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High efficiency GaN-based LEDs using plasma selective treatment of p-GaN surface Young-Bae Lee, Ryohei Takaki, Hisao Sato, Yoshiki Naoi, and Shiro Sakai phys. stat. sol. (a) 200, No. 1, 87– 90 (2003) / DOI 10.1002/pssa.200303253
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Experiment
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Results and Discussions Treated LED : 有 Ni/Au ( 10nm/10nm ) TCL 和電極下經過 plasma treatment Untreated LED :有 Ni/Au ( 10nm/10nm ) TCL 而電極下無經過 plasma treatment Untreated LED without pad metal :無 Ni/Au ( 10nm/10nm ) TCL 但電極下經過 plasma treatment
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Conclusions Based on this method, the light output power of the nitrogen plasma treated UV-LED with a emission peak of 355 nm is increased by 40% compared to that of the untreated LED.
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References [1] Y.-B. Lee, T. Wang, Y.-H Liu, J.-P. Ao, Y. Izumi, Y. Lacroix, H.-D. Li, J. Bai, Y. Naoi, and S. Sakai, Jpn. J. Appl. Phys. 41, 4450 (2002). [2] T. Mukai, K. Takekawa, and S. Nakamura, Jpn. J. Appl. Phys. 37, L839 (1998). [3] T. Sugahara, H. Sato, M. Hao, Y. Naoi, S. Kurai, S. Tottori, K. Yamashima, K. Nishino, L. T. Romano, and S. Sakai, Jpn. J. Appl. Phys. 37, L398 (1998). [4] S. Nakamura, M. Senoh, S. Nagahama, N. Iwasa, T. Yamada, T. Matsushita, H. Kiyoku, Y. Sugimoto, T. Kozaki, H. Umemoto, M. Sano, and K. Chocho, Appl. Phys. Lett. 72, 211 (1998). [5] J.-K. Ho, C.-S. Jong, C. C. Chiu, C.-N. Huang, K.-K. Shih, L.-C. Chen, F.-R. Chen, and J.-J. Kai, J. Appl. Phys.86, 4491 (1999). [6] J. J. Wierer, D. A. Steigerwald, M. R. Krames, J. J. O’Shea, M. J. Ludowise, G. Christenson, Y.-C. Shen, C. Lowery, P. S. Martin, S. Subramanya, W. Götz, N. F. Gardner, R. S. Kern, and S. A. Stockman, Appl. Phys. Lett. 78, 3379 (2001). [7] C. Huh, J.-M. Lee, D.-J. Kim, and S.-J. Park, J. Appl. Phys. 92, 2248 (2002). [8] S. Takanami, T. Kawashima, A. Miyazaki, M. Iwaya, S. Kamiyama, H. Amano, and I. Akasaki, Ext. Abstr. 63 rd Autumn Meet. Japan Society of Applied Physics and Related Societies (Nigata, Japan, 24–27 September 2002), p. 346. [9] S. Sakai, T. Wang, Y. Morishima, and Y. Naoi, J. Cryst. Growth 221, 334 (2000).
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