Small Feature Reproducibility

11/8/99 SFR Workshop - Overview 2 Small Feature Reproducibility Measuring, Understanding and Controlling Variability in deep sub-micron patterning UC-SMART Major Program Award E. Aydil, J. Bokor, N. Cheung, D. Dornfeld, B. Dunn, D. Graves, E. Haller, M. Lieberman, A. Neureuther, K. Poolla, R. Smith, O. Solgaard C. Spanos University of California Berkeley, Davis, Los Angeles, Santa Barbara 11/8/99

SFR Workshop - Overview 3 Program Goals Cultivate a new discipline that focuses on the reproducibility of small features. Pursue solutions by focusing on: –fundamental understanding –modeling variability mechanisms –sensing variability causes during production Our context is lithography, plasma, CMP, diffusion, and the way these steps interact with each other.

11/8/99 SFR Workshop - Overview 4 Target Technologies Lithography 193 / 157 / 14nm (0.18  m  m) Plasma and Reactive Ion Etching Chemical Mechanical Polishing Transient Enhanced Diffusion Sensors and Metrology for the above

11/8/99 SFR Workshop - Overview 5 Small Feature Reproducibility Capture –In-situ and off-line metrology –Hierarchical Analysis of Variance Understand –Resist, Plasma, Diffusion Modeling –Variability Impact on Device / Interconnect Performance Control –on-wafer / real-time / in-situ sensors –run-to-run and real-time control –process diagnosis –chamber, process and product design

11/8/99 SFR Workshop - Overview 6 Major Program Thrusts SFR Lithography Plasma Etching CMP Sensor Integration Education TED

11/8/99 SFR Workshop - Overview 7 Changes since May, 1999 Professor Eugene Haller (UCB) joined us to work on transient enhanced diffusion in the second year. Professor Tsue-Jae King (UCB) helped us re-design the major undergraduate processing class. Professor Eray Aydil (UCSB) joined us to work on in-chamber plasma sensors. Aplex left the group (and the business), Nanometrics joined the group. The 6-inch conversion for the Berkeley Microlab has been funded by other means and is on its way.

11/8/99 SFR Workshop - Overview 8 Industrial Relations Held two workshops (11/17/98 and 11/8/99), annual review (5/13/99). Established industrial mentors, 15-member steering committee. Opened bi-weekly seminars to industry via the Web. Our “interactions” database captures broad interactions since the beginning of this program.

11/8/99 SFR Workshop - Overview 9 Technology Transfer Many visits, discussions, presentations. –Bi-weekly seminar regularly attended by project mentors via simulcast on our web site. Timbre Technology, winner of Haas business plan competition, received seed funding. –Auto calibration of lithography simulators. –Scatterometry based profile reconstruction. Autonomous Wafer Sensors (AWS) –Autonomous / modular temperature measurement wafers. –Plasma temperature metrology (>40 sensors/wafer, >1Hz full field monitoring, new capabilities).

11/8/99 SFR Workshop - Overview 10 Highlights... Our second year has been approved by the state, after a successful first year report in September Bi-weekly teleconferencing seminars continue with technical talks this semester. ~30 graduate students, 12 Professors, 4 UC campuses –SOPRA Spectroscopic Ellipsometer –CMP Cleaner –CMP in place –New P5000 identified at Intel, refurbished by AMAT –MR2 substituted with M2I, received from Novellus last week. New room completed. –6-inch conversion under way –New teaching lab operational!

11/8/99 SFR Workshop - Overview 11 Depository for publications resumes project database meeting agendas demonstrations posters presentations New software for presenting inter-campus, inter-industry, interactive, technical seminars.

11/8/99 SFR Workshop - Overview 12

11/8/99 SFR Workshop - Overview 13 Today’s Objectives 1. Present and discuss Progress. 2. Discuss ideas. Two year extension proposal due late spring Bring, PIs, students, industrial participants together.

11/8/99 SFR Workshop - Overview 14 Plans for 2000 renewal The theme for was: “how to measure, understand and model small feature reproducibility”. The theme for might be: “why reproducibility matters and how to control it” “why reproducibility matters and how to control it”

11/8/99 SFR Workshop - Overview 15 What really limits these numbers? ITRS Conference 7/99

11/8/99 SFR Workshop - Overview 16 CD Metrology will need a (R)evolution... ITRS Conference 7/99

11/8/99 SFR Workshop - Overview 17 General Reproducibility Model Fundamental causes optics, chemistry, etc. model and understand CD, thin films measure and model Circuit performance model, predict and improve

11/8/99 SFR Workshop - Overview 18 Web site, etc. Timothy D. Duncan 524 Cory Hall, CSG phone: (510) fax: (510) People to Meet and Places to Go Account Management Brad Dexter 558 Cory Hall, ERL phone: (510) fax: (510) Access restricted by password. Administrative Support Debra Krauss 558 Cory Hall, ERL phone: (510) fax: (510) University of California, Berkeley CA,

8:30 – 9:00 Introductions, Overview / Spanos 9:00 – 10:15 Lithography / Spanos, Neureuther, Bokor 10:15 – 10:45 Break 10:45 – 12:00 Sensor Integration / Poolla, Smith, Solgaard, Dunn 12:00 – 1:00 lunch, poster session begins 1:00 – 2:15 Plasma, TED / Graves, Lieberman, Cheung, Aydil, Haller 2:15 – 2:45 CMP / Dornfeld 2:45 – 3:30 Education / Graves, King, Spanos 3:30 – 3:45 Break 3:45 – 5:30 Steering Committee Meeting in room 775A / Lozes 5:30 – 7:30 Reception, Dinner / Heynes rm, Men’s Faculty Club 2st Annual SFR Workshop, November 8, 1999