Review of Ion Beam Sputtering Ramin Lalezai voice: 720-494-4194 x-26 Advanced Thin Films, 105 S. Sunset St Suite G,

Slides:



Advertisements
Similar presentations
Solar Selective Coatings Importantance in CSP Technology
Advertisements

MPA 2010, Braga HIGH VACUUM PLANTS FOR REACTIVE SPUTTER DEPOSITION OF MULTI-LAYER STACKS Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria.
Revolution in physical vapor deposition BY MEAN OF PLASMA ARC ACCELERATOR
1 Uranium Oxide as a Highly Reflective Coating from 2.7 to 11.6 Nanometers William R. Evans, Richard L. Sandberg, David D. Allred*, Jed E. Johnson, R.
ARGUS 54 - Optical Sputter Coater Vacuum Process Technology LLC Dr. Keqi Zhang & Ralph Faber May 1, 2013.
Northern Illinois University’s ion beam sputtering system for boron deposition on a CCD Donna, et al. 17May2013 Special thanks to Gregg Westberg (NIU)
ECE/ChE 4752: Microelectronics Processing Laboratory
Electrical and optical properties of thin films
Tribology Concerns in MEMS Devices: The Materials and Fabrication Techniques Used to Reduce Them ME 381 – Final Project David Brass, Dan Fuller, Jim Lovsin.
Thorium Based Thin Films as EUV Reflectors
Applications: CO Gas Sensor

Physical Vapor Deposition
ECE/ChE 4752: Microelectronics Processing Laboratory
INTEGRATED CIRCUITS Dr. Esam Yosry Lec. #5.
Thin Film Deposition Prof. Dr. Ir. Djoko Hartanto MSc
Anti-reflection optical coatings Anti-reflection coatings are frequently used to reduce the Fresnel reflection. For normal incidence, the intensity reflection.
School of Electrical and Electronic Engineering Queen’s University Belfast, N.Ireland Course Tutor Dr R E Hurley Vacuum evaporation of thin films Northern.
1 ME 381R Fall 2003 Micro-Nano Scale Thermal-Fluid Science and Technology Lecture 18: Introduction to MEMS Dr. Li Shi Department of Mechanical Engineering.
McGill Nanotools Microfabrication Processes
BIAS MAGNETRON SPUTTERING FOR NIOBIUM THIN FILMS
Thin Film Deposition Quality – composition, defect density, mechanical and electrical properties Uniformity – affect performance (mechanical , electrical)
Wear resistant and low friction nanocomposite coatings Dr Tomasz Suszko.
Ion implanter – HV terminal 500 kV a number of Nielsen and RF ion sources for gaseous and solid materials mass analysis better than 1 a.m.u. beam current.
Plasma-Enhanced Chemical Vapor Deposition (PECVD)
Alban REMILLIEUX3 rd ILIAS-GW Annual General Meeting. London, October 26 th -27 th, New coatings on new substrates for low mechanical loss mirrors.
SLS Optics Limited Manufacturer of Quality Optical Components ISO 9001:2000.
Optical Constants of Uranium Nitride Thin Films in the EUV (7-15 nm) Marie K. Urry EUV Thin Film Group Brigham Young University.
Synthesis, Structure and Corrosion Behavior of Nanocoatings for Surgical Implants Materials تقرير عن البعثة البحثية في جامعة ميزوري –كولومبيا الولايات.
Overview of coatings research and recent results at the University of Glasgow M. Abernathy, I. Martin, R. Bassiri, E. Chalkley, R. Nawrodt, M.M. Fejer,
ALD at Georgia Tech IEN John Pham
Sputter deposition.
Paper and Progress Report Artoni Kevin R. Ang July 1, 2009.
Low temperature dissipation in coating materials S. Reid 1, I. Martin 1, H. Armandula 3, R. Bassiri 1, E. Chalkley 1 C. Comtet 4, M.M. Fejer 5, A. Gretarsson.
EMT362: Microelectronic Fabrication Interlevel Dielectric Technology
Friction Behavior of DLC film with Environmental Changes Copyright, 1997 © Dale Carnegie & Associates, Inc. S. J. Park*, K.-R. Lee*, D.-H. Ko +, K. Y.
Thermoelastic dissipation in inhomogeneous media: loss measurements and thermal noise in coated test masses Sheila Rowan, Marty Fejer and LSC Coating collaboration.
Atomic Layer Deposition for Microchannel Plates Jeffrey Elam Argonne National Laboratory September 24, 2009.
-Andrew Ludlow -Martin Boyd -Gretchen Campbell -Sebastian Blatt -Jan Thomsen - Matt Swallows -Travis Nicholson The Sr team: Group leader: Jun Ye New approaches:
Deposition Techniques for Thin Films and Sensing
Janyce Franc-Kyoto-GWADW1 Simulation and research for the future ET mirrors Janyce Franc, Nazario Morgado, Raffaele Flaminio Laboratoire des Matériaux.
Coating Discussion Gregg Harry LIGO - MIT March 2008 LSC/Virgo Meeting March 19, 2008 LIGO-DCC Number.
Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputtering Adviser : Shang-Chou Chang Co-Adviser : Tien-Chai.
Atomic Layer Deposition - ALD
Fab - Step 1 Take SOI Wafer Top view Side view Si substrate SiO2 – 2 um Si confidential.
UV Laser-Induced Damage to Grazing Incidence Metal Mirrors M. S. Tillack, J. E. Pulsifer, K. Sequoia Mechanical and Aerospace Engineering Department and.
The Materials and Fabrication Techniques Used to Reduce Them The Materials and Fabrication Techniques Used to Reduce Them Guide-PROF.S.CHAKKA presented.
Optical Coatings for Gravitational Wave Detection Gregory Harry Massachusetts Institute of Technology - On Behalf of the LIGO Science Collaboration - August.
Mar 24 th, 2016 Inorganic Material Chemistry. Gas phase physical deposition 1.Sputtering deposition 2.Evaporation 3.Plasma deposition.
Thin films
The Proposed Holographic Noise Experiment Rainer Weiss, MIT On behalf of the proposing group Fermi Lab Proposal Review November 3, 2009.
Deposition Techniques
Solar Cells Fabrication: Surface Processing
Thin Film Deposition Processes
Production of NTCR Thermistor Devices based on NiMn2O4+d
CVD & ALD
Synopsis by Maria Ruiz-Gonzalez 12/8/16
Mirror thermal noises and its implications on the mirror design
ASPERA Technology Forum 20/10/2011
Current status of coating research in Glasgow
Laboratoire des Matériaux Avancés - Lyon
Introduction Purpose To explain the characteristics and features of the RTAN Series Precision Tantalum Nitride Thin Film Resistors Objectives To provide.
Ceramic introduction.
Chapter 5 Plasma and Ion Beam Processing of Thin Films
Ion beam sputtering of thin films and multilayers for aLIGO Carmen S
1.6 Magnetron Sputtering Perpendicular Electric Magnetic Fields.
Deposition 27 and 29 March 2017 Evaporation Chemical Vapor Deposition (CVD) Plasma-Enhanced Chemical Vapor Deposition (PECVD) Metal Organometallic CVD.
Sensitivity curves beyond the Advanced detectors
Deposition Techniques 5 and 8 April 2019
Deposition 30 March And 1 April 2016
Presentation transcript:

