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Wet etching Isotropic etching
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Aim Selective removal of material by chemical reaction between etchant and material Why? Remove material
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Steps 1.Fotolitography 2.Etching 3.Stripping
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1 Photo litografi (exposure+ develop) Material to be patterned Fotomask Fotoresist Light source
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Material to be patterned Patterned Fotoresist 2 Wet Etching Etching solution
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Stripping solution Patterned photoresist Etched material 3 Stripping
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Compare mask and resulting structure Etched material Mask
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Reflection What is the meaning of isotropy? What is the mechanism of wet etching? How can you influence the etching speed? What is the difference between dissolve and etch?
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