Preparation of electronic grade chemicals Lin Hong Lin Hong

1.1 electronic chemicals applicationchemicals cleaning 4O% NH 4 OH 、 40 ％ NH 4 F 、 HF （ l ）、 3O% H 2 O 2 、 85%H 3 PO 4 、 CrO3 、 HCl （ l ）、 HNO 3 、 H 2 SO 4 etching HNO 3 、 H 2 SO 4 、 H 3 PO 4 Spasticity gases H 2 、 N 2 、 O 2 、 Ar 、 He 、 HF 、 HCl 、 NH 3 Mainly used in processing of semiconductor :

1.2 Electronic grade chemicals(MOS) electronic grade gas: purity>99.999% electronic grade liquid(example: high purity PGMEA) itemstandarditemstandarditemstandard purity>99.5%Na5×10 -5 Zn1×10 -6 water 0.05%Mg5×10 -6 Cl5×10 -7 acidity0.02ueg/g Mn1×10 -6 Pb1×10 -6 Li10ppbFe5×10 -6 Cu1×10 -6 Na10ppbCo1×10 -6 ……..……….

2.1 preparation of high purity HF(l)  pretreatment KMnO 4 、 NaOH  cryogenic distillation cryogenic distillation( 19~35 ℃ ) is used to remove low BP impurities  adsorption Polymeric Chelating agent  ion-exchange mixed bed ion-exchange is used to meet requirements of metal ions  ultrafiltration

2.2 preparation of high purity peroxide  remove of organic impurities D9904 adsorption-resign  remove of inorganic impurities such as metal ions and anions distillation with specific stabilizer

2.3 preparation of high purity iso-propanol  remove of organic impurities distillation with two towers in series  remove of inorganic impurities such as metal ions and anions and large particles sub-boiling distillation

3. Preparation of electronic grade PGMEA  remove of organic impurities impurites: water ethyl lactate(154) cyclonexanone(155.6) Anisole(153.8) Diethylene glycol dimethyl ether (159.76) method: distillation ? 97.5%  remove of inorganic impurities impurities: anions and metal ions method: ion exchange  remove of large particles method: ultra filtration(0.001~0.02um)