Review of Ion Beam Sputtering Ramin Lalezai voice: x-26 Advanced Thin Films, 105 S. Sunset St Suite G, Longmont, CO History of the Kaufman ion source.Early days of ion beam sputtering.The modern IBS machines.Characteristics of IBS optical coatings -environmental stability -losses -stress.Materials which can be deposited using IBS.”Intrinsic” contaminants in IBS films

Herman Oberth and the ABMA rocket team (Early 1950s)

Ion beam sputtering of optical coatings was invented by technologists at Litton in the early 1970s.

Technology Ion Beam Sputtering Dense films (not porous) Excellent adhesion Stable and durable No spectral shift Low loss Easy to clean Indefinite lifetime

Comparison of E-beam evaporated, IAD, and IBS coatings E-beam: Porous. Columnar structure. High scatter. Poor environmental stability. IAD: Increased density. Reduced porosity. High stress. Improved environmental stability. IBS: Dense films. Minimal structure. Low scatter. No porosity. Excellent environmental stability

Spectral shift due to moisture (%). Stress coefficient of mirror coatings (MPa).

λmaterialSubsTrans ppm Total loss ppmA&S ppmmeasured by 308nmHfO2ATF Mark YeoCU 369nmTa2O5ATF-2.5cm Andrew GrierMITV nmTa2O5ATF-10cm Andrew GrierMIT 405nmTa2O5ATF153924Steve BrownNOAA 514nmTa2O5ATF6104Steve BrownNOAA 635nmTa2O5ATF484RLATFV5-1 qualification 698nmTa2O5GO462RLATF V3-320 JILA Cavity 852nmTa2O5ATF&REO0.42.1<2Tracy NorthupCal Tech 1064nmTa2O5GO73?<0.5*LIGO* Absorption only 1392nmTa2O5ATF43632TigerRegular Process 1392nmTa2O5ATF473TigerLow water films Measured Losses

Materials which can be grown using IBS Most oxides Ta2O5, Nb2O5, V2O5, TiO2, ZrO2, HfO2, Al2O3,Y2O3, SiO2, … Most nitrides Si3N4, AlN, TiN, … Most elements Si, Al, Pt, … IBS is generally not suitable for the deposition of fluorides and zinc compounds.

Intrinsic Contaminants in IBS Films 1- Argon (working gas) 2- Water (typically the last element in the vacuum system)