Atomic Layer Deposition for Microchannel Plate Fabrication at Argonne

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Presentation transcript:

Atomic Layer Deposition for Microchannel Plate Fabrication at Argonne Jeffrey Elam, Qing Peng, Anil Mane, Thomas Prolier, Joe Libera Large Area Photodetector Collaboration Meeting Argonne National Laboratory October 15, 2009

Atomic Layer Deposition (ALD) Thin Film Coating Technology Atomic level thickness control Deposit nearly any material Precise coatings on 3-D objects For the technologies that I’ll be describing today, ALD has attributes that uniquely suit it → Can ALD Make Better Microchannel Plates? 2

ALD for Fabrication of MCPs Start with porous, insulating substrate Glass capillary plate Anodic aluminum oxide (AAO) membrane ALD of resistive film on all surfaces (inside of pores, on faces, etc.) ALD of secondary electron emissive film Deposit metal electrodes on outer surfaces 33 mm Photo of AAO 3 3

MCP Structure (not to scale) pore 1 KV Very schematic – not correct open area ratio Might need to do Au before Al2O3 for better contact Add HV leads resistive coating (ALD) emissive coating (ALD) conductive coating (thermal evaporation or sputtering) 4 4

ALD Program Goals:

ALD for Emissive Coating Alternative ALD Coatings: Conventional MCP’s: SiO2 Al2O3 MgO ZnO (ALD SiO2 also) Ask for better slide from Zeke Many material possibilities Tune SEE along pore 6 6

ALD for Resistive Coating Target: 10-100 MΩ through MCP ZnO: conductor Al2O3: insulator ZnO/ Al2O3 alloy – tunable resistivity Tune composition and thickness of film to adjust MCP resistance Many other material combinations: Reduce conditioning time Reduce thermal runaway Reduce (ΔR/Δ%) Improve part-to-part uniformity 7 7

ALD Laboratories at Argonne – current setup Materials development In Situ measurements - Multiple 33mm substrates - Single 8” substrates

ALD Laboratories at Argonne, coming soon… Beneq TFS500 Multiple 8” square substrates Ordered, ~3 month delivery Cambridge Nanotechnology Fiji - Plasma-ALD Photocathodes Finalizing quote

Progress Before Start of LAPD Program Glass Capillary Plate with 100 nm ALD ZnO/Al2O3 and 50 nm Sputtered Gold 10 10

Progress Before Start of LAPD Program SEM Si Zn Al Au Describe how pores are not all aligned (artifact from fracture angle) ALD ZnO and Al2O3 extend into pores Evaporated Au only on edge of pores 11 11

Progress: Cross-Sectional Image of ALD Film in MCP Glass ALD Film 100 nm ALD film visible in middle of MCP 12 12