CMSELCMSEL Hanyang Univ. 자성재료 박막의 증착 거동에 대한 분자동역학연구 김상필, 이승철 , 이광렬 , 정용재 한양대학교 세라믹공학과, *KIST 미래기술연구본부 제 23 회 한국진공학회 학술발표회.

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CMSELCMSEL Hanyang Univ. 자성재료 박막의 증착 거동에 대한 분자동역학연구 김상필, 이승철 *, 이광렬 *, 정용재 한양대학교 세라믹공학과, *KIST 미래기술연구본부 제 23 회 한국진공학회 학술발표회

CMSELCMSEL Hanyang Univ. Spintronics Metallic Thin Films Revisited: Fe, Co, Ni Multilayers Spintronics: To Control a Spin of Electrons, not a Charge Magnetic Nanostructures for Spintronics Magnetic Multilayers Magnetic Wires Magnetic Quantum Dots Applications of Magnetic Nanostructures Reading Heads, Magnetic Field Sensors, MRAM Field Effect Transistor, Spin-Valve Transistor Quantum Computer

CMSELCMSEL Hanyang Univ. Magnetic Random Access Memory (MRAM) Low Resistance High Resistance Reversible 1 – 2 nm 이하의 절연층 두께를 균일하게 유지해야 소자로서의 특성을 발휘한다.

CMSELCMSEL Hanyang Univ. Basic Structure of MRAM Insulator : TMR, MRAM (Co or CoFe/Al 2 O 3 /Co ) *Spintronics 에 관한 가장 최근의 review 는 S.A. Wolf et al., Science 294(2001) 1491, Nov. 16 Multilayer 의 수 Spacer Materials FM Materials 에 따라 응용범위가 달라질 수 있음 FM Spacer

CMSELCMSEL Hanyang Univ. Issues in Magnetic Multilayers Fabrication of Ordered Nanostructures on a Surface A detailed understanding of the various atomic processes that occur during the formation of nanosized islands on surfaces Surfaces are not simply a static media onto which the deposited atoms and diffuse Deposition and nucleation on a surface is important

CMSELCMSEL Hanyang Univ. 연구 목적 기존의 실험 결과 * 를 바탕으로 분자동역학을 이용한 Co on Al(100) 박막공정을 전산모사 증착 위치에 따른 Co 원자의 거동 분석 Co 의 증착 속도에 따른 증착 메커니즘 분석 * “ N.R. Shivaparan, Surf. Sci (2001) 에 의하면 Al(100) substrate 에 Co 를 증착 할 경우 약 4ML 에 걸쳐 CoAl (B2) 가 나타남을 실험적으로 증명 ! ”

CMSELCMSEL Hanyang Univ. Molecular Dynamics O Interatomic Potential Lennard-Jones: Inert Gas Embedded Atom Method: Trasition Metals Stillinger-Weber Potential: Si, C Time Evolution of Each Atom Extract Thermodynamic And Kinetic Properties of The System

CMSELCMSEL Hanyang Univ. EAM for Co, Al FCC - Al HCP - Co R. Pasianot and E. J. Savino PRB, Vol.45, (1992) A. Voter and S. Chen Mater. Res. Soc. Symp. Proc. (1987) PropertyAlCo Expt.*Calc.Expt.**Calc. A 0 (Å) E coh (eV) B (GPa) * A. Voter et al. MRS Symp.Proc., 175 (1987) ** R. Pasianot et al., PRB (1992)

CMSELCMSEL Hanyang Univ. EAM for Co–Al System * Intermetallic Compound, Vol 1, 885 (1994) ** C. Vailhe et al. J. Mater. Res., 12 No (1997) *** R.A. Johnson, PRB (1989) PropertyCoAl(B2) Expt.*Calc. **Calc. *** A 0 (Å) E coh (eV) B (GPa) Co Al CoAl(JMR) CoAl(PRB)

CMSELCMSEL Hanyang Univ. 실험 방법 300K Initial Temperature 300K Clamp Temperature Al z x y x,y-axis : Periodic Boundary Condition z-axis : Open Surface Deposition energy : 0.1eV Fix Position (4 x a 0 ) (6 x a 0 )

CMSELCMSEL Hanyang Univ. Deposition Co Hollow site Hollow site Co Slab Slab mode (2) (3) (4) (1) eV

CMSELCMSEL Hanyang Univ. Deposition Co OnTop (1) (2) (3) (4) On Top Slab mode Slab eV

CMSELCMSEL Hanyang Univ. Conventional Concepts of Epitaxy Deposition, Diffusion, Nucleation, and Growth Homoepitaxy and Heteroepitaxy

CMSELCMSEL Hanyang Univ. Local Acceleration (each Energy)  약 3.5 ev 의 가속 에너지가 전범위에 걸쳐 나타난다 ! *Accel E = Max E – Depo E 다양한 증착 에너지의 Co adatom 을 Al(100) Hollow site 에 증착

CMSELCMSEL Hanyang Univ. Local Acceleration (each Position) 100 가지 임의의 위치에서 Al(100) 으로 증착 평균적으로 약 2.7eV 의 가속이 발생한다 Hollow site On Top

CMSELCMSEL Hanyang Univ. Conclusion #1 Layer-by-layer Film Growth Modes 3D-Island Stranski-Krastanov Chemical affinity 의 영향으로 인한 성장

CMSELCMSEL Hanyang Univ. Conclusion #2 가속 전압과는 상관 없는 Local Acceleration 이 발생 증착 공정 실험시 고려해야함 *Accel E = Max E – Depo E