1. Components and Smart Machines Micro-Nano Surface Embedded Sensors
COSMOS-II
Components and Smart Machines
with
Micro-Nano Surface Embedded Sensors
Kristian Martinsen
SINTEF Raufoss Manufacturing

2. The vision Create intelligent surfaces of the future
Added value in products trough enhanced properties and new functions

3. COSMOS
Improved interaction between human and machines trough more information
Smart products with embedded sensors to improve safety, quality, performance and lifetime
Increase productivity trough process monitoring, breakdown avoidance, increased process and product knowledge

4. The team Acreo : Cleanroom, microstructuring, sensor design
SINTEF : Cleanroom (MiNaLab) Sensor design
UiO: ALD
VTT : ALD, Tribology, coating tests
Danish Technological Institute : CVD and PVD Coatings
RTIM: Materials and manufacturing technology, Polishing,
Industrial partners:
Finland: Picodeon ltd. Oy
Denmark: Sauer-Danfoss
Sweden:Microplast AB
Norway:
Raufoss Industrial Tools AS
Plasto AS
Raufoss technology AS
Nammo raufoss AS

5. Facts: NMP FP7 ERA-NET project
Each country have national funding under the ERA-NET umbrella
In Norway: The Norwegian Research Council with 2920 KNOK, Industrial in-kind: 4380 KNOK
From beginning of 2008 to end of 2010

6. Examples of possible utilization of embedded sensors
Valves with build in temperature and/or pressure sensors under anti-corrosive coating
Pumps or rotors with build in pressure sensors
Axels and bearings with low-friction DLC with embedded temperature sensor
Extrusion/molding forms with temprature and pressure sensors
Interactive and intelligent tools and machines

7. From passive to active coatings, patents

8. Basic Concept Wear-resistant coating Electric insulator
Sensor material
Substrate

9. Cross-disciplinary task
Sensor design and
technology
Coating technology
3D microstructurization
Interface:
Wiring and electronics
Sensor test
Coating test
Polishing,
surface texture
Industrial
Testing and verification
Industrial application
design
Surface embedded
sensors

10. Coatings Coating technologies PVD CVD Other technologies
Reactive Sputter
Evaporation
CVD
Plasma ass. CVD
Atomic layer CVD
Other technologies
Relevant Coating Materials
TiN
CrN
DLC
Al2O3
Borides, carbides
Other materials

11. Physical Vapor Deposition
Evaporative deposition - The material to be deposited is heated to a high vapor pressure by electrically resistive heating in "low" vacuum
Electron beam physical vapor deposition - The material to be deposited is heated to a high vapor pressure by electron bombardment in "high" vacuum.
Sputter deposition - Glow plasma discharge bombards the material sputtering some away as a vapor
Cathodic Arc Deposition - In which a high power arc directed at the target material blasts away some into a vapor
Pulsed laser deposition - In which a high power laser ablates material from the target into a vapor

12. Dual magnetron sputtering Al in Ar/O2
MF-Power

13. Reaktive sputtering of Al in Ar/O2
Disappearing Anode:
Anoderne bliver
belagt med
insulator materiale
Katoderne forbliver
selv rengjort
til en vis grænse
Power

14. CrN/TiN multilayer TiN 22 layers of TiN/CrN CrN FIB-SEM
Pia Wahlberg og
Leif Højslet Christensen

15. TiAlN + + N2/Ar = + + N2/Ar = + + N2/Ar = Ti Al ”AlN”/”TiN” ”TiAlN”
plasma =
”TiAlN”
mix + +
N2/Ar
plasma = Ti
”TiAlN”/”TiN” + +
N2/Ar
plasma =
40cm x 40cm x 40cm

16. Plasma Assisted Chemical Vapour Deposition of Si3N4
3 SiCl4(g) + 2 N2(g) + 6 H2(g)  Si3N4(s) + 12 HCl(g) ( °C + plasma)

17. Atomic Layer Deposition (ALD)
Gas phase chemical depostion
Based on surface reactions which makes achieving atomic scale deposition control possible
As fine as ~ 0.1 ångstroms per monolayer
ALD grown films are conformal, pin-hole free, and chemically bonded to the substrate.
With ALD it is possible to deposit coatings perfectly uniform in thickness inside deep trenches, porous media
The coating range is usually nm

18. ALD/ALCVD coating technologies
Atom layer deposition (ALD)
See

19. DLC coating technologies
PACVD (r.f. plasma) for hydrogenated DLC
Titanium
Carbon
Argon
H2 or CH4
Pump
coated object
Pulsed arc for DLC
(ta-C) deposition
Arc source for
Ti deposition
r.f. power
Vacuum arc deposition for hydrogen-free DLC
Hydrocarbon gas
EB gun

20. Other Deposition Techniques
e-beam assisted evaporation (Pt, Au…)
Stamps: imprinting, nano-imprint
CSD-Chemical solution deposition
(Dip- coating, electrochemical plating)
(Plasma) Spray-coating

21. Basic Concept Wear-resistant coating Electric insulator
Sensor material
Substrate

22. Sensors embedded under wear-resistant coatings
CVD DLC
CrNxCy-layer
Embedded
Sensor
Substrate

23. Substrate Wear-resistant coating Electric insulator Sensor material

24. Substrate requirements
Surface roughness is an important issue:
Higher roughness means ticher layors
1 micron seems to be a pratcical/economical optimum
The materials used must be compatible with a high vacuum environment and withstand the deposition temperatures of the process desired 
Materials that outgas in the vacuum chamber present a problem for coating  
Proper adhesion of the coating requires a pristine surface of the part
no foreign materials
no oxidation on the part

