1 BROOKHAVEN SCIENCE ASSOCIATES K.Evans-Lutterodt 1nm R+D: Update

2 BROOKHAVEN SCIENCE ASSOCIATES Outline for 1nm R&D 1) Our current approaches: MLL’s and kinoform 2) Kinoform issues and progress A.Recent results from kinoforms B.Calculations of ultimate kinoform performance C.Etching status. 3) MLL progress. A.Personnel B.Proposed R+D Facilities: plans and schedule C.Test plans for 1nm optics including APS beamlines 4) Progress towards 10nm testing station (design, components)

3 BROOKHAVEN SCIENCE ASSOCIATES Paths to 1nm; Brief review Optic TypeCommentFor examples and results see: 1. Single bounce Solid Metal Mirrors XG. Ice, ESRF,Spring8, Binary Zone PlatesXW.Yun(Xradia),.. 3. Solid Refractive lenses XLengeler,Schroer 4. Multilayer MirrorsPursued by ESRF,Spring8 Hignette 5. Multilayer LensNSLSII R&DMaser(CNM/APS) 6. KinoformNSLSII R&DEvans-Lutterodt

4 BROOKHAVEN SCIENCE ASSOCIATES Multilayer Laue Lenses substrate Varied line- spacing grating Depth-graded multilayers on flat Si substrate Deposit varied line-spacing grating on flat substrate (thinnest structures first!) Section to 5-20  m thickness (high aspect ratio structure) Assemble two into a single device (MLL) CNM, APS group: Maser et al. < 20nm performance!

5 BROOKHAVEN SCIENCE ASSOCIATES Instead of solid refractive optic: Use a kinoform: One can view the kinoform equivalently as a)A blazed zone plate b)An array of coherently interfering micro-lenses. Kinoform Optics K. E-L et al. (2003) NSLS results as of last EFAC meeting 600nm

6 BROOKHAVEN SCIENCE ASSOCIATES 2) Kinoforms

7 BROOKHAVEN SCIENCE ASSOCIATES 2) Kinoforms Kinoform Status as of last EFAC: Measured kinoform resolution: 600nm Theoretical basis not generally accepted Etching issues

8 BROOKHAVEN SCIENCE ASSOCIATES Kinoform results from 1 st run at APS (BL 8IDI)  =82 nm 200 micron aperture used 300 micron aperture manufactured Near diffraction limit. Diffraction size 0.44 /NA = 44nm Demag size = 15nm Net = 46nm Focal Length Spot Size Diffraction limit Demagnification

9 BROOKHAVEN SCIENCE ASSOCIATES Theoretical basis for Kinoform optics Partial resolution: Numerical calculation of NA=0.4 kinoform for optical wavelengths, refractive index > 1. Applied Optics, Vol. 28, (1989) Issue 5, pp “Optical performance of holographic kinoforms” Dale A. Buralli, George Michael Morris, and John R. Rogers Cases considered in paper 1)Paraxial ( to order x 2 ) 2)Non-Paraxial (exact) 3)Finite thickness

10 BROOKHAVEN SCIENCE ASSOCIATES What happens if you use the wrong lens profile? Using the exact integral But using a parabolic approximation for the lens profile : NA=0.1 NA=0.2 Do not get expected performance for large NA

11 BROOKHAVEN SCIENCE ASSOCIATES Performance of Exact Lens Profile NA= 0.1 NA= 0.4 Using the exact integral Using exact lens profile. Get diffraction limited performance even at large NA (One caveat: Only thin lens calculation done to date)

12 BROOKHAVEN SCIENCE ASSOCIATES Summary of kinoform theory paper For a short kinoform structure theoretical basis is now established for diffraction limited performance to NA ~ 0.4 We still need to: Provide a numerical basis for compound lenses Develop numerical density matrix thick lens calculator (MLL+) Include the effect of imperfections ( Roughness, verticality)

13 BROOKHAVEN SCIENCE ASSOCIATES Kinoform Lens Fab E-beam EtchingTesting Lucent BNL, APS E-beam Etching Testing Lucent BNL, APS We have acquired a new skill at BNL; etching. Design OLD NEW

14 BROOKHAVEN SCIENCE ASSOCIATES Status of Si etching; (Abdel Isakovic, Post-doc) Purchased machine was Cryo-process only. Home grown cyclical cryo-etch process developed; Better (deeper, but more vertical) than company-provided recipe. Manuscript in process 2.5microns/minute Etching performed at BNL

15 BROOKHAVEN SCIENCE ASSOCIATES Etching The CFN had purchased the oxford plasma with cryo-etch, but not Bosch process license and hardware add-ons. NSLS2 had planned to purchase the Bosch license and additional hardware, but the CFN has decided to make the purchase instead. PO has been signed. Diamond etching started; industrial and electronic grade 0.65nm/minute, comparable surface finish.

