UCB-TCAD Copyright 2005, Regents of University of California FLCC Teleconference 1 10/17/2005 FLCC Seminar Monday, October 31st, 2005 Title: Polarization aberrations in optical lithography: A comparison of various representations Speaker: Greg McIntyre (EECS Department, UC Berkeley) Research Group: Professor Andrew R. Neureuther’s Group (EECS Department, UC Berkeley).

UCB-TCAD Copyright 2005, Regents of University of California FLCC Teleconference 2 10/17/2005 FLCC Seminar Monday, October 31st, 2005 ABSTRACT The adoption of immersion and ultra-high numerical aperture (NA) projection printing systems in semiconductor manufacturing demands that the state of polarization be closely monitored and understood throughout multiple components of the optical system. Much attention has been paid recently to the state of polarization of the illumination source and the polarizing effects of the photomask. However, polarization issues may also arise from within the projection lens pupil in the form of polarization aberrations. Various representations of polarization aberrations are described and compared for the field of optical lithography. Polarization aberrations are complicated phenomena that refer to induced polarization dependent wavefront distortions as light propagates through an imaging system. Pupil representations based on the following concepts are discussed: the physical polarization properties, the Mueller matrix, the Jones matrix, the Jones matrix decomposed into a Pauli spin matrix basis, a comparison of input and output electric fields, the coherency matrix and the covariance matrix. It is concluded that the Jones matrix representation decomposed into a Pauli spin matrix basis offers the most useful format for the lithographer due to its compact notation, physically intuitive interpretation, ability to be implemented into standard imaging equations, and its usefulness as in input into a lithographic simulator. This input consists of five independent functions, where a normalization constant is calculated to ensure a physically realizable pupil. An example is shown to illustrate the usefulness of this strategy. Additionally, a simple metric for lens polarization quality based on this representation is proposed.

UCB-TCAD Copyright 2005, Regents of University of California FLCC Teleconference 3 10/17/2005 FLCC Seminar Monday, October 31st, 2005 How to join the seminar? Please join us, either in person in the Wang room (5th floor Cory Hall, UC Berkeley), or via the web: Go to -> Events -> Online Slideshow -> For viewer, after 2:10pm PDT, 10/31/05. Use login name: flcc, password: link2cad (case sensitive). Provide your company name as well as your address. Call the teleconference number after 2:05pm PDT so that you can listen in and ask questions. (Call toll free number , then enter the conference code: to join into the conference) The talk will start at 2:10pm PDT and will end before 3pm PDT. Question? Please to