25. Substrate
Not 2D but 3D
Not Si - Austenitisk, Ferritisk and Martensitisk steel
Duplex steel (austenitisk-feritisk)
AISI316L, Sverker 21 or HSS
Cupper based
Mouldmax
Aluminum based alloys
Surface finish
Directly from machining
Polished mechanically or electrochemically

26. insulator Wear-resistant coating Electric insulator Sensor material
Substrate

27. Electric insulating coatings
Dual magnetron AlN
Dual Magnetron Al2O3
PVD Al2O3-Cr2O3 multilayer-systems
PECVD Si3N4
Atomic Layer Deposition of Al2O3 and TiO2
Non conductive IBAD-DLC
Non conductive multilayers of ac:H DLC

28. Insulator:. Si3N4 at DTI. Al2O3 at DTI. ac DLC at VTT. ALD at Planar
Insulator: Si3N4 at DTI Al2O3 at DTI ac DLC at VTT ALD at Planar ALD at Sintef
Wear resistant
coating
Insulator, 2
Insulator, 1
Substrate

29. Examples of isolating coatings

30. Plasma Assisted Chemical Vapour Deposition of Si3N4
AFM Roughness like Si
LASER diffraction Dust particles

31. On a smooth surface…

32. Sputter vs ALD
W1: Al2O3, 4 µm, Sputter
W3: Al2O3, 0.5 µm, ALD

34. Sensors and wireing Wear-resistant coating Electric insulator
Sensor material
Substrate

35. Sensor Design Resistive temperature sensors Thermocouples
Capacitive pressure sensors
Twin arc pressure sensors
VTT sensor device
Test patterns
Wiring
Contact pads/terminals

36. Patterning techniques
Photolithography
1:1 contact lithography
Stepper lithography
Shadow mask
Direct write
Electron beam lithography
Laser writing
Nanoimprint
ECPR – ElectroChemical Pattern Replication

37. Photolithography (a) (b) (c) (d) (e) (f) Substrate Substrate Substrate

38. Deposit Sensor Material
Metal
Isolation
Substrate
Substrate
Substrate
(a)
(b)
(c)
Substrate
Substrate
Substrate
(d)
(e)
(f)

39. Photo Resist (a) (b) (c) (d) (e) (f) Photo Resist Substrate Substrate

40. Exposure (a) (b) (c) (d) (e) (f) UV light Mask Substrate Substrate

41. Development (a) (b) (c) (d) (e) (f) Substrate Substrate Substrate
Patterned Photo Resist
Substrate
Substrate
Substrate
(d)
(e)
(f)

42. Etch (a) (b) (c) (d) (e) (f) Substrate Substrate Substrate Etch Metal

43. Strip (a) (b) (c) (d) (e) (f) Substrate Substrate Substrate
Strip Photo Resist
Substrate
Substrate
Substrate
(d)
(e)
(f)

44. Requirements Flat surface Fit into lithography tools (a) (b) (c) (d)
Substrate
Substrate
Substrate
(a)
(b)
(c)
Flat surface
Fit into lithography tools
Substrate
Substrate
Substrate
(d)
(e)
(f)

45. photolithography – shadow mask

46. Shadow mask Direct patterning with shadow mask One step process (a)
Deposit metal
Shadow mask
Patterned structures
Isolation
Substrate
Substrate
Substrate
(a)
(b)
(c)
Direct patterning with shadow mask
One step process

47. Flexible Steel Foil Standard technology Attached to substrate
Screen printing lito
Etched holes
Attached to substrate
with magnets
Holder
80 µm thick
Flexible. Follows surface
Bendable in 1 dimension
Min feature size 150 µm

48. Etched metal mask

49. Patterned metal disc

50. Advanced shadow mask HiCoFlex (15 µm polyimide film)
Pattern trough holes  Flexible shadow mask
Flexible sensor

51. Advanced shadow mask Can be placed on non-flat surfaces Axles Moulds
Other

52. Flex mask system

53. Real buried temperature sensors

54. Wear restiant coating Wear-resistant coating Electric insulator
Sensor material
Substrate
DLC, TiN, ….

55. Diamond-like carbon (DLC)
Various forms of C-H alloys presented in a ternary phase diagram
DLC is a metastable form of amorphous carbon
DLC films have a mixed sp3/ sp2 structure with different sp3 and sp2 proportions depending on deposition technique and parameters

56. Diamond like Carbon
as a pressure sensor
Metal
Ion beam

57. Industrial Demonstrators
Surface embedded temperature sensor on a flat surface on a 3D object
Embedded temperature sensor on a 3D surface on a 3D object The cylinder for de-forming of injection moulded plastics components
Surface embedded temperature sensor on metal forming tool – Both hot and cold forming

58. Demo 1

59. Demo 2

60. Demo 3
Forging tool for compression of aluminum

61. Hot forging
Temperature distribution on the surface as forged. Max temperature - approx. 540°C

62. Hot forging
Surface pressure against upper die as forged. Maximum pressure - about 100MPa

63. Cold forming
Temperature distribution on the surface as forged. Max temperature - approx. 110°C.

64. Cold forming
Surface pressure against upper die as forged Maximum pressure - about 350MPa

65. The sensor mounting solution