16 BROOKHAVEN SCIENCE ASSOCIATES Timelines for Kinoform(Lehman,12/06) FY07 Introduce etching RD program Measure 60nm lenses Improve theoretical underpinning Improve measurement techniques to enable lens characterization FY08 Develop Deep Vertical Si etching Optimized E-beam Si process to allow many lens writes Develop etches for InSb, C, Si. Test Compound Si lens sub 40nm FY09 Develop E-beam for alternate materials Test Alternate materials lens in xray Test sub 20nm lens in xray FY10 Test sub 10nm lens FY 11 Test sub 5nm lens FY12 Test 1nm lens

17 BROOKHAVEN SCIENCE ASSOCIATES 3) Multi-layer Laue Lenses

18 BROOKHAVEN SCIENCE ASSOCIATES Timelines for MLL(Lehman, 12/06) FY07 Explore materials for single crystal MLL approach. Explore techniques to deposit multi-layers in wedged MLL geometry. Carry out coupled wave (vector) calculations of MLL to determine sensitivity to errors. Develop positioning techniques to mount and manipulate up to 4 MLL sections FY08 Develop techniques to deposit multi-layers for wedge MLL geometry Develop metrology capable of determining zone width and placement to <1nm resolution. FY09 Growth effort continues for 1nm MLLs Design a prototype MLL device (optics and mechanics) with 1nm limit Develop techniques to slice an MLL section from graded multilayer FY10 Construct 1nm prototype device

19 BROOKHAVEN SCIENCE ASSOCIATES Near term MLL issues Hire deposition scientist (Offer imminent) Hire Theoretician (Serious candidates,Discussions) Space identified for lab; planning for refurbishing

20 BROOKHAVEN SCIENCE ASSOCIATES 1nm R+D Lab space needs Nano-positioning Lab: Space needed for testing of engineering concepts. Vibrationally quiet, may need small thermal enclosures. No special utility requirements. Optics Metrology Lab: Space needed for next generation LTP and ancillary equipment. Will need large thermally isolated space, with controlled air-flow. No special utility requirements. MBE/Depositioning Lab: Space needed for multilayer deposition effort. Large MBE system, UHV chambers. Associated characterization hardware e.g. STM. Utility requirements still to be determined.

21 BROOKHAVEN SCIENCE ASSOCIATES 1nm R+D Lab space needs (cont.) X-ray reflectivity Lab: To include rotating anode or tube source for Laue work and simple reflectivity measurements. To be combined with crystal preparation facility for 0.1 meV effort. May have more significant power requirements. Wet Lab: For etching work, including that required for 0.1 meV effort. Will require fume hood. Effort currently underway to identify space at BNL for these efforts. One potential candidate is building 703, which while it will require rennovation (cost estimate is being developed now) will be able to co-locate all these needs, together with office space for researchers.

22 BROOKHAVEN SCIENCE ASSOCIATES 4) Nanopositioning and Testing

23 BROOKHAVEN SCIENCE ASSOCIATES Progress in Nano-positioning + 25mm travel range 80nm step-size Glass encoder on stage 100 micron range XYZ 1nm step size Capacitance encoder for feedback Integrated with 8IDI beamline programs Performs satisfactorily down to 10nm stepping +-3nm Borrowed hardware above; we are beginning procurement

24 BROOKHAVEN SCIENCE ASSOCIATES Short term lens testing needs Beamtime – 2 days a month APS Can we improve NSLS X13B stability? Will a different mono do it.? Test bench stages ( 5 -10nm resolution), enclosed, temperature stable Design Procure Analysis Begin developing other methods: Phase retrieval methods (Fienup)

25 BROOKHAVEN SCIENCE ASSOCIATES 1nm R&D Summary  Rapid progress in kinoform.  Lab space needs for whole optics effort has been identified; potential building identified.  Offer imminent for deposition candidate.  Candidates for theorist position and 1nm group leader have been identified, discussions underway.