Raj Vaidyanathan and his colleagues at University of Central Florida (UCF). ' At present, the microhardness equipment has some problem with the low load component of the machine and is being repaired. There is a delay since the manufacturers are located in England.

Titanium Nitride (TiN) Coatings ' Additional TiN samples by DC magnetron sputtering on aluminum substrates have been prepared using optimized film parameters and the characterization of the above samples for microhardness, wear and coefficient of friction analysis at University of Florida (UF), Gainesville is being planned. ' These tests will be carried out with the assistance of Dr. Gregory Sawyer at UF.

' Mask required to deposit the film on three bumps on 1cm x 1cm silicon wafer has been procured (Figure 1). ' Wet and dry oxidation of the silicon wafer was carried out to grow a 3- micron layer of silicon dioxide. ' Masking and etching of the wafer has also been carried out to define these bumps on the wafer. Titanium Nitride (TiN) Coatings Figure 1: Mask Design ' Coefficient of friction and wear measurements will be carried out on the “Tytron™ 250 MicroForce Testing Equipment” with the assistance of Dr. Quanfang Chen and his colleagues at UCF. ' TiN films will be deposited using the optimized parameters on 1cm x 1cm silicon wafers with and without these bumps for the friction and wear measurements.

MWCVD System ' Microwave plasma applicator with power supply has been ordered. ' After receiving the plasma applicator the Microwave assisted plasma chemical vapor deposition system (MWCVD) will be constructed. ' After the installation of MWCVD system, DLC coatings will be prepared and characterized.

Tasks to be Accomplished ' Characterization of bilayer coatings of TiN and MoS 2 on a glass substrate is being planned. ' Depositions of TiN on aluminum substrates will be carried out for microhardness, wear and coefficient of friction analysis at UF. ' Coefficient of friction and wear measurements at UCF on Si wafer will also be carried out with the assistance of Dr. Chen and his colleagues. ' After the installation of MWCVD system, DLC coatings will be deposited and characterized.